CA2569970C - Thin-film optical retarders - Google Patents
Thin-film optical retarders Download PDFInfo
- Publication number
- CA2569970C CA2569970C CA2569970A CA2569970A CA2569970C CA 2569970 C CA2569970 C CA 2569970C CA 2569970 A CA2569970 A CA 2569970A CA 2569970 A CA2569970 A CA 2569970A CA 2569970 C CA2569970 C CA 2569970C
- Authority
- CA
- Canada
- Prior art keywords
- birefringent layer
- deposition
- optical retarder
- retardance
- birefringent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 67
- 239000010409 thin film Substances 0.000 title claims description 56
- 230000008021 deposition Effects 0.000 claims abstract description 109
- 230000010287 polarization Effects 0.000 claims abstract description 44
- 230000004907 flux Effects 0.000 claims abstract description 36
- 238000000151 deposition Methods 0.000 claims description 123
- 239000000758 substrate Substances 0.000 claims description 88
- 239000000463 material Substances 0.000 claims description 35
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 34
- 239000004973 liquid crystal related substance Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 23
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000011800 void material Substances 0.000 claims description 10
- 238000000869 ion-assisted deposition Methods 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- 230000001965 increasing effect Effects 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 148
- 238000000576 coating method Methods 0.000 description 106
- 239000011248 coating agent Substances 0.000 description 91
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 35
- 229910052681 coesite Inorganic materials 0.000 description 24
- 229910052906 cristobalite Inorganic materials 0.000 description 24
- 229910052682 stishovite Inorganic materials 0.000 description 24
- 229910052905 tridymite Inorganic materials 0.000 description 24
- 238000013461 design Methods 0.000 description 23
- 239000003989 dielectric material Substances 0.000 description 21
- 239000010408 film Substances 0.000 description 13
- 238000005137 deposition process Methods 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 238000009987 spinning Methods 0.000 description 6
- -1 Ti02 Chemical class 0.000 description 5
- 239000005329 float glass Substances 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 239000005350 fused silica glass Substances 0.000 description 4
- 239000011147 inorganic material Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 239000012780 transparent material Substances 0.000 description 4
- 238000003917 TEM image Methods 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 210000002858 crystal cell Anatomy 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000012886 linear function Methods 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 206010037867 Rash macular Diseases 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000000231 atomic layer deposition Methods 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 239000005352 borofloat Substances 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3141—Constructional details thereof
- H04N9/315—Modulator illumination systems
- H04N9/3167—Modulator illumination systems for polarizing the light beam
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2073—Polarisers in the lamp house
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B33/00—Colour photography, other than mere exposure or projection of a colour film
- G03B33/10—Simultaneous recording or projection
- G03B33/12—Simultaneous recording or projection using beam-splitting or beam-combining systems, e.g. dichroic mirrors
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3102—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators
