CA3073721A1 - Bulk layer transfer processing with backside silicidation - Google Patents
Bulk layer transfer processing with backside silicidation Download PDFInfo
- Publication number
- CA3073721A1 CA3073721A1 CA3073721A CA3073721A CA3073721A1 CA 3073721 A1 CA3073721 A1 CA 3073721A1 CA 3073721 A CA3073721 A CA 3073721A CA 3073721 A CA3073721 A CA 3073721A CA 3073721 A1 CA3073721 A1 CA 3073721A1
- Authority
- CA
- Canada
- Prior art keywords
- bulk semiconductor
- dielectric layer
- trench isolation
- layer
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
- H01L21/76229—Concurrent filling of a plurality of trenches having a different trench shape or dimension, e.g. rectangular and V-shaped trenches, wide and narrow trenches, shallow and deep trenches
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76898—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics formed through a semiconductor substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
- H01L25/0657—Stacked arrangements of devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/10—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L25/11—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being of a type provided for in subclass H10D
- H01L25/117—Stacked arrangements of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/20—Inductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0149—Manufacturing their interconnections or electrodes, e.g. source or drain electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0151—Manufacturing their isolation regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Thin Film Transistor (AREA)
- Element Separation (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762565495P | 2017-09-29 | 2017-09-29 | |
| US62/565,495 | 2017-09-29 | ||
| US15/975,434 | 2018-05-09 | ||
| US15/975,434 US10559520B2 (en) | 2017-09-29 | 2018-05-09 | Bulk layer transfer processing with backside silicidation |
| PCT/US2018/048125 WO2019067129A1 (en) | 2017-09-29 | 2018-08-27 | MASSIVE LAYER TRANSFER TREATMENT WITH SILICIURATION ON THE REAR PANEL |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA3073721A1 true CA3073721A1 (en) | 2019-04-04 |
Family
ID=65896847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA3073721A Pending CA3073721A1 (en) | 2017-09-29 | 2018-08-27 | Bulk layer transfer processing with backside silicidation |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10559520B2 (enExample) |
| EP (1) | EP3688795B1 (enExample) |
| JP (1) | JP7248660B2 (enExample) |
| KR (1) | KR102675753B1 (enExample) |
| CN (1) | CN111133565B (enExample) |
| CA (1) | CA3073721A1 (enExample) |
| WO (1) | WO2019067129A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10199461B2 (en) * | 2015-10-27 | 2019-02-05 | Texas Instruments Incorporated | Isolation of circuit elements using front side deep trench etch |
| US10615252B2 (en) * | 2018-08-06 | 2020-04-07 | Nxp Usa, Inc. | Device isolation |
| WO2021102789A1 (en) * | 2019-11-28 | 2021-06-03 | Yangtze Memory Technologies Co., Ltd. | Local word line driver device, memory device, and fabrication method thereof |
| US11568052B2 (en) | 2020-05-31 | 2023-01-31 | Microsoft Technology Licensing, Llc | Undetectable sandbox for malware |
| CN111883476B (zh) * | 2020-09-18 | 2023-04-14 | 上海华虹宏力半导体制造有限公司 | 深沟槽隔离结构的形成方法及半导体器件的形成方法 |
| US11721883B2 (en) * | 2021-02-25 | 2023-08-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor package with antenna and method of forming the same |
| US20240008290A1 (en) * | 2022-06-30 | 2024-01-04 | Intel Corporation | Back-end-of-line 2d memory cell |
| CN120565491B (zh) * | 2025-07-31 | 2025-10-10 | 杭州富芯半导体有限公司 | 一种半导体结构、制备方法及半导体器件 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3681862D1 (de) * | 1985-08-23 | 1991-11-14 | Siemens Ag | Verfahren zur herstellung einer hochsperrenden diodenanordnung auf der basis von a-si:h fuer bildsensorzeilen. |
| JP3587537B2 (ja) * | 1992-12-09 | 2004-11-10 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP4289146B2 (ja) | 2003-03-27 | 2009-07-01 | セイコーエプソン株式会社 | 三次元実装型半導体装置の製造方法 |
| JP2006108520A (ja) | 2004-10-08 | 2006-04-20 | Sharp Corp | 半導体装置及び半導体装置の製造方法 |
| JP2006278646A (ja) * | 2005-03-29 | 2006-10-12 | Sanyo Electric Co Ltd | 半導体装置の製造方法 |
| JP4869664B2 (ja) | 2005-08-26 | 2012-02-08 | 本田技研工業株式会社 | 半導体装置の製造方法 |
| US7285477B1 (en) | 2006-05-16 | 2007-10-23 | International Business Machines Corporation | Dual wired integrated circuit chips |
| JP2007335642A (ja) | 2006-06-15 | 2007-12-27 | Fujifilm Corp | パッケージ基板 |
