BR9813405A - Máscara de amplitude, e aparelho e processo para fabricação de filtro de retìcula de longa duração usando a mesma - Google Patents

Máscara de amplitude, e aparelho e processo para fabricação de filtro de retìcula de longa duração usando a mesma

Info

Publication number
BR9813405A
BR9813405A BR9813405-1A BR9813405A BR9813405A BR 9813405 A BR9813405 A BR 9813405A BR 9813405 A BR9813405 A BR 9813405A BR 9813405 A BR9813405 A BR 9813405A
Authority
BR
Brazil
Prior art keywords
amplitude mask
lasting
laser light
same
long
Prior art date
Application number
BR9813405-1A
Other languages
English (en)
Inventor
Joo-Nyung Jang
Original Assignee
Sansung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sansung Electronics Co Ltd filed Critical Sansung Electronics Co Ltd
Publication of BR9813405A publication Critical patent/BR9813405A/pt

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02142—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating based on illuminating or irradiating an amplitude mask, i.e. a mask having a repetitive intensity modulating pattern
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02152—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating involving moving the fibre or a manufacturing element, stretching of the fibre
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/0208—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response
    • G02B6/02085—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response characterised by the grating profile, e.g. chirped, apodised, tilted, helical
    • G02B6/02095—Long period gratings, i.e. transmission gratings coupling light between core and cladding modes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)

Abstract

MáSCARA DE AMPLITUDE, E APARELHO E PROCESSO PARA FABRICAçãO DE FILTRO DE RETìCULA DE LONGA DURAçãO SUANDO A MESMA Uma máscara de amplitude, e um aparelho e processo para fabricação de um filtro de retícula de longa duração que usa a mesma, são providos. Quando uma retícula de longa duração é fabrica seletivamente passando luz de laser a uma fibra ótica, a máscara de amplitude periodicamente passa luz de laser até a fibra ótica. A máscara de amplitude inclui duas máscaras (300) que tem áreas de passagem alternantes periodicamente para a passagem da luz do laser e áreas de não passagem para impedir a passagem da luz do laser, pelo que as duas máscaras (300) são continuamente giradas em direções opostas. O período da área de passagem (308), deste modo, muda continuamente. Nesta máscara, duas máscaras (300) cada uma tendo um período pré determinado são giradas em direções opostas, para assim proverem um período da máscara de amplitude de dependente do ângulo de rotação. Assim, o período da máscara de amplitude pode ser continuamente trocado.
BR9813405-1A 1997-12-08 1998-12-08 Máscara de amplitude, e aparelho e processo para fabricação de filtro de retìcula de longa duração usando a mesma BR9813405A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019970066751A KR100265794B1 (ko) 1997-12-08 1997-12-08 주기가 조절가능한 진폭 마스크 및 이를 이용한 장주기 격자 필터 제조장치
PCT/KR1998/000414 WO1999030189A1 (en) 1997-12-08 1998-12-08 Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same

Publications (1)

Publication Number Publication Date
BR9813405A true BR9813405A (pt) 2000-11-14

Family

ID=19526713

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9813405-1A BR9813405A (pt) 1997-12-08 1998-12-08 Máscara de amplitude, e aparelho e processo para fabricação de filtro de retìcula de longa duração usando a mesma

Country Status (13)

Country Link
US (1) US6204969B1 (pt)
EP (1) EP1038196B1 (pt)
JP (1) JP3328648B2 (pt)
KR (1) KR100265794B1 (pt)
CN (1) CN1113253C (pt)
AR (1) AR016975A1 (pt)
AU (1) AU740410C (pt)
BR (1) BR9813405A (pt)
CA (1) CA2311586C (pt)
DE (1) DE69831095T2 (pt)
RU (1) RU2193220C2 (pt)
TW (1) TW408232B (pt)
WO (1) WO1999030189A1 (pt)

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JP3456927B2 (ja) 1999-08-06 2003-10-14 学校法人早稲田大学 グレーティング並びにグレーティング形成方法及び装置
KR100342532B1 (ko) * 2000-08-04 2002-06-28 윤종용 편광 무의존성 장주기 광섬유 격자 제조 장치
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US7923260B2 (en) 2002-08-20 2011-04-12 Illumina, Inc. Method of reading encoded particles
US20050227252A1 (en) * 2002-08-20 2005-10-13 Moon John A Diffraction grating-based encoded articles for multiplexed experiments
US7164533B2 (en) 2003-01-22 2007-01-16 Cyvera Corporation Hybrid random bead/chip based microarray
US7872804B2 (en) * 2002-08-20 2011-01-18 Illumina, Inc. Encoded particle having a grating with variations in the refractive index
US7619819B2 (en) * 2002-08-20 2009-11-17 Illumina, Inc. Method and apparatus for drug product tracking using encoded optical identification elements
US7901630B2 (en) * 2002-08-20 2011-03-08 Illumina, Inc. Diffraction grating-based encoded microparticle assay stick
US7092160B2 (en) * 2002-09-12 2006-08-15 Illumina, Inc. Method of manufacturing of diffraction grating-based optical identification element
US20100255603A9 (en) * 2002-09-12 2010-10-07 Putnam Martin A Method and apparatus for aligning microbeads in order to interrogate the same
US20060057729A1 (en) * 2003-09-12 2006-03-16 Illumina, Inc. Diffraction grating-based encoded element having a substance disposed thereon
US7277604B2 (en) * 2003-12-12 2007-10-02 Lxsix Photonics Inc. Method and apparatus for inducing an index of refraction change on a substrate sensitive to electromagnetic radiation
US7433123B2 (en) * 2004-02-19 2008-10-07 Illumina, Inc. Optical identification element having non-waveguide photosensitive substrate with diffraction grating therein
CA2587674A1 (en) 2004-11-16 2006-05-26 Illumina, Inc. Method and apparatus for reading coded microbeads
US7604173B2 (en) * 2004-11-16 2009-10-20 Illumina, Inc. Holographically encoded elements for microarray and other tagging labeling applications, and method and apparatus for making and reading the same
CN100375912C (zh) * 2005-04-28 2008-03-19 北京印刷学院 一种利用电子束制备长周期光纤光栅的方法
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Also Published As

Publication number Publication date
CA2311586C (en) 2003-04-08
KR100265794B1 (ko) 2000-09-15
TW408232B (en) 2000-10-11
JP3328648B2 (ja) 2002-09-30
AU740410B2 (en) 2001-11-01
AU1510299A (en) 1999-06-28
US6204969B1 (en) 2001-03-20
AR016975A1 (es) 2001-08-01
AU740410C (en) 2002-06-06
WO1999030189A1 (en) 1999-06-17
JP2001526403A (ja) 2001-12-18
KR19980086448A (ko) 1998-12-05
CN1113253C (zh) 2003-07-02
CA2311586A1 (en) 1999-06-17
EP1038196B1 (en) 2005-08-03
EP1038196A1 (en) 2000-09-27
RU2193220C2 (ru) 2002-11-20
DE69831095T2 (de) 2006-06-01
CN1281554A (zh) 2001-01-24
DE69831095D1 (de) 2005-09-08

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Legal Events

Date Code Title Description
B06A Notification to applicant to reply to the report for non-patentability or inadequacy of the application [chapter 6.1 patent gazette]
B11B Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements