JPS513119B1 - - Google Patents
Info
- Publication number
- JPS513119B1 JPS513119B1 JP45090925A JP9092570A JPS513119B1 JP S513119 B1 JPS513119 B1 JP S513119B1 JP 45090925 A JP45090925 A JP 45090925A JP 9092570 A JP9092570 A JP 9092570A JP S513119 B1 JPS513119 B1 JP S513119B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE1953659A DE1953659C3 (de) | 1969-10-21 | 1969-10-21 | Ionenquelle für die Zerstäubung mit langsamen Ionen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS513119B1 true JPS513119B1 (de) | 1976-01-31 |
Family
ID=5749151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP45090925A Pending JPS513119B1 (de) | 1969-10-21 | 1970-10-17 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3719582A (de) |
| JP (1) | JPS513119B1 (de) |
| AU (1) | AU2023570A (de) |
| CH (1) | CH515341A (de) |
| DE (1) | DE1953659C3 (de) |
| FR (1) | FR2066179A5 (de) |
| GB (1) | GB1270496A (de) |
| NL (1) | NL7015117A (de) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5623290U (de) * | 1979-07-25 | 1981-03-02 | ||
| JPS60190493U (ja) * | 1984-05-30 | 1985-12-17 | ダイセル化学工業株式会社 | 仮付治具 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3793179A (en) * | 1971-07-19 | 1974-02-19 | L Sablev | Apparatus for metal evaporation coating |
| DE2621824C2 (de) * | 1976-05-17 | 1982-04-29 | Hitachi, Ltd., Tokyo | Mikrowellen-Entladungs-Ionenquelle |
| US4512867A (en) * | 1981-11-24 | 1985-04-23 | Andreev Anatoly A | Method and apparatus for controlling plasma generation in vapor deposition |
| DE3707545A1 (de) * | 1987-02-03 | 1988-08-11 | Balzers Hochvakuum | Anordnung zur stabilisierung eines lichtbogens zwischen einer anode und einer kathode |
| US5215640A (en) * | 1987-02-03 | 1993-06-01 | Balzers Ag | Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices |
| CA2065581C (en) | 1991-04-22 | 2002-03-12 | Andal Corp. | Plasma enhancement apparatus and method for physical vapor deposition |
| WO1999058737A1 (en) * | 1998-05-14 | 1999-11-18 | Kaufman & Robinson, Inc. | Apparatus for sputter deposition |
| EA015719B1 (ru) * | 2008-02-13 | 2011-10-31 | Александр Криманов | Метод и устройство управления потоком ионов |
-
1969
- 1969-10-21 DE DE1953659A patent/DE1953659C3/de not_active Expired
-
1970
- 1970-09-23 AU AU20235/70A patent/AU2023570A/en not_active Expired
- 1970-10-15 NL NL7015117A patent/NL7015117A/xx unknown
- 1970-10-15 US US00080972A patent/US3719582A/en not_active Expired - Lifetime
- 1970-10-16 CH CH1530770A patent/CH515341A/de not_active IP Right Cessation
- 1970-10-16 GB GB49277/70A patent/GB1270496A/en not_active Expired
- 1970-10-17 JP JP45090925A patent/JPS513119B1/ja active Pending
- 1970-10-19 FR FR7037648A patent/FR2066179A5/fr not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5623290U (de) * | 1979-07-25 | 1981-03-02 | ||
| JPS60190493U (ja) * | 1984-05-30 | 1985-12-17 | ダイセル化学工業株式会社 | 仮付治具 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1953659A1 (de) | 1971-04-29 |
| AU2023570A (en) | 1972-03-30 |
| DE1953659B2 (de) | 1978-05-18 |
| GB1270496A (en) | 1972-04-12 |
| CH515341A (de) | 1971-11-15 |
| US3719582A (en) | 1973-03-06 |
| FR2066179A5 (de) | 1971-08-06 |
| DE1953659C3 (de) | 1979-01-25 |
| NL7015117A (de) | 1971-04-23 |