CA2085611A1 - Method of measuring the dew point and/or frost point of a gas having low water content and apparatus therefor - Google Patents
Method of measuring the dew point and/or frost point of a gas having low water content and apparatus thereforInfo
- Publication number
- CA2085611A1 CA2085611A1 CA002085611A CA2085611A CA2085611A1 CA 2085611 A1 CA2085611 A1 CA 2085611A1 CA 002085611 A CA002085611 A CA 002085611A CA 2085611 A CA2085611 A CA 2085611A CA 2085611 A1 CA2085611 A1 CA 2085611A1
- Authority
- CA
- Canada
- Prior art keywords
- reflector mirror
- temperature
- light
- point
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 62
- 238000000034 method Methods 0.000 title claims abstract description 41
- 238000001816 cooling Methods 0.000 claims abstract description 28
- 230000008859 change Effects 0.000 claims abstract description 23
- 230000003287 optical effect Effects 0.000 claims abstract description 10
- 230000003028 elevating effect Effects 0.000 claims abstract description 3
- 230000001678 irradiating effect Effects 0.000 claims abstract description 3
- 239000007789 gas Substances 0.000 claims description 133
- 238000009833 condensation Methods 0.000 claims description 26
- 230000005494 condensation Effects 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 22
- 238000005259 measurement Methods 0.000 claims description 22
- 239000004020 conductor Substances 0.000 claims description 20
- 230000007246 mechanism Effects 0.000 claims description 12
- 229920006395 saturated elastomer Polymers 0.000 claims description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 11
- 238000009825 accumulation Methods 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 238000007664 blowing Methods 0.000 claims description 3
- 238000011109 contamination Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- 230000006872 improvement Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims 1
- 239000008246 gaseous mixture Substances 0.000 claims 1
- 210000004027 cell Anatomy 0.000 description 33
- 239000000463 material Substances 0.000 description 15
- 229910052710 silicon Inorganic materials 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 239000011521 glass Substances 0.000 description 14
- 239000010703 silicon Substances 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 13
- 239000001307 helium Substances 0.000 description 13
- 229910052734 helium Inorganic materials 0.000 description 13
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 239000013307 optical fiber Substances 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 11
- 239000010935 stainless steel Substances 0.000 description 10
- 229910001220 stainless steel Inorganic materials 0.000 description 10
- 235000012431 wafers Nutrition 0.000 description 9
- 239000011651 chromium Substances 0.000 description 8
- 238000002474 experimental method Methods 0.000 description 8
- 229910052804 chromium Inorganic materials 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 238000002161 passivation Methods 0.000 description 5
- 239000004033 plastic Substances 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 239000009719 polyimide resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920002050 silicone resin Polymers 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 229910002482 Cu–Ni Inorganic materials 0.000 description 4
- 239000012080 ambient air Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000003795 desorption Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000004781 supercooling Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009429 electrical wiring Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000012595 freezing medium Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000001275 scanning Auger electron spectroscopy Methods 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- -1 ~old Substances 0.000 description 2
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 210000002421 cell wall Anatomy 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000013213 extrapolation Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000012887 quadratic function Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical group [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N25/00—Investigating or analyzing materials by the use of thermal means
- G01N25/56—Investigating or analyzing materials by the use of thermal means by investigating moisture content
- G01N25/66—Investigating or analyzing materials by the use of thermal means by investigating moisture content by investigating dew-point
- G01N25/68—Investigating or analyzing materials by the use of thermal means by investigating moisture content by investigating dew-point by varying the temperature of a condensing surface
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
Applications Claiming Priority (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8690591 | 1991-04-18 | ||
| JP86905/1991 | 1991-04-18 | ||
| JP86906/1991 | 1991-04-18 | ||
| JP8690691 | 1991-04-18 | ||
| JP35740591A JP2863662B2 (ja) | 1991-11-30 | 1991-11-30 | 低水分含有量を持ったガスの露点及び/又は霜点を測定する方法 |
| JP357405/1991 | 1991-11-30 | ||
| JP3357406A JPH05296927A (ja) | 1991-04-18 | 1991-12-01 | ガス中の微量水分測定装置 |
| JP357407/1991 | 1991-12-01 | ||
| JP3357407A JPH06109629A (ja) | 1991-04-18 | 1991-12-01 | ガス中の微量水分測定装置 |
| JP357406/1991 | 1991-12-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2085611A1 true CA2085611A1 (en) | 1992-10-19 |
Family
ID=27525244
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002085611A Abandoned CA2085611A1 (en) | 1991-04-18 | 1992-04-17 | Method of measuring the dew point and/or frost point of a gas having low water content and apparatus therefor |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0535248B1 (OSRAM) |
| KR (1) | KR100205839B1 (OSRAM) |
| CA (1) | CA2085611A1 (OSRAM) |
| DE (1) | DE69229493T2 (OSRAM) |
| TW (1) | TW213979B (OSRAM) |
| WO (1) | WO1992018854A1 (OSRAM) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2702049B1 (fr) * | 1993-02-24 | 1995-03-31 | Imra Europe Sa | Procédé et dispositif pour déterminer un risque de condensation d'eau sur une surface se trouvant au contact d'un volume d'air humide. |
| WO1996013713A1 (en) * | 1994-10-31 | 1996-05-09 | Osaka Sanso Kogyo Ltd. | Method of measuring the dew point and/or frost point of a gaz having low water content |
| FR2753533B1 (fr) * | 1996-09-17 | 1998-10-09 | Commissariat Energie Atomique | Procede et dispositif de caracterisation d'une modification au cours du temps de l'etat de condensation de gouttelettes sur une cible |
| CN108981799B (zh) * | 2018-06-22 | 2023-09-22 | 中国矿业大学(北京) | 一种便携式低温环境参数监测预警装置及方法 |
| CN113865288B (zh) * | 2021-10-14 | 2023-06-20 | 江苏鑫华半导体科技股份有限公司 | 评估袋装多晶硅干燥效果的方法 |
| CN114353220A (zh) * | 2021-12-28 | 2022-04-15 | 北京金茂人居环境科技有限公司 | 辐射空调环境监测方法、监测装置及电子设备 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3623356A (en) * | 1969-12-18 | 1971-11-30 | Eg & G Inc | Dew point hygrometer |
| US4629333A (en) * | 1984-10-19 | 1986-12-16 | Eg&G, Inc. | Chilled mirror hygrometer with performance monitoring |
| JPH07104304B2 (ja) * | 1987-06-11 | 1995-11-13 | 大阪酸素工業株式会社 | ガス中の微量水分量測定装置 |
| CH676152A5 (OSRAM) * | 1988-06-03 | 1990-12-14 | Arthur Mutter | |
| JPH0323348U (OSRAM) * | 1989-07-17 | 1991-03-11 |
-
1992
- 1992-04-17 TW TW081103026A patent/TW213979B/zh active
- 1992-04-17 EP EP92908343A patent/EP0535248B1/en not_active Expired - Lifetime
- 1992-04-17 CA CA002085611A patent/CA2085611A1/en not_active Abandoned
- 1992-04-17 DE DE69229493T patent/DE69229493T2/de not_active Expired - Lifetime
- 1992-04-17 WO PCT/JP1992/000492 patent/WO1992018854A1/en not_active Ceased
- 1992-12-17 KR KR1019920703265A patent/KR100205839B1/ko not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| WO1992018854A1 (en) | 1992-10-29 |
| DE69229493D1 (de) | 1999-08-05 |
| KR100205839B1 (en) | 1999-07-01 |
| KR930701737A (ko) | 1993-06-12 |
| EP0535248A1 (en) | 1993-04-07 |
| DE69229493T2 (de) | 1999-10-28 |
| TW213979B (OSRAM) | 1993-10-01 |
| EP0535248B1 (en) | 1999-06-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Dead |