CA1056701A - Selectively stripping tin or tin lead alloys from copper substrates - Google Patents
Selectively stripping tin or tin lead alloys from copper substratesInfo
- Publication number
- CA1056701A CA1056701A CA231,484A CA231484A CA1056701A CA 1056701 A CA1056701 A CA 1056701A CA 231484 A CA231484 A CA 231484A CA 1056701 A CA1056701 A CA 1056701A
- Authority
- CA
- Canada
- Prior art keywords
- acid
- tin
- solution
- lead
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title claims abstract description 56
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 48
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 48
- 239000010949 copper Substances 0.000 title claims abstract description 48
- 229910001174 tin-lead alloy Inorganic materials 0.000 title claims abstract description 38
- 229910001128 Sn alloy Inorganic materials 0.000 title claims abstract description 29
- 239000000758 substrate Substances 0.000 title claims abstract description 26
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims abstract description 67
- 239000002253 acid Substances 0.000 claims abstract description 49
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 33
- 150000007522 mineralic acids Chemical class 0.000 claims abstract description 21
- 150000003839 salts Chemical class 0.000 claims abstract description 16
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 11
- 150000007524 organic acids Chemical class 0.000 claims abstract description 10
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 8
- 125000001246 bromo group Chemical group Br* 0.000 claims abstract description 8
- 125000001309 chloro group Chemical group Cl* 0.000 claims abstract description 8
- 239000007864 aqueous solution Substances 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 5
- 239000001257 hydrogen Substances 0.000 claims abstract description 5
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 46
- 239000000243 solution Substances 0.000 claims description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 24
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 23
- 235000019253 formic acid Nutrition 0.000 claims description 23
- 239000000470 constituent Substances 0.000 claims description 18
- 229910000679 solder Inorganic materials 0.000 claims description 15
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 claims description 15
- 125000003118 aryl group Chemical group 0.000 claims description 14
- 230000002378 acidificating effect Effects 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 claims description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 7
- 239000011737 fluorine Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 125000001424 substituent group Chemical group 0.000 claims description 5
- 229940106681 chloroacetic acid Drugs 0.000 claims 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 2
- 239000003929 acidic solution Substances 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 13
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 13
- 229960004319 trichloroacetic acid Drugs 0.000 description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 12
- 229910052737 gold Inorganic materials 0.000 description 12
- 239000010931 gold Substances 0.000 description 12
- LJRGBERXYNQPJI-UHFFFAOYSA-M sodium;3-nitrobenzenesulfonate Chemical compound [Na+].[O-][N+](=O)C1=CC=CC(S([O-])(=O)=O)=C1 LJRGBERXYNQPJI-UHFFFAOYSA-M 0.000 description 12
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 11
- 239000004327 boric acid Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 238000007747 plating Methods 0.000 description 8
- 229910002056 binary alloy Inorganic materials 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- -1 e.g. Chemical compound 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 6
- HLHNOIAOWQFNGW-UHFFFAOYSA-N 3-bromo-4-hydroxybenzonitrile Chemical compound OC1=CC=C(C#N)C=C1Br HLHNOIAOWQFNGW-UHFFFAOYSA-N 0.000 description 5
- 229910004039 HBF4 Inorganic materials 0.000 description 5
- 230000002441 reversible effect Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- VLCDUOXHFNUCKK-UHFFFAOYSA-N N,N'-Dimethylthiourea Chemical compound CNC(=S)NC VLCDUOXHFNUCKK-UHFFFAOYSA-N 0.000 description 3
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 description 3
- UJJUJHTVDYXQON-UHFFFAOYSA-N nitro benzenesulfonate Chemical compound [O-][N+](=O)OS(=O)(=O)C1=CC=CC=C1 UJJUJHTVDYXQON-UHFFFAOYSA-N 0.000 description 3
- AIRRELHUAAZTTL-UHFFFAOYSA-N 3-nitrobenzenesulfonic acid;sodium Chemical compound [Na].OS(=O)(=O)C1=CC=CC([N+]([O-])=O)=C1 AIRRELHUAAZTTL-UHFFFAOYSA-N 0.000 description 2
