CA1118535A - Discharge device and method for use in processing semiconductor devices - Google Patents

Discharge device and method for use in processing semiconductor devices

Info

Publication number
CA1118535A
CA1118535A CA000312138A CA312138A CA1118535A CA 1118535 A CA1118535 A CA 1118535A CA 000312138 A CA000312138 A CA 000312138A CA 312138 A CA312138 A CA 312138A CA 1118535 A CA1118535 A CA 1118535A
Authority
CA
Canada
Prior art keywords
wafer
holder
electron beam
resist
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000312138A
Other languages
English (en)
French (fr)
Inventor
John J. Zasio
Michael W. Samuels
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of CA1118535A publication Critical patent/CA1118535A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0277—Electrolithographic processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CA000312138A 1977-10-11 1978-09-26 Discharge device and method for use in processing semiconductor devices Expired CA1118535A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US84067477A 1977-10-11 1977-10-11
US840,674 1977-10-11

Publications (1)

Publication Number Publication Date
CA1118535A true CA1118535A (en) 1982-02-16

Family

ID=25282934

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000312138A Expired CA1118535A (en) 1977-10-11 1978-09-26 Discharge device and method for use in processing semiconductor devices

Country Status (6)

Country Link
JP (1) JPS5464477A (enrdf_load_stackoverflow)
CA (1) CA1118535A (enrdf_load_stackoverflow)
DE (1) DE2843310C2 (enrdf_load_stackoverflow)
FR (1) FR2406304A1 (enrdf_load_stackoverflow)
GB (1) GB1604004A (enrdf_load_stackoverflow)
NL (1) NL7810167A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55162004A (en) * 1979-06-06 1980-12-17 Toshiba Corp Electric charge corpuscular ray irradiation unit
US4323638A (en) * 1980-08-18 1982-04-06 Bell Telephone Laboratories, Incorporated Reducing charging effects in charged-particle-beam lithography
JPS5744543U (enrdf_load_stackoverflow) * 1980-08-27 1982-03-11
US7038204B2 (en) 2004-05-26 2006-05-02 International Business Machines Corporation Method for reducing proximity effects in electron beam lithography

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3390012A (en) * 1964-05-14 1968-06-25 Texas Instruments Inc Method of making dielectric bodies having conducting portions
DE1800193A1 (de) * 1968-10-01 1970-05-14 Telefunken Patent Verfahren zum Herstellen von Kontakten
DE1800212A1 (de) * 1968-10-01 1970-05-06 Telefunken Patent Verfahren zum Herstellen einer Halbleiteranordnung
US3710101A (en) * 1970-10-06 1973-01-09 Westinghouse Electric Corp Apparatus and method for alignment of members to electron beams
JPS5183788A (en) * 1974-12-12 1976-07-22 Du Pont Daioodo oyobi kanrendodenrookeiseisurukozotai

Also Published As

Publication number Publication date
JPS6129534B2 (enrdf_load_stackoverflow) 1986-07-07
NL7810167A (nl) 1979-04-17
DE2843310C2 (de) 1983-06-01
GB1604004A (en) 1981-12-02
FR2406304A1 (fr) 1979-05-11
FR2406304B1 (enrdf_load_stackoverflow) 1983-01-07
DE2843310A1 (de) 1979-04-19
JPS5464477A (en) 1979-05-24

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