NL7015117A - - Google Patents

Info

Publication number
NL7015117A
NL7015117A NL7015117A NL7015117A NL7015117A NL 7015117 A NL7015117 A NL 7015117A NL 7015117 A NL7015117 A NL 7015117A NL 7015117 A NL7015117 A NL 7015117A NL 7015117 A NL7015117 A NL 7015117A
Authority
NL
Netherlands
Application number
NL7015117A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7015117A publication Critical patent/NL7015117A/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/46Sputtering by ion beam produced by an external ion source
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
NL7015117A 1969-10-21 1970-10-15 NL7015117A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1953659A DE1953659C3 (de) 1969-10-21 1969-10-21 Ionenquelle für die Zerstäubung mit langsamen Ionen

Publications (1)

Publication Number Publication Date
NL7015117A true NL7015117A (de) 1971-04-23

Family

ID=5749151

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7015117A NL7015117A (de) 1969-10-21 1970-10-15

Country Status (8)

Country Link
US (1) US3719582A (de)
JP (1) JPS513119B1 (de)
AU (1) AU2023570A (de)
CH (1) CH515341A (de)
DE (1) DE1953659C3 (de)
FR (1) FR2066179A5 (de)
GB (1) GB1270496A (de)
NL (1) NL7015117A (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
DE2621824C2 (de) * 1976-05-17 1982-04-29 Hitachi, Ltd., Tokyo Mikrowellen-Entladungs-Ionenquelle
JPS5623290U (de) * 1979-07-25 1981-03-02
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
JPS60190493U (ja) * 1984-05-30 1985-12-17 ダイセル化学工業株式会社 仮付治具
DE3707545A1 (de) * 1987-02-03 1988-08-11 Balzers Hochvakuum Anordnung zur stabilisierung eines lichtbogens zwischen einer anode und einer kathode
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
WO1999058737A1 (en) * 1998-05-14 1999-11-18 Kaufman & Robinson, Inc. Apparatus for sputter deposition
EA015719B1 (ru) * 2008-02-13 2011-10-31 Александр Криманов Метод и устройство управления потоком ионов

Also Published As

Publication number Publication date
DE1953659A1 (de) 1971-04-29
AU2023570A (en) 1972-03-30
DE1953659B2 (de) 1978-05-18
GB1270496A (en) 1972-04-12
CH515341A (de) 1971-11-15
JPS513119B1 (de) 1976-01-31
US3719582A (en) 1973-03-06
FR2066179A5 (de) 1971-08-06
DE1953659C3 (de) 1979-01-25

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