CH336903A - Verfahren zur Herstellung von Halbleiterkörpern mit aneinandergrenzenden Zonen verschiedener Leitfähigkeit - Google Patents
Verfahren zur Herstellung von Halbleiterkörpern mit aneinandergrenzenden Zonen verschiedener LeitfähigkeitInfo
- Publication number
- CH336903A CH336903A CH336903DA CH336903A CH 336903 A CH336903 A CH 336903A CH 336903D A CH336903D A CH 336903DA CH 336903 A CH336903 A CH 336903A
- Authority
- CH
- Switzerland
- Prior art keywords
- production
- different conductivity
- semiconductor bodies
- adjacent zones
- zones
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/02562—Tellurides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/08—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
- C30B13/10—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials
- C30B13/12—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials in the gaseous or vapour state
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
- C30B15/04—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt adding doping materials, e.g. for n-p-junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02549—Antimonides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02625—Liquid deposition using melted materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/925—Fluid growth doping control, e.g. delta doping
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL336903X | 1954-04-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH336903A true CH336903A (de) | 1959-03-15 |
Family
ID=19784567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH336903D CH336903A (de) | 1954-04-01 | 1955-03-30 | Verfahren zur Herstellung von Halbleiterkörpern mit aneinandergrenzenden Zonen verschiedener Leitfähigkeit |
Country Status (7)
Country | Link |
---|---|
US (1) | US2849343A (fr) |
BE (1) | BE536985A (fr) |
CH (1) | CH336903A (fr) |
DE (1) | DE1025995B (fr) |
FR (1) | FR1129941A (fr) |
GB (1) | GB784431A (fr) |
NL (1) | NL111118C (fr) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2950220A (en) * | 1956-03-13 | 1960-08-23 | Battelle Development Corp | Preparation of p-n junctions by the decomposition of compounds |
US3003900A (en) * | 1957-11-12 | 1961-10-10 | Pacific Semiconductors Inc | Method for diffusing active impurities into semiconductor materials |
US2900286A (en) * | 1957-11-19 | 1959-08-18 | Rca Corp | Method of manufacturing semiconductive bodies |
DE1164680B (de) * | 1958-05-21 | 1964-03-05 | Siemens Ag | Verfahren zum Herstellen von stabfoermigen Halbleiterkoerpern hoher Reinheit |
US2974072A (en) * | 1958-06-27 | 1961-03-07 | Ibm | Semiconductor connection fabrication |
NL252532A (fr) * | 1959-06-30 | 1900-01-01 | ||
NL270518A (fr) * | 1960-11-30 | |||
NL265122A (fr) * | 1961-05-24 | |||
DE1266281B (de) * | 1961-06-30 | 1968-04-18 | Telefunken Patent | Verfahren zum Dotieren von Halbleiterkristallen |
DE1254606B (de) * | 1963-11-08 | 1967-11-23 | Siemens Ag | Verfahren zur Herstellung von Einkristallen aus anorganischen kristallinen Halbleiterverbindungen mit hohem Dampfdruck am Schmelzpunkt |
US3303067A (en) * | 1963-12-26 | 1967-02-07 | Ibm | Method of fabricating thin film transistor devices |
JPS575325A (en) * | 1980-06-12 | 1982-01-12 | Junichi Nishizawa | Semicondoctor p-n junction device and manufacture thereof |
JPS577131A (en) * | 1980-06-16 | 1982-01-14 | Junichi Nishizawa | Manufacture of p-n junction |
JPS5863183A (ja) * | 1981-10-09 | 1983-04-14 | Semiconductor Res Found | 2−6族間化合物の結晶成長法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2447829A (en) * | 1946-08-14 | 1948-08-24 | Purdue Research Foundation | Germanium-helium alloys and rectifiers made therefrom |
BE500302A (fr) * | 1949-11-30 | |||
BE500569A (fr) * | 1950-01-13 | |||
US2730470A (en) * | 1950-06-15 | 1956-01-10 | Bell Telephone Labor Inc | Method of making semi-conductor crystals |
BE509317A (fr) * | 1951-03-07 | 1900-01-01 | ||
DE894293C (de) * | 1951-06-29 | 1953-10-22 | Western Electric Co | Verfahren zur Herstellung eines Kristalls aus Halbleitermaterial |
DE885756C (de) * | 1951-10-08 | 1953-06-25 | Telefunken Gmbh | Verfahren zur Herstellung von p- oder n-leitenden Schichten |
NL168491B (fr) * | 1951-11-16 | Roussel-Uclaf, Societe Anonyme Te Parijs. |
-
0
- BE BE536985D patent/BE536985A/xx unknown
- NL NL111118D patent/NL111118C/xx active
-
1955
- 1955-03-29 DE DEN10415A patent/DE1025995B/de active Pending
- 1955-03-30 US US497987A patent/US2849343A/en not_active Expired - Lifetime
- 1955-03-30 CH CH336903D patent/CH336903A/de unknown
- 1955-03-31 FR FR1129941D patent/FR1129941A/fr not_active Expired
- 1955-03-31 GB GB9425/55A patent/GB784431A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1025995B (de) | 1958-03-13 |
GB784431A (en) | 1957-10-09 |
FR1129941A (fr) | 1957-01-29 |
BE536985A (fr) | |
US2849343A (en) | 1958-08-26 |
NL111118C (fr) |
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