NL6410778A - - Google Patents
Info
- Publication number
- NL6410778A NL6410778A NL6410778A NL6410778A NL6410778A NL 6410778 A NL6410778 A NL 6410778A NL 6410778 A NL6410778 A NL 6410778A NL 6410778 A NL6410778 A NL 6410778A NL 6410778 A NL6410778 A NL 6410778A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK43194A DE1206308B (de) | 1961-03-15 | 1961-03-15 | Lichtempfindliche Schicht mit gerbenden Eigenschaften |
DEK0050933 | 1963-09-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL6410778A true NL6410778A (de) | 1965-03-29 |
Family
ID=25983383
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL275561D NL275561A (de) | 1961-03-15 | ||
NL6410778A NL6410778A (de) | 1961-03-15 | 1964-09-16 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL275561D NL275561A (de) | 1961-03-15 |
Country Status (7)
Country | Link |
---|---|
US (2) | US3189451A (de) |
BE (2) | BE653467A (de) |
CH (2) | CH419833A (de) |
DE (2) | DE1206308B (de) |
GB (2) | GB998838A (de) |
NL (2) | NL6410778A (de) |
SE (2) | SE317257B (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL275561A (de) * | 1961-03-15 | |||
DE1224611B (de) * | 1963-09-25 | 1966-09-08 | Kalle Ag | Lichtempfindliches Kopiermaterial fuer die Diazotypie mit 2, 5-Dialkoxy-4-tert.-aminobenzol-diazoniumsalzen |
US3390992A (en) * | 1964-06-15 | 1968-07-02 | North American Rockwell | Non-etching circuit fabrication |
US3463638A (en) * | 1965-08-20 | 1969-08-26 | Ibm | Heat-fixable light-sensitive compositions and elements |
DE2057473C2 (de) * | 1970-11-23 | 1982-04-08 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
DE2058178C2 (de) * | 1970-11-26 | 1982-04-01 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung von Siebdruckformen |
US3853561A (en) * | 1970-11-26 | 1974-12-10 | Hoechst Ag | Process for the preparation of screen printing stencils using intermediate support for light sensitive layer |
DE2522225C2 (de) * | 1975-05-20 | 1983-12-08 | Nippon Paint Co., Ltd., Osaka | Wässriges lichtempfindliches Gemisch und seine Verwendung für die Herstellung von Siebdruckschablonen |
US4154614A (en) * | 1975-07-02 | 1979-05-15 | Nippon Paint Co., Ltd. | Photosensitive diazo composition with graft copolymer for use in printing screen |
FR2411432A1 (fr) * | 1977-12-09 | 1979-07-06 | Issec Labo Physicochimie Appli | Procede d'impressions couleur photochimique et dispositif pour sa mise en oeuvre |
AU557375B2 (en) * | 1981-06-19 | 1986-12-18 | Sericol Group Ltd. | Photo sensitive compositions and their use |
DE3135804A1 (de) * | 1981-09-10 | 1983-03-24 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
EP0363504A1 (de) * | 1988-10-10 | 1990-04-18 | Dräger Nederland B.V. | Verfahren zur Herstellung einer ein Polyvinylhydrogel und ein biochemisch aktives Material enthaltenden Schicht auf einem Substrat |
FR2866887A1 (fr) * | 2004-02-27 | 2005-09-02 | Oreal | Para-phenylenediamine secondaire n-heteroaryle, compositon tinctoriale comprenant une telle para-phenylenediamine, procede mettant en oeuvre cette composition et utilisation |
US7329288B2 (en) | 2004-02-27 | 2008-02-12 | L'oreal S.A. | N-heteroaryl secondary para-phenylenediamine, a dye composition comprising such a para-phenylenediamine, a process for preparing this composition and use thereof |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2679498A (en) * | 1954-05-25 | Atent office | ||
DE596731C (de) * | 1932-05-23 | 1934-05-09 | Kalle & Co Akt Ges | Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen |
NL70798C (de) * | 1948-10-15 | |||
NL150528B (nl) * | 1949-05-14 | Hollandse Signaalapparaten Bv | Werkwijze voor het vervaardigen van twistloos of nagenoeg twistloos garen en het door toepassing van deze werkwijze verkregen garen. | |
US2690968A (en) * | 1952-10-04 | 1954-10-05 | Powers Chemco Inc | Development of diazo and azide sensitized colloids |
BE528898A (de) * | 1953-05-28 | |||
US2937085A (en) * | 1954-01-11 | 1960-05-17 | Ditto Inc | Composite photosensitive plate, and method of making printing plate therefrom |
US3012886A (en) * | 1954-05-10 | 1961-12-12 | Harry H Lerner | Emulsion coating and method of preparation |
US3029146A (en) * | 1955-02-25 | 1962-04-10 | Azoplate Corp | Reproduction material |
BE549814A (de) * | 1955-07-29 | |||
AT209359B (de) * | 1958-01-22 | 1960-06-10 | Kalle & Co Ag | Lichtempfindliches Reproduktionsmaterial, bestehend aus Schichtträger und lichtempfindlicher Kolloidschicht |
US3130051A (en) * | 1958-12-10 | 1964-04-21 | Gen Aniline & Film Corp | Process for producing negative working offset diazo printing plates |
US2976152A (en) * | 1958-12-19 | 1961-03-21 | Gen Aniline & Film Corp | Photographic gelatin layers containing triazine hardeners |
BE595534A (de) * | 1959-10-02 | |||
NL275561A (de) * | 1961-03-15 |
-
0
- NL NL275561D patent/NL275561A/xx unknown
- BE BE615056D patent/BE615056A/xx unknown
-
1961
- 1961-03-15 DE DEK43194A patent/DE1206308B/de active Pending
-
1962
- 1962-03-08 GB GB8973/62A patent/GB998838A/en not_active Expired
- 1962-03-13 US US179489A patent/US3189451A/en not_active Expired - Lifetime
- 1962-03-14 CH CH306762A patent/CH419833A/de unknown
- 1962-03-14 SE SE2859/62A patent/SE317257B/xx unknown
-
1963
- 1963-09-26 DE DE19631447729D patent/DE1447729B/de active Pending
-
1964
- 1964-09-16 NL NL6410778A patent/NL6410778A/xx unknown
- 1964-09-23 BE BE653467A patent/BE653467A/xx unknown
- 1964-09-23 SE SE11430/64A patent/SE334813B/xx unknown
- 1964-09-24 US US399106A patent/US3322541A/en not_active Expired - Lifetime
- 1964-09-24 CH CH1241164A patent/CH459760A/de unknown
- 1964-09-25 GB GB39246/64A patent/GB1069366A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB998838A (en) | 1965-07-21 |
US3189451A (en) | 1965-06-15 |
BE653467A (de) | 1965-03-23 |
GB1069366A (en) | 1967-05-17 |
CH419833A (de) | 1966-08-31 |
US3322541A (en) | 1967-05-30 |
CH459760A (de) | 1968-07-15 |
DE1206308B (de) | 1965-12-02 |
SE317257B (de) | 1969-11-10 |
SE334813B (de) | 1971-05-03 |
DE1447729B (de) | 1969-09-04 |
BE615056A (de) | |
NL275561A (de) |