AR016975A1 - Una mascara de amplitud para pasar periodicamente luz laser a una fibra optica cuando se fabrica una reticula de periodo prolongado y el aparato para fabricar un filtro para dicha reticula. - Google Patents

Una mascara de amplitud para pasar periodicamente luz laser a una fibra optica cuando se fabrica una reticula de periodo prolongado y el aparato para fabricar un filtro para dicha reticula.

Info

Publication number
AR016975A1
AR016975A1 ARP980106211A ARP980106211A AR016975A1 AR 016975 A1 AR016975 A1 AR 016975A1 AR P980106211 A ARP980106211 A AR P980106211A AR P980106211 A ARP980106211 A AR P980106211A AR 016975 A1 AR016975 A1 AR 016975A1
Authority
AR
Argentina
Prior art keywords
reticle
laser light
mask
optical fiber
period
Prior art date
Application number
ARP980106211A
Other languages
English (en)
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of AR016975A1 publication Critical patent/AR016975A1/es

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70283Mask effects on the imaging process
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02Optical fibres with cladding with or without a coating
    • G02B6/02057Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02142Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating based on illuminating or irradiating an amplitude mask, i.e. a mask having a repetitive intensity modulating pattern
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02Optical fibres with cladding with or without a coating
    • G02B6/02057Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02152Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating involving moving the fibre or a manufacturing element, stretching of the fibre
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02Optical fibres with cladding with or without a coating
    • G02B6/02057Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/0208Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response
    • G02B6/02085Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response characterised by the grating profile, e.g. chirped, apodised, tilted, helical
    • G02B6/02095Long period gratings, i.e. transmission gratings coupling light between core and cladding modes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00Optical: systems and elements
    • Y10S359/90Methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)

Abstract

Se proveen una máscara de amplitud, y un aparato y método para fabricar un filtro de retícula de período prolongado que utiliza la misma. Cuando sefabrica una retícula de período de prolongado pasando selectivamente luz láser a una fibra optica, lam áscara de amplitud pasa luz láser periodicamentea la fibra optica. La máscara de amplitud incluye dos máscaras que tienen áreas de paso periodicamente alternativas para pasar la luz láser y áreasque no son de paso para prevenir el paso de la luzláse r, en donde las dos máscaras se rotan continuamente en direcciones opuestas. Por consiguiente, elperíodo del área de paso de modifica continuamente. En esta máscara, las dos máscaras, cada una de las cuales tiene un período predeterminado, sonrotada sen direcciones opuestas, para proveer, de este modo, un período de máscara de amplitud que depende del ángulo de rotacion. Así el período de la máscarade amplitud puede modificarse continuamente.
ARP980106211A 1997-12-08 1998-12-07 Una mascara de amplitud para pasar periodicamente luz laser a una fibra optica cuando se fabrica una reticula de periodo prolongado y el aparato para fabricar un filtro para dicha reticula. AR016975A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019970066751A KR100265794B1 (ko) 1997-12-08 1997-12-08 주기가 조절가능한 진폭 마스크 및 이를 이용한 장주기 격자 필터 제조장치

Publications (1)

Publication Number Publication Date
AR016975A1 true AR016975A1 (es) 2001-08-01

Family

ID=19526713

Family Applications (1)

Application Number Title Priority Date Filing Date
ARP980106211A AR016975A1 (es) 1997-12-08 1998-12-07 Una mascara de amplitud para pasar periodicamente luz laser a una fibra optica cuando se fabrica una reticula de periodo prolongado y el aparato para fabricar un filtro para dicha reticula.

Country Status (13)

Country Link
US (1) US6204969B1 (es)
EP (1) EP1038196B1 (es)
JP (1) JP3328648B2 (es)
KR (1) KR100265794B1 (es)
CN (1) CN1113253C (es)
AR (1) AR016975A1 (es)
AU (1) AU740410C (es)
BR (1) BR9813405A (es)
CA (1) CA2311586C (es)
DE (1) DE69831095T2 (es)
RU (1) RU2193220C2 (es)
TW (1) TW408232B (es)
WO (1) WO1999030189A1 (es)

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JP3456927B2 (ja) 1999-08-06 2003-10-14 学校法人早稲田大学 グレーティング並びにグレーティング形成方法及び装置
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US7923260B2 (en) 2002-08-20 2011-04-12 Illumina, Inc. Method of reading encoded particles
US20050227252A1 (en) * 2002-08-20 2005-10-13 Moon John A Diffraction grating-based encoded articles for multiplexed experiments
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US7872804B2 (en) * 2002-08-20 2011-01-18 Illumina, Inc. Encoded particle having a grating with variations in the refractive index
US7619819B2 (en) * 2002-08-20 2009-11-17 Illumina, Inc. Method and apparatus for drug product tracking using encoded optical identification elements
US7901630B2 (en) * 2002-08-20 2011-03-08 Illumina, Inc. Diffraction grating-based encoded microparticle assay stick
US7092160B2 (en) * 2002-09-12 2006-08-15 Illumina, Inc. Method of manufacturing of diffraction grating-based optical identification element
US20100255603A9 (en) * 2002-09-12 2010-10-07 Putnam Martin A Method and apparatus for aligning microbeads in order to interrogate the same
US20060057729A1 (en) * 2003-09-12 2006-03-16 Illumina, Inc. Diffraction grating-based encoded element having a substance disposed thereon
US7277604B2 (en) * 2003-12-12 2007-10-02 Lxsix Photonics Inc. Method and apparatus for inducing an index of refraction change on a substrate sensitive to electromagnetic radiation
US7433123B2 (en) * 2004-02-19 2008-10-07 Illumina, Inc. Optical identification element having non-waveguide photosensitive substrate with diffraction grating therein
CA2587674A1 (en) 2004-11-16 2006-05-26 Illumina, Inc. Method and apparatus for reading coded microbeads
US7604173B2 (en) * 2004-11-16 2009-10-20 Illumina, Inc. Holographically encoded elements for microarray and other tagging labeling applications, and method and apparatus for making and reading the same
CN100375912C (zh) * 2005-04-28 2008-03-19 北京印刷学院 一种利用电子束制备长周期光纤光栅的方法
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Also Published As

Publication number Publication date
CA2311586C (en) 2003-04-08
KR100265794B1 (ko) 2000-09-15
TW408232B (en) 2000-10-11
JP3328648B2 (ja) 2002-09-30
AU740410B2 (en) 2001-11-01
AU1510299A (en) 1999-06-28
US6204969B1 (en) 2001-03-20
AU740410C (en) 2002-06-06
WO1999030189A1 (en) 1999-06-17
JP2001526403A (ja) 2001-12-18
KR19980086448A (ko) 1998-12-05
CN1113253C (zh) 2003-07-02
CA2311586A1 (en) 1999-06-17
EP1038196B1 (en) 2005-08-03
BR9813405A (pt) 2000-11-14
EP1038196A1 (en) 2000-09-27
RU2193220C2 (ru) 2002-11-20
DE69831095T2 (de) 2006-06-01
CN1281554A (zh) 2001-01-24
DE69831095D1 (de) 2005-09-08

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