CH359790A - Verfahren zur Herstellung einer Zonen verschiedenen Leitfähigkeitstyps aufweisenden Halbleiteranordnung - Google Patents

Verfahren zur Herstellung einer Zonen verschiedenen Leitfähigkeitstyps aufweisenden Halbleiteranordnung

Info

Publication number
CH359790A
CH359790A CH359790DA CH359790A CH 359790 A CH359790 A CH 359790A CH 359790D A CH359790D A CH 359790DA CH 359790 A CH359790 A CH 359790A
Authority
CH
Switzerland
Prior art keywords
zones
production
conductivity types
different conductivity
semiconductor arrangement
Prior art date
Application number
Other languages
English (en)
Inventor
W Henkels Herbert
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of CH359790A publication Critical patent/CH359790A/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/04Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the liquid state
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/228Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a liquid phase, e.g. alloy diffusion processes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Bipolar Transistors (AREA)
  • Electron Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Thyristors (AREA)
CH359790D 1957-05-06 1958-05-06 Verfahren zur Herstellung einer Zonen verschiedenen Leitfähigkeitstyps aufweisenden Halbleiteranordnung CH359790A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US657355A US2943006A (en) 1957-05-06 1957-05-06 Diffused transistors and processes for making the same

Publications (1)

Publication Number Publication Date
CH359790A true CH359790A (de) 1962-01-31

Family

ID=24636825

Family Applications (1)

Application Number Title Priority Date Filing Date
CH359790D CH359790A (de) 1957-05-06 1958-05-06 Verfahren zur Herstellung einer Zonen verschiedenen Leitfähigkeitstyps aufweisenden Halbleiteranordnung

Country Status (5)

Country Link
US (1) US2943006A (de)
CH (1) CH359790A (de)
DE (1) DE1414538A1 (de)
FR (1) FR1206714A (de)
GB (1) GB865471A (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3007090A (en) * 1957-09-04 1961-10-31 Ibm Back resistance control for junction semiconductor devices
US3065392A (en) * 1958-02-07 1962-11-20 Rca Corp Semiconductor devices
US3154692A (en) * 1960-01-08 1964-10-27 Clevite Corp Voltage regulating semiconductor device
NL263771A (de) * 1960-04-26
NL257150A (de) * 1960-10-22 1900-01-01
DE1175797B (de) * 1960-12-22 1964-08-13 Standard Elektrik Lorenz Ag Verfahren zum Herstellen von elektrischen Halb-leiterbauelementen
US3188244A (en) * 1961-04-24 1965-06-08 Tektronix Inc Method of forming pn junction in semiconductor material
US3258371A (en) * 1962-02-01 1966-06-28 Semiconductor Res Found Silicon semiconductor device for high frequency, and method of its manufacture
US3307088A (en) * 1962-03-13 1967-02-28 Fujikawa Kyoichi Silver-lead alloy contacts containing dopants for semiconductors
US3257589A (en) * 1962-05-22 1966-06-21 Texas Instruments Inc Transistors and the fabrication thereof
US3268375A (en) * 1962-05-22 1966-08-23 Gordon J Ratcliff Alloy-diffusion process for fabricating germanium transistors
CH396228A (de) * 1962-05-29 1965-07-31 Siemens Ag Verfahren zum Erzeugen einer hochdotierten p-leitenden Zone in einem Halbleiterkörper, insbesondere aus Silizium
US3309244A (en) * 1963-03-22 1967-03-14 Motorola Inc Alloy-diffused method for producing semiconductor devices
US3513041A (en) * 1967-06-19 1970-05-19 Motorola Inc Fabrication of a germanium diffused base power transistor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1103544A (fr) * 1953-05-25 1955-11-03 Rca Corp Dispositifs semi-conducteurs, et procédé de fabrication de ceux-ci

Also Published As

Publication number Publication date
US2943006A (en) 1960-06-28
FR1206714A (fr) 1960-02-11
GB865471A (en) 1961-04-19
DE1414538A1 (de) 1968-12-19

Similar Documents

Publication Publication Date Title
CH417086A (de) Verfahren zur Herstellung von Elastomeren
CH383624A (de) Verfahren zur Herstellung von Polyamidformkörpern
CH442242A (de) Verfahren zur Herstellung von hochreinen Elementen
CH425738A (de) Verfahren zur Gewinnung von kristallinem Halbleitermaterial
CH359790A (de) Verfahren zur Herstellung einer Zonen verschiedenen Leitfähigkeitstyps aufweisenden Halbleiteranordnung
CH346617A (de) Verfahren zur Herstellung einer Halbleiteranordnung mit mehreren Übergängen zwischen Zonen verschiedenen Leitungstyps
CH357121A (de) Verfahren zur Herstellung von Halbleiteranordnungen
CH423261A (de) Verfahren zur Herstellung von Terpolymeren
CH412064A (de) Verfahren zur Herstellung einer Tunneleffekt aufweisbaren Dünnschichtanordnung
CH415632A (de) Verfahren zur Herstellung neuer 3-Pyrrolidylmethylamine
CH370780A (de) Verfahren zur Herstellung neuer Ferocene
CH370089A (de) Verfahren zur Herstellung von Hydantoinen
CH405292A (de) Verfahren zur Herstellung neuer Homo-Steroide
CH407970A (de) Verfahren zur Herstellung neuer Telomerisate
AT249690B (de) Verfahren zur Herstellung neuer organischer Siliciumverbindungen
CH348208A (de) Verfahren zur Herstellung von Halbleiteranordnungen
CH422777A (de) Verfahren zur Herstellung neuer organischer Phosphorverbindungen
AT252260B (de) Verfahren zur Herstellung neuer Kondensationsprodukte
CH362072A (de) Verfahren zur Herstellung neuer Acylpiperidine
CH397878A (de) Verfahren zur Herstellung von Halbleiteranordnungen
CH366283A (de) Verfahren zur Herstellung neuer Dioxotetrahydropyridazine
CH375729A (de) Verfahren zur Herstellung von Rhodaniden
CH368786A (de) Verfahren zur Herstellung von Borhydriden
CH398639A (de) Verfahren zur Herstellung quaternärer Ammoniumverbindungen
CH407072A (de) Verfahren zur Herstellung neuer Telomerisate