- ONMOULMPIIOVTQ-UHFFFAOYSA-N 98-47-5 Chemical compound OS(=O)(=O)C1=CC=CC([N+]([O-])=O)=C1 ONMOULMPIIOVTQ-UHFFFAOYSA-N 0.000 description 2
- FLVIGYVXZHLUHP-UHFFFAOYSA-N N,N'-diethylthiourea Chemical compound CCNC(=S)NCC FLVIGYVXZHLUHP-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- SIEILFNCEFEENQ-UHFFFAOYSA-N dibromoacetic acid Chemical compound OC(=O)C(Br)Br SIEILFNCEFEENQ-UHFFFAOYSA-N 0.000 description 2
- 229960005215 dichloroacetic acid Drugs 0.000 description 2
- FPHIOHCCQGUGKU-UHFFFAOYSA-L difluorolead Chemical compound F[Pb]F FPHIOHCCQGUGKU-UHFFFAOYSA-L 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- WWYNJERNGUHSAO-XUDSTZEESA-N (+)-Norgestrel Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](CC)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 WWYNJERNGUHSAO-XUDSTZEESA-N 0.000 description 1
- AUXGIIVHLRLBSG-UHFFFAOYSA-N 1,3-dipropylthiourea Chemical compound CCCNC(=S)NCCC AUXGIIVHLRLBSG-UHFFFAOYSA-N 0.000 description 1
- OTLNPYWUJOZPPA-UHFFFAOYSA-N 4-nitrobenzoic acid Chemical class OC(=O)C1=CC=C([N+]([O-])=O)C=C1 OTLNPYWUJOZPPA-UHFFFAOYSA-N 0.000 description 1
- BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical class OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 description 1
- HWTDMFJYBAURQR-UHFFFAOYSA-N 80-82-0 Chemical compound OS(=O)(=O)C1=CC=CC=C1[N+]([O-])=O HWTDMFJYBAURQR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UOACKFBJUYNSLK-XRKIENNPSA-N Estradiol Cypionate Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H](C4=CC=C(O)C=C4CC3)CC[C@@]21C)C(=O)CCC1CCCC1 UOACKFBJUYNSLK-XRKIENNPSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- KDPAWGWELVVRCH-UHFFFAOYSA-N bromoacetic acid Chemical compound OC(=O)CBr KDPAWGWELVVRCH-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000008422 chlorobenzenes Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 1
- 125000005491 p-nitrobenzenesulfonic acid group Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 238000005494 tarnishing Methods 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/30—Acidic compositions for etching other metallic material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/067—Etchants
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Printed Wiring (AREA)
- ing And Chemical Polishing (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/497,435 US4004956A (en) | 1974-08-14 | 1974-08-14 | Selectively stripping tin or tin-lead alloys from copper substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1056701A true CA1056701A (en) | 1979-06-19 |
Family
ID=23976859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA231,484A Expired CA1056701A (en) | 1974-08-14 | 1975-07-15 | Selectively stripping tin or tin lead alloys from copper substrates |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4004956A (OSRAM) |
| JP (1) | JPS5420179B2 (OSRAM) |
| AU (1) | AU8338375A (OSRAM) |
| BE (1) | BE832477A (OSRAM) |
| BR (1) | BR7505001A (OSRAM) |
| CA (1) | CA1056701A (OSRAM) |
| CH (1) | CH606488A5 (OSRAM) |
| DE (1) | DE2536404C2 (OSRAM) |
| ES (1) | ES440237A1 (OSRAM) |
| FR (1) | FR2281998A1 (OSRAM) |
| GB (1) | GB1507726A (OSRAM) |
| SE (1) | SE417218B (OSRAM) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4297257A (en) * | 1980-04-17 | 1981-10-27 | Dart Industries Inc. | Metal stripping composition and method |
| IT1144797B (it) * | 1981-10-14 | 1986-10-29 | Alfachimici Spa | Soluzione per l asportazione di stagno o lega stagno piombo da un substrato mediante operazione a spruzzo |
| USRE32555E (en) * | 1982-09-20 | 1987-12-08 | Circuit Chemistry Corporation | Solder stripping solution |
| US4397753A (en) * | 1982-09-20 | 1983-08-09 | Circuit Chemistry Corporation | Solder stripping solution |
| DE3511514A1 (de) * | 1984-04-02 | 1985-10-10 | Parker Chemical Co., Madison Heights, Mich. | Verfahren und waessrige, saure reinigungsloesung zur reinigung von aluminiumoberflaechen |
| US4687545A (en) * | 1986-06-18 | 1987-08-18 | Macdermid, Incorporated | Process for stripping tin or tin-lead alloy from copper |
| US4978423A (en) * | 1988-09-26 | 1990-12-18 | At&T Bell Laboratories | Selective solder formation on printed circuit boards |
| US4957653A (en) * | 1989-04-07 | 1990-09-18 | Macdermid, Incorporated | Composition containing alkane sulfonic acid and ferric nitrate for stripping tin or tin-lead alloy from copper surfaces, and method for stripping tin or tin-lead alloy |
| US4944851A (en) * | 1989-06-05 | 1990-07-31 | Macdermid, Incorporated | Electrolytic method for regenerating tin or tin-lead alloy stripping compositions |
| US4921571A (en) * | 1989-07-28 | 1990-05-01 | Macdermid, Incorporated | Inhibited composition and method for stripping tin, lead or tin-lead alloy from copper surfaces |
