CH501063A - Appareil destiné à déposer des couches sur des objets par dépôt sous vide de matières de revêtement - Google Patents

Appareil destiné à déposer des couches sur des objets par dépôt sous vide de matières de revêtement

Info

Publication number
CH501063A
CH501063A CH1308567A CH1308567A CH501063A CH 501063 A CH501063 A CH 501063A CH 1308567 A CH1308567 A CH 1308567A CH 1308567 A CH1308567 A CH 1308567A CH 501063 A CH501063 A CH 501063A
Authority
CH
Switzerland
Prior art keywords
objects
vacuum deposition
coating materials
depositing layers
depositing
Prior art date
Application number
CH1308567A
Other languages
English (en)
French (fr)
Inventor
Gallez Pierre
Original Assignee
Glaverbel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glaverbel filed Critical Glaverbel
Publication of CH501063A publication Critical patent/CH501063A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
CH1308567A 1966-10-05 1967-09-19 Appareil destiné à déposer des couches sur des objets par dépôt sous vide de matières de revêtement CH501063A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU52106A LU52106A1 (de) 1966-10-05 1966-10-05

Publications (1)

Publication Number Publication Date
CH501063A true CH501063A (fr) 1970-12-31

Family

ID=19724990

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1308567A CH501063A (fr) 1966-10-05 1967-09-19 Appareil destiné à déposer des couches sur des objets par dépôt sous vide de matières de revêtement

Country Status (11)

Country Link
US (1) US3616451A (de)
AT (2) AT280514B (de)
BE (1) BE704031A (de)
CH (1) CH501063A (de)
DE (1) DE1615287A1 (de)
ES (1) ES345149A1 (de)
FI (1) FI46636C (de)
FR (1) FR1556228A (de)
GB (1) GB1194428A (de)
LU (1) LU52106A1 (de)
NL (1) NL6713182A (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4037580A1 (de) * 1989-11-29 1991-06-06 Hitachi Ltd Sputtervorrichtung sowie einrichtung und verfahren zum wechseln eines targets
DE4040856A1 (de) * 1990-12-20 1992-06-25 Leybold Ag Zerstaeubungsanlage
WO1995025827A2 (en) * 1994-03-19 1995-09-28 Applied Vision Limited Apparatus for coating substrates

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3767559A (en) * 1970-06-24 1973-10-23 Eastman Kodak Co Sputtering apparatus with accordion pleated anode means
FR2098563A5 (de) * 1970-07-10 1972-03-10 Progil
JPH05804A (ja) * 1990-08-01 1993-01-08 Sumitomo Electric Ind Ltd 大面積複合酸化物超電導薄膜の成膜装置
US5292419A (en) * 1990-12-20 1994-03-08 Leybold Aktiengesellschaft Sputtering unit
US5279724A (en) * 1991-12-26 1994-01-18 Xerox Corporation Dual sputtering source
US5322606A (en) * 1991-12-26 1994-06-21 Xerox Corporation Use of rotary solenoid as a shutter actuator on a rotating arm
US6045671A (en) * 1994-10-18 2000-04-04 Symyx Technologies, Inc. Systems and methods for the combinatorial synthesis of novel materials
DE19830223C1 (de) * 1998-07-07 1999-11-04 Techno Coat Oberflaechentechni Vorrichtung und Verfahren zum mehrlagigen PVD - Beschichten von Substraten
US6833031B2 (en) * 2000-03-21 2004-12-21 Wavezero, Inc. Method and device for coating a substrate
JP2003141719A (ja) * 2001-10-30 2003-05-16 Anelva Corp スパッタリング装置及び薄膜形成方法
JP4066044B2 (ja) * 2002-11-08 2008-03-26 信行 高橋 成膜方法及びスパッタ装置
CA2564539C (en) * 2005-11-14 2014-05-06 Sulzer Metco Coatings B.V. A method for coating of a base body with a platinum modified aluminide ptmal by means of a physical deposition out of the gas phase
US8287647B2 (en) * 2007-04-17 2012-10-16 Lam Research Corporation Apparatus and method for atomic layer deposition
KR100865475B1 (ko) * 2007-08-30 2008-10-27 세메스 주식회사 노즐 어셈블리, 이를 갖는 처리액 공급 장치 및 이를이용하는 처리액 공급 방법
US10586689B2 (en) 2009-07-31 2020-03-10 Guardian Europe S.A.R.L. Sputtering apparatus including cathode with rotatable targets, and related methods
US20120027953A1 (en) * 2010-07-28 2012-02-02 Synos Technology, Inc. Rotating Reactor Assembly for Depositing Film on Substrate
US20130014700A1 (en) * 2011-07-11 2013-01-17 Hariharakeshava Sarpangala Hegde Target shield designs in multi-target deposition system.
JP2017501306A (ja) * 2013-10-24 2017-01-12 マイヤー・ブルガー・（ジャーマニー）・アクチエンゲゼルシャフト 磁電管構造体
PT3649410T (pt) * 2017-07-07 2022-02-01 Nextracker Inc Sistema para posicionar painéis solares num arranjo de painéis solares para captar eficientemente luz do sol

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4037580A1 (de) * 1989-11-29 1991-06-06 Hitachi Ltd Sputtervorrichtung sowie einrichtung und verfahren zum wechseln eines targets
DE4040856A1 (de) * 1990-12-20 1992-06-25 Leybold Ag Zerstaeubungsanlage
EP0492114A1 (de) 1990-12-20 1992-07-01 Leybold Aktiengesellschaft Zerstäubungsanlage
WO1995025827A2 (en) * 1994-03-19 1995-09-28 Applied Vision Limited Apparatus for coating substrates
WO1995025827A3 (en) * 1994-03-19 1995-10-12 Applied Vision Ltd Apparatus for coating substrates
US6090248A (en) * 1994-03-19 2000-07-18 Applied Vision Limited Apparatus for coating substrates

Also Published As

Publication number Publication date
GB1194428A (en) 1970-06-10
BE704031A (de) 1968-03-19
LU52106A1 (de) 1968-05-07
ES345149A1 (es) 1968-11-16
FR1556228A (de) 1969-02-07
AT280514B (de) 1970-04-10
US3616451A (en) 1971-10-26
NL6713182A (de) 1968-04-08
FI46636C (fi) 1973-05-08
FI46636B (de) 1973-01-31
AT284365B (de) 1970-09-10
DE1615287A1 (de) 1970-06-11

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Legal Events

Date Code Title Description
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