CA2085337A1 - Laser a semiconducteur enfoui - Google Patents
Laser a semiconducteur enfouiInfo
- Publication number
- CA2085337A1 CA2085337A1 CA2085337A CA2085337A CA2085337A1 CA 2085337 A1 CA2085337 A1 CA 2085337A1 CA 2085337 A CA2085337 A CA 2085337A CA 2085337 A CA2085337 A CA 2085337A CA 2085337 A1 CA2085337 A1 CA 2085337A1
- Authority
- CA
- Canada
- Prior art keywords
- buried
- laser device
- type semiconductor
- semiconductor laser
- ridge mesa
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/3235—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers
- H01S5/32391—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers based on In(Ga)(As)P
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3353614A JPH05167191A (ja) | 1991-12-18 | 1991-12-18 | 埋め込み型半導体レーザ素子 |
JP3-353614 | 1991-12-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2085337A1 true CA2085337A1 (fr) | 1993-06-19 |
CA2085337C CA2085337C (fr) | 1998-10-20 |
Family
ID=18432039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002085337A Expired - Fee Related CA2085337C (fr) | 1991-12-18 | 1992-12-14 | Laser a semiconducteur enfoui |
Country Status (5)
Country | Link |
---|---|
US (1) | US5325385A (fr) |
EP (1) | EP0547850B1 (fr) |
JP (1) | JPH05167191A (fr) |
CA (1) | CA2085337C (fr) |
DE (1) | DE69209023D1 (fr) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2718342B2 (ja) * | 1993-05-28 | 1998-02-25 | 日本電気株式会社 | 半導体レーザ及びその製造方法 |
US5523256A (en) * | 1993-07-21 | 1996-06-04 | Matsushita Electric Industrial Co., Ltd. | Method for producing a semiconductor laser |
US5789772A (en) * | 1994-07-15 | 1998-08-04 | The Whitaker Corporation | Semi-insulating surface light emitting devices |
US5608234A (en) * | 1994-11-14 | 1997-03-04 | The Whitaker Corporation | Semi-insulating edge emitting light emitting diode |
US5629232A (en) * | 1994-11-14 | 1997-05-13 | The Whitaker Corporation | Method of fabricating semiconductor light emitting devices |
JPH09199803A (ja) * | 1996-01-23 | 1997-07-31 | Mitsubishi Electric Corp | 半導体レーザおよびその製造方法 |
US20060189571A1 (en) * | 2000-01-10 | 2006-08-24 | Saul Yedgar | Use of lipid conjugates in the treatment of infection |
DE60136261D1 (de) | 2001-01-18 | 2008-12-04 | Avago Tech Fiber Ip Sg Pte Ltd | Halbleiterbauelement mit Strombegrenzungstruktur |
KR20020078189A (ko) * | 2001-04-06 | 2002-10-18 | 한국전자통신연구원 | 매립형 리지 구조의 전류 차단층을 갖는 광소자 및 그제조 방법 |
EP1271722A1 (fr) * | 2001-06-25 | 2003-01-02 | Agilent Technologies, Inc. (a Delaware corporation) | Structure laser à semiconducteur et méthode de fabrication |
US6829275B2 (en) | 2001-12-20 | 2004-12-07 | Bookham Technology, Plc | Hybrid confinement layers of buried heterostructure semiconductor laser |
KR100620912B1 (ko) | 2003-12-05 | 2006-09-13 | 한국전자통신연구원 | 반도체 레이저 및 그 제작 방법 |
JP2010010622A (ja) * | 2008-06-30 | 2010-01-14 | Sumitomo Electric Ind Ltd | 半導体光素子 |
JP5195186B2 (ja) * | 2008-09-05 | 2013-05-08 | 三菱電機株式会社 | 半導体装置の製造方法 |
US10244181B2 (en) * | 2009-02-17 | 2019-03-26 | Trilumina Corp. | Compact multi-zone infrared laser illuminator |
US20130223846A1 (en) | 2009-02-17 | 2013-08-29 | Trilumina Corporation | High speed free-space optical communications |
US10038304B2 (en) | 2009-02-17 | 2018-07-31 | Trilumina Corp. | Laser arrays for variable optical properties |
US11095365B2 (en) | 2011-08-26 | 2021-08-17 | Lumentum Operations Llc | Wide-angle illuminator module |
JP2013149665A (ja) * | 2012-01-17 | 2013-08-01 | Sumitomo Electric Ind Ltd | 量子カスケード半導体レーザ |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58111388A (ja) * | 1981-12-25 | 1983-07-02 | Hitachi Ltd | 埋込ヘテロ形半導体レ−ザ |
JPS6092684A (ja) * | 1983-10-26 | 1985-05-24 | Nec Corp | 埋め込み型半導体レ−ザ |
EP0314372A3 (fr) * | 1987-10-29 | 1989-10-25 | AT&T Corp. | Région de confinement de courant et de blocage pour dispositifs à semi-conducteurs |
JPH0279486A (ja) * | 1988-09-14 | 1990-03-20 | Sharp Corp | 半導体レーザ素子 |
DE3929312A1 (de) * | 1989-09-04 | 1991-03-07 | Standard Elektrik Lorenz Ag | Halbleiterlaser |
-
1991
- 1991-12-18 JP JP3353614A patent/JPH05167191A/ja active Pending
-
1992
- 1992-12-14 EP EP92311363A patent/EP0547850B1/fr not_active Expired - Lifetime
- 1992-12-14 CA CA002085337A patent/CA2085337C/fr not_active Expired - Fee Related
- 1992-12-14 DE DE69209023T patent/DE69209023D1/de not_active Expired - Lifetime
- 1992-12-17 US US07/991,944 patent/US5325385A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5325385A (en) | 1994-06-28 |
DE69209023D1 (de) | 1996-04-18 |
JPH05167191A (ja) | 1993-07-02 |
EP0547850A1 (fr) | 1993-06-23 |
CA2085337C (fr) | 1998-10-20 |
EP0547850B1 (fr) | 1996-03-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |