BRPI0811234A2 - Filme, e, método para fabricar uma imagem em relevo. - Google Patents

Filme, e, método para fabricar uma imagem em relevo.

Info

Publication number
BRPI0811234A2
BRPI0811234A2 BRPI0811234-7A2A BRPI0811234A BRPI0811234A2 BR PI0811234 A2 BRPI0811234 A2 BR PI0811234A2 BR PI0811234 A BRPI0811234 A BR PI0811234A BR PI0811234 A2 BRPI0811234 A2 BR PI0811234A2
Authority
BR
Brazil
Prior art keywords
movie
manufacturing
relief image
relief
image
Prior art date
Application number
BRPI0811234-7A2A
Other languages
English (en)
Portuguese (pt)
Inventor
Gregory L Zwadio
David Edgard Brown
Elsie Anderson Fohrenkamm
Axel Peter Stolt
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of BRPI0811234A2 publication Critical patent/BRPI0811234A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
BRPI0811234-7A2A 2007-06-05 2008-06-03 Filme, e, método para fabricar uma imagem em relevo. BRPI0811234A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/758,042 US7799504B2 (en) 2007-06-05 2007-06-05 Mask film to form relief images and method of use
PCT/US2008/006960 WO2008153850A1 (en) 2007-06-05 2008-06-03 Mask film to form relief images and method of use

Publications (1)

Publication Number Publication Date
BRPI0811234A2 true BRPI0811234A2 (pt) 2014-11-04

Family

ID=39717771

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0811234-7A2A BRPI0811234A2 (pt) 2007-06-05 2008-06-03 Filme, e, método para fabricar uma imagem em relevo.

Country Status (8)

Country Link
US (3) US7799504B2 (enExample)
EP (2) EP2153278B1 (enExample)
JP (1) JP5368432B2 (enExample)
CN (1) CN101681091B (enExample)
AU (1) AU2008262404B2 (enExample)
BR (1) BRPI0811234A2 (enExample)
ES (2) ES2719680T3 (enExample)
WO (1) WO2008153850A1 (enExample)

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Also Published As

Publication number Publication date
ES2719680T3 (es) 2019-07-12
JP2010531462A (ja) 2010-09-24
US8632944B2 (en) 2014-01-21
ES2608411T3 (es) 2017-04-10
AU2008262404A1 (en) 2008-12-18
US7799504B2 (en) 2010-09-21
EP3139210A1 (en) 2017-03-08
US20120219773A1 (en) 2012-08-30
EP3139210B1 (en) 2019-01-09
CN101681091A (zh) 2010-03-24
US8198012B2 (en) 2012-06-12
JP5368432B2 (ja) 2013-12-18
EP2153278B1 (en) 2016-09-21
US20080305407A1 (en) 2008-12-11
EP2153278A1 (en) 2010-02-17
CN101681091B (zh) 2013-04-03
WO2008153850A1 (en) 2008-12-18
AU2008262404B2 (en) 2013-06-13
US20100167209A1 (en) 2010-07-01

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