- H04N9/3105—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators for displaying all colours simultaneously, e.g. by using two or more electronic spatial light modulators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
- Projection Apparatus (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US74294005P | 2005-12-06 | 2005-12-06 | |
| US60/742,940 | 2005-12-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2569970A1 CA2569970A1 (en) | 2007-06-06 |
| CA2569970C true CA2569970C (en) | 2015-03-31 |
Family
ID=37733724
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2569970A Active CA2569970C (en) | 2005-12-06 | 2006-12-04 | Thin-film optical retarders |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8094270B2 (enExample) |
| EP (1) | EP1796400A1 (enExample) |
| JP (1) | JP5227507B2 (enExample) |
| CN (1) | CN1991420B (enExample) |
| CA (1) | CA2569970C (enExample) |
| TW (1) | TWI420158B (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4805130B2 (ja) * | 2006-12-27 | 2011-11-02 | 富士フイルム株式会社 | 反射型液晶表示素子及び反射型液晶プロジェクタ |
| DE102007004285A1 (de) * | 2007-01-23 | 2008-07-24 | Carl Zeiss Smt Ag | Optisches Element mit aufgedampfter Beschichtung |
| JP2009020383A (ja) * | 2007-07-13 | 2009-01-29 | Seiko Epson Corp | 位相差板及び投写型表示装置 |
| JP5552728B2 (ja) * | 2007-11-20 | 2014-07-16 | セイコーエプソン株式会社 | 液晶装置、プロジェクタ、液晶装置の光学補償方法及び位相差板 |
| JP5262387B2 (ja) * | 2007-11-20 | 2013-08-14 | セイコーエプソン株式会社 | 液晶装置、プロジェクタ及び液晶装置の光学補償方法 |
| JP5262388B2 (ja) * | 2007-11-20 | 2013-08-14 | セイコーエプソン株式会社 | 液晶装置、プロジェクタ及び液晶装置の光学補償方法 |
| US8212947B2 (en) * | 2007-11-20 | 2012-07-03 | Seiko Epson Corporation | Liquid crystal device, projector, and optical compensation method of liquid crystal device |
| TWI499835B (zh) * | 2007-11-20 | 2015-09-11 | Seiko Epson Corp | Liquid crystal device, projector and liquid crystal device |
| US9989687B2 (en) * | 2010-05-25 | 2018-06-05 | Dexerials Corporation | Wave plate having consistent birefringence properties across the visible spectrum and manufacturing method for same |
| JP2012163620A (ja) * | 2011-02-03 | 2012-08-30 | Seiko Epson Corp | 投射型表示装置 |
| JP5768428B2 (ja) * | 2011-03-23 | 2015-08-26 | セイコーエプソン株式会社 | プロジェクター |
| US8941801B2 (en) * | 2011-06-14 | 2015-01-27 | Reald Inc. | In-plane switched active retarder for stereoscopic display systems |
| KR101919646B1 (ko) * | 2011-10-07 | 2018-11-16 | 노쓰 캐롤라이나 스테이트 유니버시티 | 광대역 편광 변환을 위한 멀티 트위스트 지연기 및 관련 제조 방법 |
| CN103197367B (zh) * | 2013-04-12 | 2015-09-16 | 中国科学院上海光学精密机械研究所 | 各向异性和各向同性混合薄膜反射式位相延迟片 |
| JP6732631B2 (ja) * | 2016-10-31 | 2020-07-29 | 株式会社ジャパンディスプレイ | 表示装置 |
| JP2019066706A (ja) | 2017-10-02 | 2019-04-25 | ソニー株式会社 | 蛍光顕微鏡装置及び蛍光顕微鏡システム |
| US10379043B2 (en) * | 2017-12-29 | 2019-08-13 | Palo Alto Research Center Incorporated | Measuring path delay through a liquid-crystal variable retarder at non-uniform retardance intervals |
| KR102086411B1 (ko) * | 2018-06-04 | 2020-03-09 | 주식회사 코엠에스 | 반도체 기판용 보호필름 박리 여부 감시 장치 및 방법 |
| JP7380569B2 (ja) * | 2018-08-09 | 2023-11-15 | ソニーグループ株式会社 | 光学顕微鏡装置及び光学顕微鏡システム |
| FR3092404B1 (fr) * | 2019-02-04 | 2021-10-22 | Cailabs | Dispositif optique de combinaison d'une pluralite de faisceaux, et systeme employant un tel dispositif |
| CN113589628B (zh) * | 2020-04-30 | 2023-03-10 | 华为技术有限公司 | 投影显示装置及其校准方法 |
| CN112859505A (zh) * | 2021-03-12 | 2021-05-28 | 江苏集萃智能液晶科技有限公司 | 一种高清晰透明投影膜、制备方法及应用其的投影系统 |
| CN113376716B (zh) * | 2021-06-21 | 2022-12-30 | 中国科学院光电技术研究所 | 一种衍射光学器件表面增透膜的镀膜方法 |
| CN118689008B (zh) * | 2024-07-11 | 2025-09-16 | 杉金光电(南京)有限公司 | 一种面内切换液晶显示器 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5949508A (ja) * | 1982-09-14 | 1984-03-22 | Sony Corp | 複屈折板の製造方法 |
| JPH0335201A (ja) * | 1989-06-30 | 1991-02-15 | Nitto Denko Corp | 位相差板及びその製造方法 |