| TWI382515B (zh) * | 2008-10-20 | 2013-01-11 | 鈺程科技股份有限公司 | 無線收發模組 |
| JP4945545B2 (ja) | 2008-11-10 | 2012-06-06 | 株式会社日立製作所 | 半導体装置の製造方法 |
| US8299583B2 (en) | 2009-03-05 | 2012-10-30 | International Business Machines Corporation | Two-sided semiconductor structure |
| US8455875B2 (en) * | 2010-05-10 | 2013-06-04 | International Business Machines Corporation | Embedded DRAM for extremely thin semiconductor-on-insulator |
| US8492241B2 (en) * | 2010-10-14 | 2013-07-23 | International Business Machines Corporation | Method for simultaneously forming a through silicon via and a deep trench structure |
| JP2014207252A (ja) | 2011-08-17 | 2014-10-30 | 株式会社村田製作所 | 半導体装置およびその製造方法ならびに携帯電話機 |
| US8779559B2 (en) * | 2012-02-27 | 2014-07-15 | Qualcomm Incorporated | Structure and method for strain-relieved TSV |
| US20130249011A1 (en) * | 2012-03-22 | 2013-09-26 | Texas Instruments Incorporated | Integrated circuit (ic) having tsvs and stress compensating layer |
| US9219032B2 (en) * | 2012-07-09 | 2015-12-22 | Qualcomm Incorporated | Integrating through substrate vias from wafer backside layers of integrated circuits |
| US9093462B2 (en) | 2013-05-06 | 2015-07-28 | Qualcomm Incorporated | Electrostatic discharge diode |
| CN104241279B (zh) * | 2013-06-18 | 2017-09-01 | 中芯国际集成电路制造(上海)有限公司 | 一种集成电路及其制造方法 |
| CN104241267B (zh) * | 2013-06-18 | 2017-08-01 | 中芯国际集成电路制造(上海)有限公司 | 一种集成电路及其制造方法 |
| JP2015050339A (ja) | 2013-09-02 | 2015-03-16 | ソニー株式会社 | 半導体装置およびその製造方法 |
| US9252077B2 (en) * | 2013-09-25 | 2016-02-02 | Intel Corporation | Package vias for radio frequency antenna connections |
| EP2887387A1 (en) * | 2013-12-20 | 2015-06-24 | Nxp B.V. | Semiconductor device and associated method |
| EP2913847B1 (en) * | 2014-02-28 | 2018-04-18 | LFoundry S.r.l. | Method of fabricating a semiconductor device and semiconductor product |
| US9368479B2 (en) * | 2014-03-07 | 2016-06-14 | Invensas Corporation | Thermal vias disposed in a substrate proximate to a well thereof |
| US9324632B2 (en) * | 2014-05-28 | 2016-04-26 | Globalfoundries Inc. | Semiconductor structures with isolated ohmic trenches and stand-alone isolation trenches and related method |
| JP2015228473A (ja) | 2014-06-03 | 2015-12-17 | パナソニックIpマネジメント株式会社 | 半導体装置およびその製造方法 |
| KR102235613B1 (ko) * | 2014-11-20 | 2021-04-02 | 삼성전자주식회사 | Mos 커패시터를 구비하는 반도체 소자 |
| US9673084B2 (en) * | 2014-12-04 | 2017-06-06 | Globalfoundries Singapore Pte. Ltd. | Isolation scheme for high voltage device |
| US9570494B1 (en) * | 2015-09-29 | 2017-02-14 | Semiconductor Components Industries, Llc | Method for forming a semiconductor image sensor device |
| US9755029B1 (en) | 2016-06-22 | 2017-09-05 | Qualcomm Incorporated | Switch device performance improvement through multisided biased shielding |
| US20180138081A1 (en) * | 2016-11-15 | 2018-05-17 | Vanguard International Semiconductor Corporation | Semiconductor structures and method for fabricating the same |
-
2018
- 2018-05-09 US US15/975,434 patent/US10559520B2/en active Active
- 2018-08-27 CA CA3073721A patent/CA3073721A1/en active Pending
- 2018-08-27 CN CN201880062471.1A patent/CN111133565B/zh active Active
- 2018-08-27 EP EP18766469.3A patent/EP3688795B1/en active Active
- 2018-08-27 KR KR1020207008515A patent/KR102675753B1/ko active Active
- 2018-08-27 WO PCT/US2018/048125 patent/WO2019067129A1/en not_active Ceased
- 2018-08-27 JP JP2020517136A patent/JP7248660B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20190103339A1 (en) | 2019-04-04 |
| EP3688795C0 (en) | 2025-06-18 |
| BR112020005804A2 (pt) | 2020-09-24 |
| CN111133565A (zh) | 2020-05-08 |
| US10559520B2 (en) | 2020-02-11 |
| WO2019067129A1 (en) | 2019-04-04 |
| KR20200057714A (ko) | 2020-05-26 |
| JP2020535647A (ja) | 2020-12-03 |
| EP3688795B1 (en) | 2025-06-18 |
| JP7248660B2 (ja) | 2023-03-29 |
| EP3688795A1 (en) | 2020-08-05 |
| KR102675753B1 (ko) | 2024-06-14 |
| CN111133565B (zh) | 2023-10-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request |
Effective date: 20220322 |
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| EEER | Examination request |
Effective date: 20220322 |
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| EEER | Examination request |
Effective date: 20220322 |
|
| EEER | Examination request |
Effective date: 20220322 |
|
| EEER | Examination request |
Effective date: 20220322 |
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| EEER | Examination request |
Effective date: 20220322 |
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| EEER | Examination request |
Effective date: 20220322 |