JP5368432B2 - レリーフ画像を形成するためのマスクフィルムおよび使用方法 - Google Patents

レリーフ画像を形成するためのマスクフィルムおよび使用方法 Download PDF

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Publication number
JP5368432B2
JP5368432B2 JP2010511166A JP2010511166A JP5368432B2 JP 5368432 B2 JP5368432 B2 JP 5368432B2 JP 2010511166 A JP2010511166 A JP 2010511166A JP 2010511166 A JP2010511166 A JP 2010511166A JP 5368432 B2 JP5368432 B2 JP 5368432B2
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Prior art keywords
layer
film
radiation
carrier sheet
refractive index
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English (en)
Japanese (ja)
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JP2010531462A5 (enExample
JP2010531462A (ja
Inventor
エル． ズワドロ，グレゴリー
エドガー ブラウン，デイビッド
アンダーソン フォーレンカム，エルジー
ピーター ストルト，アクセル
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イーストマン コダック カンパニー
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Publication of JP2010531462A5 publication Critical patent/JP2010531462A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Materials For Photolithography (AREA)
JP2010511166A 2007-06-05 2008-06-03 レリーフ画像を形成するためのマスクフィルムおよび使用方法 Active JP5368432B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/758,042 US7799504B2 (en) 2007-06-05 2007-06-05 Mask film to form relief images and method of use
US11/758,042 2007-06-05
PCT/US2008/006960 WO2008153850A1 (en) 2007-06-05 2008-06-03 Mask film to form relief images and method of use

Publications (3)

Publication Number Publication Date
JP2010531462A JP2010531462A (ja) 2010-09-24
JP2010531462A5 JP2010531462A5 (enExample) 2011-07-14
JP5368432B2 true JP5368432B2 (ja) 2013-12-18

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010511166A Active JP5368432B2 (ja) 2007-06-05 2008-06-03 レリーフ画像を形成するためのマスクフィルムおよび使用方法

Country Status (8)

Country Link
US (3) US7799504B2 (enExample)
EP (2) EP3139210B1 (enExample)
JP (1) JP5368432B2 (enExample)
CN (1) CN101681091B (enExample)
AU (1) AU2008262404B2 (enExample)
BR (1) BRPI0811234A2 (enExample)
ES (2) ES2719680T3 (enExample)
WO (1) WO2008153850A1 (enExample)

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WO2025177651A1 (ja) 2024-02-22 2025-08-28 東洋紡エムシー株式会社 水現像可能なフレキソ印刷原版製造用積層体
EP4628989A1 (en) 2024-02-22 2025-10-08 TOYOBO MC Corporation Laminate for producing water-developable flexographic printing original plate

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Publication number Priority date Publication date Assignee Title
WO2025177651A1 (ja) 2024-02-22 2025-08-28 東洋紡エムシー株式会社 水現像可能なフレキソ印刷原版製造用積層体
EP4628989A1 (en) 2024-02-22 2025-10-08 TOYOBO MC Corporation Laminate for producing water-developable flexographic printing original plate

Also Published As

Publication number Publication date
US20120219773A1 (en) 2012-08-30
EP3139210A1 (en) 2017-03-08
US20100167209A1 (en) 2010-07-01
US7799504B2 (en) 2010-09-21
CN101681091B (zh) 2013-04-03
CN101681091A (zh) 2010-03-24
US8198012B2 (en) 2012-06-12
JP2010531462A (ja) 2010-09-24
US8632944B2 (en) 2014-01-21
WO2008153850A1 (en) 2008-12-18
AU2008262404B2 (en) 2013-06-13
AU2008262404A1 (en) 2008-12-18
ES2719680T3 (es) 2019-07-12
EP3139210B1 (en) 2019-01-09
US20080305407A1 (en) 2008-12-11
EP2153278B1 (en) 2016-09-21
EP2153278A1 (en) 2010-02-17
ES2608411T3 (es) 2017-04-10
BRPI0811234A2 (pt) 2014-11-04

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