| DE69127319T2 (de) * | 1990-05-25 | 1998-03-19 | Sumitomo Chemical Co | Optischer Phasenverzögerer aus einem Polymerfilm und Verfahren zu seiner Herstellung |
| JPH05134115A (ja) * | 1991-11-11 | 1993-05-28 | Ricoh Opt Ind Co Ltd | 複屈折部材 |
| JPH05132768A (ja) * | 1991-11-13 | 1993-05-28 | Ricoh Co Ltd | 複屈折板およびその製造方法 |
| US5612801A (en) * | 1994-04-04 | 1997-03-18 | Rockwell Science Center, Inc. | Monolithic optical compensation device for improved viewing angle in liquid crystal displays |
| US5638197A (en) | 1994-04-04 | 1997-06-10 | Rockwell International Corp. | Inorganic thin film compensator for improved gray scale performance in twisted nematic liquid crystal displays and method of making |
| US5932354A (en) * | 1996-07-11 | 1999-08-03 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Obliquely deposited film element |
| US5866204A (en) * | 1996-07-23 | 1999-02-02 | The Governors Of The University Of Alberta | Method of depositing shadow sculpted thin films |
| JPH11211914A (ja) | 1998-01-21 | 1999-08-06 | Sumitomo Chem Co Ltd | 位相差フィルム |
| JPH11295525A (ja) * | 1998-04-08 | 1999-10-29 | Sumitomo Chem Co Ltd | 位相差フィルムの製造方法 |
| JP3458763B2 (ja) * | 1998-05-29 | 2003-10-20 | 株式会社豊田中央研究所 | 複屈折板 |
| EP0982604B1 (en) * | 1998-08-26 | 2003-04-23 | Nippon Telegraph and Telephone Corporation | Method for manufacturing optical filter |
| JP4009044B2 (ja) * | 1999-10-08 | 2007-11-14 | リコー光学株式会社 | 薄膜複屈折素子及びその製造方法及び製造装置 |
| JP2001228327A (ja) * | 2000-02-17 | 2001-08-24 | Sankyo Seiki Mfg Co Ltd | 複屈折板の製造方法 |
| JP2001228330A (ja) * | 2000-02-17 | 2001-08-24 | Sankyo Seiki Mfg Co Ltd | 複屈折板 |
| US6590707B1 (en) * | 2000-03-31 | 2003-07-08 | 3M Innovative Properties Company | Birefringent reflectors using isotropic materials and form birefringence |
| US6692850B2 (en) * | 2001-03-07 | 2004-02-17 | Axsun Technologies, Inc. | Controlled stress optical coatings for membranes |
| JP2004102200A (ja) * | 2002-07-19 | 2004-04-02 | Fuji Photo Film Co Ltd | 液晶プロジェクタ |
| JP4386407B2 (ja) | 2002-11-20 | 2009-12-16 | 富士フイルム株式会社 | 位相差補償システム及び液晶プロジェクタ |
| US6770353B1 (en) * | 2003-01-13 | 2004-08-03 | Hewlett-Packard Development Company, L.P. | Co-deposited films with nano-columnar structures and formation process |
| JP4475507B2 (ja) * | 2003-04-07 | 2010-06-09 | 大日本印刷株式会社 | 積層位相差層の製造方法 |
| JP2005037762A (ja) * | 2003-07-17 | 2005-02-10 | Sun Tec Kk | 光学素子、波長可変光フィルタ、光アドドロップモジュールおよび波長可変光源 |
| KR100677050B1 (ko) * | 2003-10-22 | 2007-01-31 | 주식회사 엘지화학 | ＋ａ-플레이트와 ＋ｃ-플레이트를 이용한 시야각보상필름을 포함하는 면상 스위칭 액정 표시장치 |
| EP1542044A1 (en) * | 2003-12-11 | 2005-06-15 | JDS Uniphase Corporation | Trim retarders incorporating negative birefringence |
| US7626661B2 (en) * | 2003-12-11 | 2009-12-01 | Jds Uniphase Corporation | Polarization controlling elements |
| US20060127830A1 (en) * | 2004-12-15 | 2006-06-15 | Xuegong Deng | Structures for polarization and beam control |
-
2006
- 2006-11-29 US US11/564,500 patent/US8094270B2/en active Active
- 2006-11-29 EP EP06256092A patent/EP1796400A1/en not_active Ceased
- 2006-12-04 CA CA2569970A patent/CA2569970C/en active Active
- 2006-12-05 JP JP2006327831A patent/JP5227507B2/ja not_active Expired - Fee Related
- 2006-12-05 TW TW095145178A patent/TWI420158B/zh not_active IP Right Cessation
- 2006-12-06 CN CN2006101621033A patent/CN1991420B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TW200741260A (en) | 2007-11-01 |
| US8094270B2 (en) | 2012-01-10 |
| JP2007188060A (ja) | 2007-07-26 |
| CN1991420A (zh) | 2007-07-04 |
| CA2569970A1 (en) | 2007-06-06 |
| TWI420158B (zh) | 2013-12-21 |
| CN1991420B (zh) | 2011-02-23 |
| EP1796400A1 (en) | 2007-06-13 |
| JP5227507B2 (ja) | 2013-07-03 |
| US20070195272A1 (en) | 2007-08-23 |
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