AU2023570A - Ion source for slow ion sputtering - Google Patents

Ion source for slow ion sputtering

Info

Publication number
AU2023570A
AU2023570A AU20235/70A AU2023570A AU2023570A AU 2023570 A AU2023570 A AU 2023570A AU 20235/70 A AU20235/70 A AU 20235/70A AU 2023570 A AU2023570 A AU 2023570A AU 2023570 A AU2023570 A AU 2023570A
Authority
AU
Australia
Prior art keywords
ion
slow
sputtering
source
ion source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU20235/70A
Inventor
Ernst Foltz Hansen Fritz Penrod Littman Herbert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of AU2023570A publication Critical patent/AU2023570A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
AU20235/70A 1969-10-21 1970-09-23 Ion source for slow ion sputtering Expired AU2023570A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE1953659A DE1953659C3 (en) 1969-10-21 1969-10-21 Ion source for atomization with slow ions
DEDE81953659 1969-10-21

Publications (1)

Publication Number Publication Date
AU2023570A true AU2023570A (en) 1972-03-30

Family

ID=5749151

Family Applications (1)

Application Number Title Priority Date Filing Date
AU20235/70A Expired AU2023570A (en) 1969-10-21 1970-09-23 Ion source for slow ion sputtering

Country Status (8)

Country Link
US (1) US3719582A (en)
JP (1) JPS513119B1 (en)
AU (1) AU2023570A (en)
CH (1) CH515341A (en)
DE (1) DE1953659C3 (en)
FR (1) FR2066179A5 (en)
GB (1) GB1270496A (en)
NL (1) NL7015117A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
DE2621824C2 (en) * 1976-05-17 1982-04-29 Hitachi, Ltd., Tokyo Microwave Discharge Ion Source
JPS5623290U (en) * 1979-07-25 1981-03-02
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
JPS60190493U (en) * 1984-05-30 1985-12-17 ダイセル化学工業株式会社 Temporary attachment jig
DE3707545A1 (en) * 1987-02-03 1988-08-11 Balzers Hochvakuum ARRANGEMENT FOR STABILIZING AN ARC BETWEEN AN ANODE AND A CATHODE
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
WO1999058737A1 (en) * 1998-05-14 1999-11-18 Kaufman & Robinson, Inc. Apparatus for sputter deposition
EA015719B1 (en) * 2008-02-13 2011-10-31 Александр Криманов Method and device for guiding of the ion flow

Also Published As

Publication number Publication date
DE1953659A1 (en) 1971-04-29
DE1953659B2 (en) 1978-05-18
GB1270496A (en) 1972-04-12
CH515341A (en) 1971-11-15
JPS513119B1 (en) 1976-01-31
US3719582A (en) 1973-03-06
FR2066179A5 (en) 1971-08-06
DE1953659C3 (en) 1979-01-25
NL7015117A (en) 1971-04-23

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