AU2008262404B2 - Mask film to form relief images and method of use - Google Patents
Mask film to form relief images and method of use Download PDFInfo
- Publication number
- AU2008262404B2 AU2008262404B2 AU2008262404A AU2008262404A AU2008262404B2 AU 2008262404 B2 AU2008262404 B2 AU 2008262404B2 AU 2008262404 A AU2008262404 A AU 2008262404A AU 2008262404 A AU2008262404 A AU 2008262404A AU 2008262404 B2 AU2008262404 B2 AU 2008262404B2
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- AU
- Australia
- Prior art keywords
- layer
- film
- radiation
- transparent
- carrier sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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- 150000002576 ketones Chemical class 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 description 1
- 125000005487 naphthalate group Chemical group 0.000 description 1
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical compound N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
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- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
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- 125000001476 phosphono group Chemical group [H]OP(*)(=O)O[H] 0.000 description 1
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- 229920000771 poly (alkylcyanoacrylate) Polymers 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
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- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001141 propulsive effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
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- 239000001008 quinone-imine dye Substances 0.000 description 1
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- 238000001429 visible spectrum Methods 0.000 description 1
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- 239000001043 yellow dye Substances 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/02—Engraving; Heads therefor
- B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
- B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/758,042 US7799504B2 (en) | 2007-06-05 | 2007-06-05 | Mask film to form relief images and method of use |
| US11/758,042 | 2007-06-05 | ||
| PCT/US2008/006960 WO2008153850A1 (en) | 2007-06-05 | 2008-06-03 | Mask film to form relief images and method of use |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU2008262404A1 AU2008262404A1 (en) | 2008-12-18 |
| AU2008262404B2 true AU2008262404B2 (en) | 2013-06-13 |
Family
ID=39717771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2008262404A Ceased AU2008262404B2 (en) | 2007-06-05 | 2008-06-03 | Mask film to form relief images and method of use |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US7799504B2 (enExample) |
| EP (2) | EP3139210B1 (enExample) |
| JP (1) | JP5368432B2 (enExample) |
| CN (1) | CN101681091B (enExample) |
| AU (1) | AU2008262404B2 (enExample) |
| BR (1) | BRPI0811234A2 (enExample) |
| ES (2) | ES2719680T3 (enExample) |
| WO (1) | WO2008153850A1 (enExample) |
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| JP4200510B1 (ja) * | 2008-06-11 | 2008-12-24 | 東洋紡績株式会社 | 感光性フレキソ印刷原版 |
| JP4247725B1 (ja) | 2008-07-16 | 2009-04-02 | 東洋紡績株式会社 | 感光性凸版印刷原版 |
| US8153347B2 (en) | 2008-12-04 | 2012-04-10 | Eastman Kodak Company | Flexographic element and method of imaging |
| EP2454095B1 (en) * | 2009-07-15 | 2015-12-16 | Optodot Corporation | Dual vesicular and infrared imaging media |
| US8663808B2 (en) * | 2009-07-30 | 2014-03-04 | Toyo Boseki Kabushiki Kaisha | Flexographic printing original plate |
| US20180029400A1 (en) * | 2009-10-01 | 2018-02-01 | Macdermid Printing Solutions, Llc | Method of Improving Print Performance in Flexographic Printing Plates |
| US9720326B2 (en) * | 2009-10-01 | 2017-08-01 | David A. Recchia | Method of improving print performance in flexographic printing plates |
| US20180029350A1 (en) * | 2009-10-01 | 2018-02-01 | Macdermid Printing Solutions, Llc | Method of Improving Print Performance in Flexographic Printing Plates |
| US8158331B2 (en) * | 2009-10-01 | 2012-04-17 | Recchia David A | Method of improving print performance in flexographic printing plates |
| US8632961B2 (en) * | 2010-01-28 | 2014-01-21 | Eastman Kodak Company | Flexographic processing solution and use |
| US8492074B2 (en) * | 2011-01-05 | 2013-07-23 | Laurie A. Bryant | Method of improving print performance in flexographic printing plates |
| US8530142B2 (en) | 2011-03-15 | 2013-09-10 | Eastman Kodak Company | Flexographic printing plate precursor, imaging assembly, and use |
| WO2012173721A1 (en) * | 2011-06-13 | 2012-12-20 | Microchem Corp. | Epoxy formulations and processes for fabrication of opaque structures |
| US8632958B2 (en) * | 2011-07-14 | 2014-01-21 | Kyle P. Baldwin | Method of controlling surface roughness of a flexographic printing plate |
