CA1115401A - Enduit verrier pour dispositifs optiques semiconducteurs - Google Patents
Enduit verrier pour dispositifs optiques semiconducteursInfo
- Publication number
- CA1115401A CA1115401A CA309,941A CA309941A CA1115401A CA 1115401 A CA1115401 A CA 1115401A CA 309941 A CA309941 A CA 309941A CA 1115401 A CA1115401 A CA 1115401A
- Authority
- CA
- Canada
- Prior art keywords
- glass
- coating
- semiconductor material
- range
- gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 25
- 239000011521 glass Substances 0.000 title claims abstract description 22
- 230000003287 optical effect Effects 0.000 title claims abstract description 21
- 238000000576 coating method Methods 0.000 title abstract description 28
- 239000011248 coating agent Substances 0.000 title abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 24
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 15
- 239000000377 silicon dioxide Substances 0.000 claims description 12
- 229910052681 coesite Inorganic materials 0.000 claims description 11
- 229910052906 cristobalite Inorganic materials 0.000 claims description 11
- 235000012239 silicon dioxide Nutrition 0.000 claims description 11
- 229910052682 stishovite Inorganic materials 0.000 claims description 11
- 229910052905 tridymite Inorganic materials 0.000 claims description 11
- 239000003989 dielectric material Substances 0.000 claims description 4
- -1 GaAlAs Inorganic materials 0.000 claims 1
- 239000005368 silicate glass Substances 0.000 abstract description 13
- 238000002310 reflectometry Methods 0.000 abstract description 12
- 238000004544 sputter deposition Methods 0.000 abstract description 5
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 13
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 description 10
- 239000000203 mixture Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/08—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances quartz; glass; glass wool; slag wool; vitreous enamels
- H01B3/087—Chemical composition of glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
- H01L2224/05553—Shape in top view being rectangular
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12043—Photo diode
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Semiconductor Lasers (AREA)
- Led Device Packages (AREA)
- Glass Compositions (AREA)
- Led Devices (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US84077877A | 1977-10-11 | 1977-10-11 | |
US840,778 | 1977-10-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1115401A true CA1115401A (fr) | 1981-12-29 |
Family
ID=25283207
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA309,941A Expired CA1115401A (fr) | 1977-10-11 | 1978-08-24 | Enduit verrier pour dispositifs optiques semiconducteurs |
Country Status (10)
Country | Link |
---|---|
JP (1) | JPS5464483A (fr) |
BE (1) | BE871127A (fr) |
CA (1) | CA1115401A (fr) |
CH (1) | CH635466A5 (fr) |
DE (1) | DE2843280A1 (fr) |
FR (1) | FR2406309A1 (fr) |
GB (1) | GB2005917B (fr) |
IT (1) | IT1099271B (fr) |
NL (1) | NL7810206A (fr) |
SE (1) | SE7810313L (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4751708A (en) * | 1982-03-29 | 1988-06-14 | International Business Machines Corporation | Semiconductor injection lasers |
JPS60217685A (ja) * | 1984-04-13 | 1985-10-31 | Hitachi Ltd | 発光素子 |
DE69118482T2 (de) * | 1990-11-07 | 1996-08-22 | Fuji Electric Co Ltd | Laserdiode mit einer Schutzschicht auf ihrer lichtemittierenden Endfläche |
US5488623A (en) * | 1990-11-07 | 1996-01-30 | Fuji Electric Co., Ltd. | Mold-type semiconductor laser device with reduced light-emitting point displacement during operation |
