BR9901287A - Aparelho de deposição por vapor quìmico para deposso de deposição por vapor quìmico. - Google Patents
Aparelho de deposição por vapor quìmico para deposso de deposição por vapor quìmico.Info
- Publication number
- BR9901287A BR9901287A BR9901287A BR9901287A BR9901287A BR 9901287 A BR9901287 A BR 9901287A BR 9901287 A BR9901287 A BR 9901287A BR 9901287 A BR9901287 A BR 9901287A BR 9901287 A BR9901287 A BR 9901287A
- Authority
- BR
- Brazil
- Prior art keywords
- chemical vapor
- vapor deposition
- deposition
- zone
- sensitive
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45519—Inert gas curtains
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
- B05D1/08—Flame spraying
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
- C23C16/14—Deposition of only one other metal element
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/342—Boron nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/406—Oxides of iron group metals
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/409—Oxides of the type ABO3 with A representing alkali, alkaline earth metal or lead and B representing a refractory metal, nickel, scandium or a lanthanide
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45576—Coaxial inlets for each gas
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
Abstract
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/067,975 US6368665B1 (en) | 1998-04-29 | 1998-04-29 | Apparatus and process for controlled atmosphere chemical vapor deposition |
Publications (2)
Publication Number | Publication Date |
---|---|
BR9901287A true BR9901287A (pt) | 2000-03-21 |
BR9901287B1 BR9901287B1 (pt) | 2010-02-09 |
Family
ID=22079640
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI9901287-1A BR9901287B1 (pt) | 1998-04-29 | 1999-04-27 | aparelho de deposiÇço por vapor quÍmico para depositar um revestimento sobre um substrato, e, processo de deposiÇço por vapor quÍmico. |
Country Status (11)
Country | Link |
---|---|
US (1) | US6368665B1 (pt) |
EP (1) | EP0976847B1 (pt) |
JP (1) | JP4447069B2 (pt) |
KR (1) | KR100322784B1 (pt) |
CN (1) | CN1121511C (pt) |
AT (1) | ATE411409T1 (pt) |
BR (1) | BR9901287B1 (pt) |
CA (1) | CA2269862C (pt) |
DE (1) | DE69939730D1 (pt) |
IL (1) | IL129580A0 (pt) |
SG (1) | SG71203A1 (pt) |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
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US5997956A (en) * | 1995-08-04 | 1999-12-07 | Microcoating Technologies | Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions |
US7033637B1 (en) * | 1999-01-12 | 2006-04-25 | Microcoating Technologies, Inc. | Epitaxial thin films |
ATE302863T1 (de) * | 1999-07-02 | 2005-09-15 | Ngimat Co | Verfahren zur beschichtung von keramiken mittels ccvd |
US6372364B1 (en) | 1999-08-18 | 2002-04-16 | Microcoating Technologies, Inc. | Nanostructure coatings |
KR100366810B1 (ko) * | 2000-01-26 | 2003-01-14 | 일진나노텍 주식회사 | 탄소나노튜브의 합성 방법 및 그를 위한 벨트형열화학기상증착장치 |
ATE497028T1 (de) | 2000-06-22 | 2011-02-15 | Panasonic Elec Works Co Ltd | Vorrichtung und verfahren zum vakuum-ausdampfen |
AU2001271638A1 (en) * | 2000-06-30 | 2002-01-14 | Microcoating Technologies, Inc. | Polymer coatings |
CA2357324A1 (en) | 2000-09-15 | 2002-03-15 | James D. Huggins | Continuous feed coater |
AU2001290097A1 (en) * | 2000-10-04 | 2002-04-15 | Dow Corning Ireland Limited | Method and apparatus for forming a coating |
US6503366B2 (en) * | 2000-12-07 | 2003-01-07 | Axcelis Technologies, Inc. | Chemical plasma cathode |
US6846370B2 (en) | 2001-07-06 | 2005-01-25 | Shipley Company, L.L.C. | Resistive materials |
US20090169868A1 (en) * | 2002-01-29 | 2009-07-02 | Vanderbilt University | Methods and apparatus for transferring a material onto a substrate using a resonant infrared pulsed laser |
WO2003083169A1 (en) * | 2002-04-01 | 2003-10-09 | Ans Inc | Apparatus and method for depositing organic matter of vapor phase |
GB0208261D0 (en) * | 2002-04-10 | 2002-05-22 | Dow Corning | An atmospheric pressure plasma assembly |
TW200308187A (en) * | 2002-04-10 | 2003-12-16 | Dow Corning Ireland Ltd | An atmospheric pressure plasma assembly |
TW200409669A (en) * | 2002-04-10 | 2004-06-16 | Dow Corning Ireland Ltd | Protective coating composition |
US6797337B2 (en) * | 2002-08-19 | 2004-09-28 | Micron Technology, Inc. | Method for delivering precursors |
JP4036462B2 (ja) * | 2003-05-06 | 2008-01-23 | 泰浩 森 | 固体物質の表面改質方法および表面改質された固体物質 |
DE10360046A1 (de) | 2003-12-18 | 2005-07-21 | Basf Ag | Kupfer(l)formiatkomplexe |
EP1745247B1 (en) * | 2004-04-23 | 2015-11-11 | Philip Morris Products S.a.s. | Aerosol generators and methods for producing aerosols |
US7909263B2 (en) * | 2004-07-08 | 2011-03-22 | Cube Technology, Inc. | Method of dispersing fine particles in a spray |
