CA1232915A - Compositions photosensibles a base de resine - Google Patents

Compositions photosensibles a base de resine

Info

Publication number
CA1232915A
CA1232915A CA000445119A CA445119A CA1232915A CA 1232915 A CA1232915 A CA 1232915A CA 000445119 A CA000445119 A CA 000445119A CA 445119 A CA445119 A CA 445119A CA 1232915 A CA1232915 A CA 1232915A
Authority
CA
Canada
Prior art keywords
surfactant
perfluorooctyl
fluorocarbon
photosensitive resin
mixtures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000445119A
Other languages
English (en)
Inventor
Takeo Kuramoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace KK
Original Assignee
WR Grace KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace KK filed Critical WR Grace KK
Application granted granted Critical
Publication of CA1232915A publication Critical patent/CA1232915A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
  • Polymerisation Methods In General (AREA)
CA000445119A 1983-01-28 1984-01-11 Compositions photosensibles a base de resine Expired CA1232915A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11249/83 1983-01-28
JP58011249A JPS59137943A (ja) 1983-01-28 1983-01-28 感光性樹脂組成物

Publications (1)

Publication Number Publication Date
CA1232915A true CA1232915A (fr) 1988-02-16

Family

ID=11772662

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000445119A Expired CA1232915A (fr) 1983-01-28 1984-01-11 Compositions photosensibles a base de resine

Country Status (7)

Country Link
JP (1) JPS59137943A (fr)
AU (1) AU556611B2 (fr)
CA (1) CA1232915A (fr)
DE (1) DE3402465A1 (fr)
GB (1) GB2134275B (fr)
IT (1) IT1206696B (fr)
NL (1) NL8400257A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61226746A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPS61226745A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPH0721626B2 (ja) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 半導体微細加工用レジスト組成物
JPH083630B2 (ja) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 感光性組成物
JPH06105351B2 (ja) * 1986-03-27 1994-12-21 富士写真フイルム株式会社 感光性組成物
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
JPH06105350B2 (ja) * 1987-07-13 1994-12-21 富士写真フイルム株式会社 平版印刷版用感光性組成物
JP2878150B2 (ja) * 1994-04-27 1999-04-05 東京応化工業株式会社 レジスト用塗布液およびこれを用いたレジスト材料

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3347676A (en) * 1964-04-30 1967-10-17 Du Pont Photopolymerizable compositions and process
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
DE3022362A1 (de) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung

Also Published As

Publication number Publication date
GB8401661D0 (en) 1984-02-22
DE3402465A1 (de) 1984-08-02
JPS59137943A (ja) 1984-08-08
GB2134275A (en) 1984-08-08
AU556611B2 (en) 1986-11-13
AU2371684A (en) 1984-08-02
GB2134275B (en) 1987-05-13
NL8400257A (nl) 1984-08-16
IT8419349A0 (it) 1984-01-27
IT1206696B (it) 1989-04-27

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Legal Events

Date Code Title Description
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