CH459760A - Lichtempfindliche gerbbare Schicht - Google Patents

Lichtempfindliche gerbbare Schicht

Info

Publication number
CH459760A
CH459760A CH1241164A CH1241164A CH459760A CH 459760 A CH459760 A CH 459760A CH 1241164 A CH1241164 A CH 1241164A CH 1241164 A CH1241164 A CH 1241164A CH 459760 A CH459760 A CH 459760A
Authority
CH
Switzerland
Prior art keywords
tannable
photosensitive
layer
tannable layer
photosensitive tannable
Prior art date
Application number
CH1241164A
Other languages
English (en)
Inventor
Karl Dr Reichel Maximilian
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of CH459760A publication Critical patent/CH459760A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CH1241164A 1961-03-15 1964-09-24 Lichtempfindliche gerbbare Schicht CH459760A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEK43194A DE1206308B (de) 1961-03-15 1961-03-15 Lichtempfindliche Schicht mit gerbenden Eigenschaften
DEK0050933 1963-09-26

Publications (1)

Publication Number Publication Date
CH459760A true CH459760A (de) 1968-07-15

Family

ID=25983383

Family Applications (2)

Application Number Title Priority Date Filing Date
CH306762A CH419833A (de) 1961-03-15 1962-03-14 Lichtempfindliche gerbbare Schicht
CH1241164A CH459760A (de) 1961-03-15 1964-09-24 Lichtempfindliche gerbbare Schicht

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CH306762A CH419833A (de) 1961-03-15 1962-03-14 Lichtempfindliche gerbbare Schicht

Country Status (7)

Country Link
US (2) US3189451A (de)
BE (2) BE653467A (de)
CH (2) CH419833A (de)
DE (2) DE1206308B (de)
GB (2) GB998838A (de)
NL (2) NL6410778A (de)
SE (2) SE317257B (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE615056A (de) * 1961-03-15
DE1224611B (de) * 1963-09-25 1966-09-08 Kalle Ag Lichtempfindliches Kopiermaterial fuer die Diazotypie mit 2, 5-Dialkoxy-4-tert.-aminobenzol-diazoniumsalzen
US3390992A (en) * 1964-06-15 1968-07-02 North American Rockwell Non-etching circuit fabrication
US3463638A (en) * 1965-08-20 1969-08-26 Ibm Heat-fixable light-sensitive compositions and elements
DE2057473C2 (de) * 1970-11-23 1982-04-08 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
US3853561A (en) * 1970-11-26 1974-12-10 Hoechst Ag Process for the preparation of screen printing stencils using intermediate support for light sensitive layer
DE2058178C2 (de) * 1970-11-26 1982-04-01 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung von Siebdruckformen
DE2522225C2 (de) * 1975-05-20 1983-12-08 Nippon Paint Co., Ltd., Osaka Wässriges lichtempfindliches Gemisch und seine Verwendung für die Herstellung von Siebdruckschablonen
US4154614A (en) * 1975-07-02 1979-05-15 Nippon Paint Co., Ltd. Photosensitive diazo composition with graft copolymer for use in printing screen
FR2411432A1 (fr) * 1977-12-09 1979-07-06 Issec Labo Physicochimie Appli Procede d'impressions couleur photochimique et dispositif pour sa mise en oeuvre
DE3222684A1 (de) * 1981-06-19 1983-05-05 Sericol Group Ltd., London Lichtempfindliche zubereitung und deren verwendung
DE3135804A1 (de) * 1981-09-10 1983-03-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
EP0363504A1 (de) * 1988-10-10 1990-04-18 Dräger Nederland B.V. Verfahren zur Herstellung einer ein Polyvinylhydrogel und ein biochemisch aktives Material enthaltenden Schicht auf einem Substrat
FR2866887A1 (fr) * 2004-02-27 2005-09-02 Oreal Para-phenylenediamine secondaire n-heteroaryle, compositon tinctoriale comprenant une telle para-phenylenediamine, procede mettant en oeuvre cette composition et utilisation
US7329288B2 (en) 2004-02-27 2008-02-12 L'oreal S.A. N-heteroaryl secondary para-phenylenediamine, a dye composition comprising such a para-phenylenediamine, a process for preparing this composition and use thereof

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2679498A (en) * 1954-05-25 Atent office
DE596731C (de) * 1932-05-23 1934-05-09 Kalle & Co Akt Ges Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen
NL70798C (de) * 1948-10-15
NL150528B (nl) * 1949-05-14 Hollandse Signaalapparaten Bv Werkwijze voor het vervaardigen van twistloos of nagenoeg twistloos garen en het door toepassing van deze werkwijze verkregen garen.
US2690968A (en) * 1952-10-04 1954-10-05 Powers Chemco Inc Development of diazo and azide sensitized colloids
BE528898A (de) * 1953-05-28
US2937085A (en) * 1954-01-11 1960-05-17 Ditto Inc Composite photosensitive plate, and method of making printing plate therefrom
US3012886A (en) * 1954-05-10 1961-12-12 Harry H Lerner Emulsion coating and method of preparation
US3029146A (en) * 1955-02-25 1962-04-10 Azoplate Corp Reproduction material
BE549814A (de) * 1955-07-29
AT209359B (de) * 1958-01-22 1960-06-10 Kalle & Co Ag Lichtempfindliches Reproduktionsmaterial, bestehend aus Schichtträger und lichtempfindlicher Kolloidschicht
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
US2976152A (en) * 1958-12-19 1961-03-21 Gen Aniline & Film Corp Photographic gelatin layers containing triazine hardeners
BE595534A (de) * 1959-10-02
BE615056A (de) * 1961-03-15

Also Published As

Publication number Publication date
NL6410778A (de) 1965-03-29
BE615056A (de)
GB1069366A (en) 1967-05-17
SE334813B (de) 1971-05-03
US3322541A (en) 1967-05-30
US3189451A (en) 1965-06-15
BE653467A (de) 1965-03-23
DE1447729B (de) 1969-09-04
CH419833A (de) 1966-08-31
NL275561A (de)
DE1206308B (de) 1965-12-02
GB998838A (en) 1965-07-21
SE317257B (de) 1969-11-10

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