WO2006048649A1 (en) * | 2004-11-05 | 2006-05-11 | Dow Corning Ireland Limited | Plasma system |
US20100151130A1 (en) * | 2004-12-10 | 2010-06-17 | Koninklijke Philips Electronics, N.V. | Combustion chemical vapor deposition on temperature-sensitive substrates |
US20060185590A1 (en) * | 2005-02-18 | 2006-08-24 | General Electric Company | High temperature chemical vapor deposition apparatus |
US20060185591A1 (en) * | 2005-02-18 | 2006-08-24 | General Electric Company | High temperature chemical vapor deposition apparatus |
US20060222846A1 (en) * | 2005-04-01 | 2006-10-05 | General Electric Company | Reflective and resistant coatings and methods for applying to composite structures |
GB0509648D0 (en) * | 2005-05-12 | 2005-06-15 | Dow Corning Ireland Ltd | Plasma system to deposit adhesion primer layers |
US20060275542A1 (en) * | 2005-06-02 | 2006-12-07 | Eastman Kodak Company | Deposition of uniform layer of desired material |
ITMI20051308A1 (it) * | 2005-07-11 | 2007-01-12 | Milano Politecnico | Metodo e reattore per crescere cristalli |
CN101553359B (zh) | 2006-10-19 | 2014-04-16 | 阿肯色大学董事会 | 用静电喷涂法制作涂层的方法及装置 |
CN101563170A (zh) | 2006-10-19 | 2009-10-21 | 纳米技术有限公司 | 用超声波喷雾沉积法制作涂层的方法及装置 |
GB2451130B (en) * | 2007-07-20 | 2011-08-03 | Saint Gobain | Deposition of metals by combustion CVD coating at atmospheric pressure |
DE102007036796A1 (de) * | 2007-08-03 | 2009-02-05 | Rehau Ag + Co | Verfahren zur Oberflächenbehandlung |
US8039052B2 (en) * | 2007-09-06 | 2011-10-18 | Intermolecular, Inc. | Multi-region processing system and heads |
DE102007043650A1 (de) * | 2007-09-13 | 2009-04-02 | Siemens Ag | Verfahren zur Verbesserung der Eigenschaften von Beschichtungen |
US20090325340A1 (en) * | 2008-06-30 | 2009-12-31 | Mohd Aslami | Plasma vapor deposition system and method for making multi-junction silicon thin film solar cell modules and panels |
DE102008060924A1 (de) * | 2008-12-06 | 2010-06-10 | Innovent E.V. | Verfahren zur Abscheidung einer Schicht auf einem Substrat |
DE102010043949B4 (de) * | 2010-11-16 | 2013-06-20 | Innovent E.V. | Vorrichtung und Verfahren zum Beschichten von Oberflächen |
US9650711B2 (en) * | 2011-09-26 | 2017-05-16 | California Institute Of Technology, Office Of Technology Transfer | Efficient and simple method for metalorganic chemical vapor deposition |
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CN102618923B (zh) * | 2012-04-11 | 2015-09-02 | 浙江金瑞泓科技股份有限公司 | 一种准减压外延生长方法 |
US20140091417A1 (en) * | 2012-10-01 | 2014-04-03 | Applied Materials, Inc. | Low refractive index coating deposited by remote plasma cvd |
TWI486477B (zh) * | 2012-11-23 | 2015-06-01 | Chemical vapor deposition equipment and its vehicles | |
FR3000107B1 (fr) * | 2012-12-20 | 2015-05-01 | Michelin & Cie | Sulfuration de surface d'un corps metallique par pyrolyse par projection de flamme |
FR3011540B1 (fr) * | 2013-10-07 | 2016-01-01 | Centre Nat Rech Scient | Procede et systeme de structuration submicrometrique d'une surface de substrat |
CN106835065B (zh) * | 2016-10-17 | 2019-03-29 | 中国矿业大学(北京) | 一种纳米金刚石表面硅烷真空热解沉积设备 |
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-
1998
- 1998-04-29 US US09/067,975 patent/US6368665B1/en not_active Expired - Lifetime
-
1999
- 1999-04-07 SG SG1999001655A patent/SG71203A1/en unknown
- 1999-04-25 IL IL12958099A patent/IL129580A0/xx not_active IP Right Cessation
- 1999-04-26 CA CA002269862A patent/CA2269862C/en not_active Expired - Fee Related
- 1999-04-27 KR KR1019990014963A patent/KR100322784B1/ko not_active IP Right Cessation
- 1999-04-27 BR BRPI9901287-1A patent/BR9901287B1/pt not_active IP Right Cessation
- 1999-04-29 EP EP99303373A patent/EP0976847B1/en not_active Expired - Lifetime
- 1999-04-29 AT AT99303373T patent/ATE411409T1/de not_active IP Right Cessation
- 1999-04-29 CN CN99105385A patent/CN1121511C/zh not_active Expired - Fee Related
- 1999-04-29 DE DE69939730T patent/DE69939730D1/de not_active Expired - Lifetime
- 1999-04-30 JP JP12490599A patent/JP4447069B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1121511C (zh) | 2003-09-17 |
JPH11335844A (ja) | 1999-12-07 |
KR19990087964A (ko) | 1999-12-27 |
ATE411409T1 (de) | 2008-10-15 |
IL129580A0 (en) | 2000-02-29 |
KR100322784B1 (ko) | 2002-03-13 |
EP0976847B1 (en) | 2008-10-15 |
BR9901287B1 (pt) | 2010-02-09 |
DE69939730D1 (de) | 2008-11-27 |
US6368665B1 (en) | 2002-04-09 |
CN1235207A (zh) | 1999-11-17 |
CA2269862A1 (en) | 1999-10-29 |
EP0976847A3 (en) | 2001-10-10 |
JP4447069B2 (ja) | 2010-04-07 |
SG71203A1 (en) | 2000-03-21 |
CA2269862C (en) | 2003-09-16 |
EP0976847A2 (en) | 2000-02-02 |
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