| US8871431B2 (en) * | 2011-08-08 | 2014-10-28 | Timothy Gotsick | Laminated flexographic printing sleeves and methods of making the same |
| US9134612B2 (en) | 2012-03-27 | 2015-09-15 | E I Du Pont De Nemours And Company | Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor |
| DE102012013532B4 (de) * | 2012-07-05 | 2017-01-12 | Martin, Prof. Dr. Dreher | Einrichtung zum Drucken mit weich-elastischen Druckformen |
| US9205638B2 (en) | 2013-02-05 | 2015-12-08 | Eastman Kodak Company | Method of forming printed patterns |
| US8945813B2 (en) | 2013-04-18 | 2015-02-03 | Eastman Kodak Company | Mask forming imageable material and use |
| CN105745578B (zh) * | 2013-09-18 | 2018-04-06 | 富林特集团德国有限公司 | 可数字曝光的柔版印刷元件和制造柔版印刷版的方法 |
| US9267206B2 (en) | 2014-01-13 | 2016-02-23 | Eastman Kodak Company | Use of titania precursor composition pattern |
| US10025183B2 (en) | 2014-01-22 | 2018-07-17 | Macdermid Graphics Solutions, Llc | Photosensitive resin composition |
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| CN106459650B (zh) | 2014-06-23 | 2019-05-10 | 伊斯曼柯达公司 | 胶乳底漆组合物和涂胶乳底漆的基底 |
| KR20170070167A (ko) | 2014-10-15 | 2017-06-21 | 이스트맨 코닥 캄파니 | 분산된 탄소-코팅된 금속 입자, 제품 및 용도 |
| US9740099B2 (en) | 2014-11-12 | 2017-08-22 | Macdermid Printing Solutions, Llc | Flexographic printing plate with improved cure efficiency |
| EP3323017B1 (de) | 2015-07-15 | 2019-04-10 | Flint Group Germany GmbH | Laserablatierbarer maskenfilm |
| CN110225665B (zh) * | 2015-07-30 | 2021-04-06 | 昭和电工材料株式会社 | 感光性元件 |
| US10174425B2 (en) | 2015-09-22 | 2019-01-08 | Eastman Kodak Company | Non-aqueous compositions and articles using stannous alkoxides |
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| CN108700803B (zh) * | 2015-12-21 | 2021-08-27 | 富林特集团德国有限公司 | 凸版印刷版的生成式制造的方法 |
| CN109562628B (zh) | 2016-08-09 | 2021-07-27 | 柯达公司 | 银离子羧酸根n-杂芳香族络合物和用途 |
| EP3497106B1 (en) | 2016-08-09 | 2020-05-13 | Eastman Kodak Company | Silver ion carboxylate primary alkylamine complexes |
| WO2018102125A1 (en) | 2016-11-29 | 2018-06-07 | Eastman Kodak Company | Silver ion alpha-oxy carboxylate-oxime complexes for photolithographic processes to generate electrically conducting metallic structures |
| WO2018169672A1 (en) | 2017-03-13 | 2018-09-20 | Eastman Kodak Company | Silver-containing compositions containing cellulosic polymers and uses |
| WO2019060167A1 (en) | 2017-09-25 | 2019-03-28 | Eastman Kodak Company | NONAQUEOUS SILVER-BASED COMPOSITION CONTAINING CELLULOSIC POLYMERS |
| WO2019060166A1 (en) | 2017-09-25 | 2019-03-28 | Eastman Kodak Company | PROCESS FOR PRODUCING DISPERSIONS CONTAINING SILVER WITH NITROGEN BASES |
| EP3721293B1 (de) | 2017-12-08 | 2022-02-09 | Flint Group Germany GmbH | Verfahren zur kennzeichnung eines reliefvorläufers zur herstellung einer reliefstruktur |
| US10788746B2 (en) | 2018-02-16 | 2020-09-29 | Miraclon Corporation | Relief image-forming method and assembly |
| US10768520B2 (en) | 2018-02-16 | 2020-09-08 | Miraclon Corporation | Mask element precursor and relief image-forming system |
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-
2007
- 2007-06-05 US US11/758,042 patent/US7799504B2/en active Active
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2008
- 2008-06-03 CN CN2008800191764A patent/CN101681091B/zh active Active
- 2008-06-03 EP EP16189459.7A patent/EP3139210B1/en active Active
- 2008-06-03 BR BRPI0811234-7A2A patent/BRPI0811234A2/pt not_active IP Right Cessation
- 2008-06-03 WO PCT/US2008/006960 patent/WO2008153850A1/en not_active Ceased
- 2008-06-03 AU AU2008262404A patent/AU2008262404B2/en not_active Ceased
- 2008-06-03 ES ES16189459T patent/ES2719680T3/es active Active
- 2008-06-03 ES ES08768051.8T patent/ES2608411T3/es active Active
- 2008-06-03 JP JP2010511166A patent/JP5368432B2/ja active Active
- 2008-06-03 EP EP08768051.8A patent/EP2153278B1/en active Active
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- 2010-03-12 US US12/722,572 patent/US8198012B2/en active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| US20120219773A1 (en) | 2012-08-30 |
| EP3139210A1 (en) | 2017-03-08 |
| US20100167209A1 (en) | 2010-07-01 |
| US7799504B2 (en) | 2010-09-21 |
| CN101681091B (zh) | 2013-04-03 |
| CN101681091A (zh) | 2010-03-24 |
| US8198012B2 (en) | 2012-06-12 |
| JP2010531462A (ja) | 2010-09-24 |
| JP5368432B2 (ja) | 2013-12-18 |
| US8632944B2 (en) | 2014-01-21 |
| WO2008153850A1 (en) | 2008-12-18 |
| AU2008262404A1 (en) | 2008-12-18 |
| ES2719680T3 (es) | 2019-07-12 |
| EP3139210B1 (en) | 2019-01-09 |
| US20080305407A1 (en) | 2008-12-11 |
| EP2153278B1 (en) | 2016-09-21 |
| EP2153278A1 (en) | 2010-02-17 |
| ES2608411T3 (es) | 2017-04-10 |
| BRPI0811234A2 (pt) | 2014-11-04 |
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