| JPH0375386A (ja) * | 1989-08-18 | 1991-03-29 | Metsuku Kk | 錫又は錫‐鉛合金の剥離方法 |
| US5017267A (en) * | 1990-07-17 | 1991-05-21 | Macdermid, Incorporated | Composition and method for stripping tin or tin-lead alloy from copper surfaces |
| DE4113283C2 (de) * | 1991-04-24 | 1994-05-05 | Kernforschungsz Karlsruhe | Verwendung einer Ätzlösung zum selektiven Abätzen einer metallischen Opferschicht bei der Herstellung von Mikrostrukturen |
| US5219484A (en) * | 1991-04-25 | 1993-06-15 | Applied Electroless Concepts Inc. | Solder and tin stripper compositions |
| DE4219667C2 (de) * | 1992-06-16 | 1994-12-01 | Kernforschungsz Karlsruhe | Werkzeug und Verfahren zur Herstellung einer mikrostrukturierten Kunststoffschicht |
| US5824631A (en) * | 1994-06-03 | 1998-10-20 | Wagenknecht; John H. | Compositions for dissolution of soft metals |
| US5565039A (en) * | 1994-06-03 | 1996-10-15 | Wagenknecht; John H. | Method for dissolution of soft metals from a substrate of a harder metal |
| US6045686A (en) * | 1997-03-18 | 2000-04-04 | The University Of Connecticut | Method and apparatus for electrochemical delacquering and detinning |
| JP2001073182A (ja) * | 1999-07-15 | 2001-03-21 | Boc Group Inc:The | 改良された酸性銅電気メッキ用溶液 |
| DE60000499T2 (de) * | 2000-03-17 | 2003-03-27 | Ruvaris S.R.L., Pogno No | Verfahren und Bad zur selektiven Bleientfernung von Sanitärkomponenten aus Kupferlegierungen |
| US6833328B1 (en) | 2000-06-09 | 2004-12-21 | General Electric Company | Method for removing a coating from a substrate, and related compositions |
| US6863738B2 (en) * | 2001-01-29 | 2005-03-08 | General Electric Company | Method for removing oxides and coatings from a substrate |
| EP1302569A3 (en) * | 2001-10-11 | 2004-03-03 | Shipley Co. L.L.C. | Stripping solution |
| US20040169013A1 (en) * | 2003-02-28 | 2004-09-02 | General Electric Company | Method for chemically removing aluminum-containing materials from a substrate |
| US6953533B2 (en) * | 2003-06-16 | 2005-10-11 | General Electric Company | Process for removing chromide coatings from metal substrates, and related compositions |
| US20100147803A1 (en) * | 2008-12-15 | 2010-06-17 | General Electric Company | Process for removing metallic material from casted substates, and related compositions |
| JP6429079B2 (ja) * | 2015-02-12 | 2018-11-28 | メック株式会社 | エッチング液及びエッチング方法 |
| EP3059277B2 (en) * | 2015-02-23 | 2022-03-30 | MacDermid Enthone Inc. | Inhibitor composition for racks when using chrome free etches in a plating on plastics process |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2652360A (en) * | 1951-05-10 | 1953-09-15 | Pure Oil Co | Acidizing siliceous earth formations |
| GB885241A (en) * | 1959-08-07 | 1961-12-20 | Charles Hill & Co Ltd | An improved chemical polishing solution for use upon zinc base alloys |
| US3061494A (en) * | 1959-10-05 | 1962-10-30 | Boeing Co | Process of chemical milling and acid aqueous bath used therefor |
| US3677949A (en) * | 1970-09-04 | 1972-07-18 | Enthone | Selectively stripping tin and/or lead from copper substrates |
| US3888778A (en) * | 1973-03-13 | 1975-06-10 | Merton Beckwith | Bright dip composition for tin/lead |
-
1974
- 1974-08-14 US US05/497,435 patent/US4004956A/en not_active Expired - Lifetime
-
1975
- 1975-07-15 CA CA231,484A patent/CA1056701A/en not_active Expired
- 1975-07-25 AU AU83383/75A patent/AU8338375A/en not_active Expired
- 1975-08-06 JP JP9507475A patent/JPS5420179B2/ja not_active Expired
- 1975-08-06 GB GB32913/75A patent/GB1507726A/en not_active Expired
- 1975-08-06 BR BR7505001*A patent/BR7505001A/pt unknown
- 1975-08-11 CH CH1045175A patent/CH606488A5/xx not_active IP Right Cessation
- 1975-08-13 SE SE7509065A patent/SE417218B/xx not_active IP Right Cessation
- 1975-08-13 ES ES440237A patent/ES440237A1/es not_active Expired
- 1975-08-13 FR FR7525240A patent/FR2281998A1/fr active Granted
- 1975-08-14 DE DE2536404A patent/DE2536404C2/de not_active Expired
- 1975-08-14 BE BE159248A patent/BE832477A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| AU8338375A (en) | 1976-10-21 |
| FR2281998A1 (fr) | 1976-03-12 |
| SE417218B (sv) | 1981-03-02 |
| JPS5420179B2 (OSRAM) | 1979-07-20 |
| CH606488A5 (OSRAM) | 1978-10-31 |
| US4004956A (en) | 1977-01-25 |
| ES440237A1 (es) | 1977-06-16 |
| GB1507726A (en) | 1978-04-19 |
| BE832477A (fr) | 1976-02-16 |
| AU477223B2 (OSRAM) | 1976-10-21 |
| DE2536404A1 (de) | 1976-03-04 |
| BR7505001A (pt) | 1976-08-03 |
| JPS5142028A (OSRAM) | 1976-04-09 |
| SE7509065L (sv) | 1976-02-16 |
| DE2536404C2 (de) | 1984-05-10 |
| FR2281998B3 (OSRAM) | 1978-04-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
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