US3719582A - Ion source for slow-ion sputtering - Google Patents

Ion source for slow-ion sputtering Download PDF

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Publication number
US3719582A
US3719582A US00080972A US3719582DA US3719582A US 3719582 A US3719582 A US 3719582A US 00080972 A US00080972 A US 00080972A US 3719582D A US3719582D A US 3719582DA US 3719582 A US3719582 A US 3719582A
Authority
US
United States
Prior art keywords
anode
sputtering
ion
ion source
slow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US00080972A
Other languages
English (en)
Inventor
N Hansen
W Littmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
US Philips Corp
Original Assignee
US Philips Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by US Philips Corp filed Critical US Philips Corp
Application granted granted Critical
Publication of US3719582A publication Critical patent/US3719582A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
US00080972A 1969-10-21 1970-10-15 Ion source for slow-ion sputtering Expired - Lifetime US3719582A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1953659A DE1953659C3 (de) 1969-10-21 1969-10-21 Ionenquelle für die Zerstäubung mit langsamen Ionen

Publications (1)

Publication Number Publication Date
US3719582A true US3719582A (en) 1973-03-06

Family

ID=5749151

Family Applications (1)

Application Number Title Priority Date Filing Date
US00080972A Expired - Lifetime US3719582A (en) 1969-10-21 1970-10-15 Ion source for slow-ion sputtering

Country Status (8)

Country Link
US (1) US3719582A (de)
JP (1) JPS513119B1 (de)
AU (1) AU2023570A (de)
CH (1) CH515341A (de)
DE (1) DE1953659C3 (de)
FR (1) FR2066179A5 (de)
GB (1) GB1270496A (de)
NL (1) NL7015117A (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
US5458754A (en) 1991-04-22 1995-10-17 Multi-Arc Scientific Coatings Plasma enhancement apparatus and method for physical vapor deposition
WO1999058737A1 (en) * 1998-05-14 1999-11-18 Kaufman & Robinson, Inc. Apparatus for sputter deposition

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2621824C2 (de) * 1976-05-17 1982-04-29 Hitachi, Ltd., Tokyo Mikrowellen-Entladungs-Ionenquelle
JPS5623290U (de) * 1979-07-25 1981-03-02
JPS60190493U (ja) * 1984-05-30 1985-12-17 ダイセル化学工業株式会社 仮付治具
DE3707545A1 (de) * 1987-02-03 1988-08-11 Balzers Hochvakuum Anordnung zur stabilisierung eines lichtbogens zwischen einer anode und einer kathode
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
EA015719B1 (ru) * 2008-02-13 2011-10-31 Александр Криманов Метод и устройство управления потоком ионов

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
US5458754A (en) 1991-04-22 1995-10-17 Multi-Arc Scientific Coatings Plasma enhancement apparatus and method for physical vapor deposition
US6139964A (en) 1991-04-22 2000-10-31 Multi-Arc Inc. Plasma enhancement apparatus and method for physical vapor deposition
WO1999058737A1 (en) * 1998-05-14 1999-11-18 Kaufman & Robinson, Inc. Apparatus for sputter deposition

Also Published As

Publication number Publication date
DE1953659A1 (de) 1971-04-29
AU2023570A (en) 1972-03-30
DE1953659B2 (de) 1978-05-18
GB1270496A (en) 1972-04-12
CH515341A (de) 1971-11-15
JPS513119B1 (de) 1976-01-31
FR2066179A5 (de) 1971-08-06
DE1953659C3 (de) 1979-01-25
NL7015117A (de) 1971-04-23

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