US5444726A (en) * | 1990-11-07 | 1995-08-22 | Fuji Electric Co., Ltd. | Semiconductor laser device |
US20080049431A1 (en) * | 2006-08-24 | 2008-02-28 | Heather Debra Boek | Light emitting device including anti-reflection layer(s) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR87810E (fr) * | 1961-09-29 | 1966-05-20 | Ibm | Objets revêtus et procédé de réalisation de leurs revêtements protecteurs |
GB1250099A (fr) * | 1969-04-14 | 1971-10-20 | ||
US3676756A (en) * | 1969-09-18 | 1972-07-11 | Innotech Corp | Insulated gate field effect device having glass gate insulator |
GB1352959A (en) * | 1972-11-09 | 1974-05-15 | Standard Telephones Cables Ltd | Passivation of semiconductor devices |
-
1978
- 1978-08-24 CA CA309,941A patent/CA1115401A/fr not_active Expired
- 1978-10-02 SE SE7810313A patent/SE7810313L/xx unknown
- 1978-10-04 DE DE19782843280 patent/DE2843280A1/de not_active Withdrawn
- 1978-10-06 GB GB7839538A patent/GB2005917B/en not_active Expired
- 1978-10-09 IT IT28555/78A patent/IT1099271B/it active
- 1978-10-09 FR FR7828753A patent/FR2406309A1/fr active Granted
- 1978-10-10 BE BE191005A patent/BE871127A/fr not_active IP Right Cessation
- 1978-10-10 NL NL7810206A patent/NL7810206A/xx not_active Application Discontinuation
- 1978-10-10 CH CH1051978A patent/CH635466A5/de not_active IP Right Cessation
- 1978-10-11 JP JP12421578A patent/JPS5464483A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
GB2005917B (en) | 1982-01-20 |
FR2406309A1 (fr) | 1979-05-11 |
CH635466A5 (de) | 1983-03-31 |
JPS5464483A (en) | 1979-05-24 |
IT1099271B (it) | 1985-09-18 |
NL7810206A (nl) | 1979-04-17 |
IT7828555A0 (it) | 1978-10-09 |
GB2005917A (en) | 1979-04-25 |
FR2406309B1 (fr) | 1982-05-14 |
SE7810313L (sv) | 1979-04-12 |
DE2843280A1 (de) | 1979-04-12 |
BE871127A (fr) | 1979-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4317086A (en) | Passivation and reflector structure for electroluminescent devices | |
US6396864B1 (en) | Thermally conductive coatings for light emitting devices | |
US4749255A (en) | Coating for optical devices | |
US6800500B2 (en) | III-nitride light emitting devices fabricated by substrate removal | |
US5189679A (en) | Strained quantum well laser for high temperature operation | |
EP0550963A1 (fr) | Utilisation d'une structure semiconductrice comme diode émettrice de lumière | |
US4821276A (en) | Super-luminescent diode | |
US3849738A (en) | Multilayer antireflection coatings for solid state lasers | |
EP0674017A1 (fr) | Revêtement en oxyde de gallium pour dispositifs optoélectroniques | |
JPH05251819A (ja) | 電子ビーム蒸着多層ミラーを有する光デバイス | |
JPH04229689A (ja) | 発光半導体ダイオード及びその製造方法 | |
EP0366472A2 (fr) | Dispositif laser à semi-conducteur | |
CA1115401A (fr) | Enduit verrier pour dispositifs optiques semiconducteurs | |
EP0266826B1 (fr) | Laser à semi-conducteur et son procédé de fabrication | |
GB2098385A (en) | Positive index lateral waveguide semiconductor laser | |
JPH0745910A (ja) | 半導体レーザー | |
US4416011A (en) | Semiconductor light emitting device | |
EP0845819A1 (fr) | Revêtements en oxyde d'aluminium/yttrium pour composants optiques actifs | |
Oe et al. | GaInAsP/InP planar stripe lasers prepared by using sputtered SiO2 film as a Zn‐diffusion mask | |
JP3101997B2 (ja) | 窒化物半導体レーザ素子 | |
JPS63128690A (ja) | 半導体レ−ザ素子 | |
JPH0447979Y2 (fr) | ||
US6748003B1 (en) | Intracavity semiconductor lens for optoelectronic devices | |
JPS6237828B2 (fr) | ||
JP2001042169A (ja) | 光学装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry | ||
MKEX | Expiry |
Effective date: 19981229 |