CA1123649A - Plaques d'impression constituees d'une couche de base ayant un taux de polymerisation plus eleve que celui de la couche d'impression superficielle - Google Patents

Plaques d'impression constituees d'une couche de base ayant un taux de polymerisation plus eleve que celui de la couche d'impression superficielle

Info

Publication number
CA1123649A
CA1123649A CA325,604A CA325604A CA1123649A CA 1123649 A CA1123649 A CA 1123649A CA 325604 A CA325604 A CA 325604A CA 1123649 A CA1123649 A CA 1123649A
Authority
CA
Canada
Prior art keywords
layer
unsaturated
printing
base layer
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA325,604A
Other languages
English (en)
Inventor
Norman E. Hughes
Bernard J. Scheve
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hercules LLC
Original Assignee
Hercules LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hercules LLC filed Critical Hercules LLC
Application granted granted Critical
Publication of CA1123649A publication Critical patent/CA1123649A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CA325,604A 1978-06-22 1979-04-17 Plaques d'impression constituees d'une couche de base ayant un taux de polymerisation plus eleve que celui de la couche d'impression superficielle Expired CA1123649A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US91799978A 1978-06-22 1978-06-22
US917,999 1978-06-22

Publications (1)

Publication Number Publication Date
CA1123649A true CA1123649A (fr) 1982-05-18

Family

ID=25439625

Family Applications (1)

Application Number Title Priority Date Filing Date
CA325,604A Expired CA1123649A (fr) 1978-06-22 1979-04-17 Plaques d'impression constituees d'une couche de base ayant un taux de polymerisation plus eleve que celui de la couche d'impression superficielle

Country Status (7)

Country Link
JP (1) JPS556392A (fr)
CA (1) CA1123649A (fr)
DE (1) DE2924848A1 (fr)
FR (1) FR2429450A1 (fr)
GB (1) GB2024441B (fr)
IT (1) IT1121875B (fr)
NL (1) NL184543C (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2122762B (en) * 1982-06-02 1986-01-08 Grace W R & Co Flexographic printing plates methods of their production and laminates for use in their production
EP0097012B2 (fr) * 1982-06-10 1990-12-19 Jotun Polymer (UK) LTD. Résines photodurcissables et leur utilisation
JPS6172235A (ja) * 1984-09-14 1986-04-14 Konishiroku Photo Ind Co Ltd ハロゲン化銀カラ−写真感光材料
JPS6257264U (fr) * 1985-09-28 1987-04-09
JPS6287340U (fr) * 1985-11-19 1987-06-04
JPS62124559A (ja) * 1985-11-25 1987-06-05 Asahi Chem Ind Co Ltd 感光性樹脂製凸版
JPS62296142A (ja) * 1986-06-17 1987-12-23 Asahi Chem Ind Co Ltd バ−コ−ドシンボル印刷用多層化感光性樹脂版
JPH07113767B2 (ja) * 1986-10-02 1995-12-06 旭化成工業株式会社 段ボ−ル印刷用感光性樹脂印刷版
JPS63285551A (ja) * 1987-05-18 1988-11-22 Nippon Paint Co Ltd 水現像性印刷用版材
EP0335399B1 (fr) * 1988-03-31 1996-08-21 Asahi Kasei Kogyo Kabushiki Kaisha Photoréserve pour plaque d'impression en relief
DE69130102T2 (de) * 1990-05-21 1999-05-20 Asahi Chemical Ind Hochdruckplatte mit photovernetzbarem kunststoff
DE69121329T2 (de) * 1990-06-18 1997-01-02 Nippon Paint Co Ltd Lichtempfindliche Flexodruckzusammensetzung
US5254437A (en) * 1990-06-18 1993-10-19 Nippon Paint Co., Ltd. Photosensitive resin composition for flexographic printing
JP3423077B2 (ja) * 1993-08-25 2003-07-07 ダブリュ・アール・グレイス・アンド・カンパニー・コネテイカット 版面の製造方法
IT1401671B1 (it) * 2010-06-17 2013-08-02 Ciemmezeta S R L Lastra per produzione di cliche' e metodo di realizzazione di detta lastra per produzione di cliche'

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2964401A (en) * 1957-02-18 1960-12-13 Du Pont Photopolymerizable elements and processes
GB841454A (en) * 1957-09-16 1960-07-13 Du Pont Improvements in or relating to photopolymerisable elements
NL245513A (fr) * 1959-01-23
BE623613A (fr) * 1961-10-16
NL129237C (fr) * 1965-03-11
DE1572303A1 (de) * 1967-04-11 1970-01-08 Basf Ag Verfahren zum Aufbringen lichtempfindlicher Schichten aus Polyamiden auf metallische Unterlagen
US3858510A (en) * 1971-03-11 1975-01-07 Asahi Chemical Ind Relief structures prepared from photosensitive compositions
JPS5033767B1 (fr) * 1971-03-11 1975-11-04
DE2300371C3 (de) * 1973-01-05 1979-04-19 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare Druckplatte für den Flexodruck
DE2301175A1 (de) * 1973-01-11 1974-08-01 Basf Ag Verfahren zur herstellung von druckformen fuer den flexodruck und mehrschichtenplatten hierfuer
DE2444118C2 (de) * 1974-09-14 1987-02-12 Basf Ag, 6700 Ludwigshafen Mehrschichtige Druckplatte sowie mehrschichtige Reliefdruckform für den Flexodruck
DE2456439A1 (de) * 1974-11-29 1976-08-12 Basf Ag Mehrschichtenverbundplatten fuer die herstellung von flexodruckformen
JPS5492402A (en) * 1977-12-28 1979-07-21 Asahi Chemical Ind Photosensitive resin relief printing and fabrication

Also Published As

Publication number Publication date
JPH033211B2 (fr) 1991-01-18
FR2429450B1 (fr) 1984-06-22
DE2924848C2 (fr) 1988-01-28
NL184543B (nl) 1989-03-16
JPS556392A (en) 1980-01-17
DE2924848A1 (de) 1980-01-17
GB2024441A (en) 1980-01-09
IT1121875B (it) 1986-04-23
NL184543C (nl) 1989-08-16
NL7904847A (nl) 1979-12-28
IT7923775A0 (it) 1979-06-21
GB2024441B (en) 1983-01-12
FR2429450A1 (fr) 1980-01-18

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Legal Events

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MKEX Expiry