BR9001302A - Dispersao coloidal - Google Patents
Dispersao coloidalInfo
- Publication number
- BR9001302A BR9001302A BR909001302A BR9001302A BR9001302A BR 9001302 A BR9001302 A BR 9001302A BR 909001302 A BR909001302 A BR 909001302A BR 9001302 A BR9001302 A BR 9001302A BR 9001302 A BR9001302 A BR 9001302A
- Authority
- BR
- Brazil
- Prior art keywords
- coloidal
- dispersion
- coloidal dispersion
- Prior art date
Links
- 239000006185 dispersion Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
- C01B33/1417—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water an aqueous dispersion being obtained
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Colloid Chemistry (AREA)
- Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
- Paper (AREA)
- Curing Cements, Concrete, And Artificial Stone (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Treating Waste Gases (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32689089A | 1989-03-21 | 1989-03-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9001302A true BR9001302A (pt) | 1991-04-02 |
Family
ID=23274175
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR909001302A BR9001302A (pt) | 1989-03-21 | 1990-03-21 | Dispersao coloidal |
Country Status (11)
Country | Link |
---|---|
JP (1) | JP2949633B2 (de) |
KR (1) | KR0148692B1 (de) |
CN (1) | CN1027162C (de) |
AU (1) | AU625980B2 (de) |
BE (1) | BE1002854A3 (de) |
BR (1) | BR9001302A (de) |
CA (1) | CA2012719C (de) |
DE (1) | DE4006392A1 (de) |
FR (1) | FR2644768B1 (de) |
GB (1) | GB2229432B (de) |
IT (1) | IT1239546B (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2816076B2 (ja) * | 1993-01-21 | 1998-10-27 | 日本ペイント株式会社 | コロイダル粒子の分散体および水性塗料組成物 |
US5904159A (en) | 1995-11-10 | 1999-05-18 | Tokuyama Corporation | Polishing slurries and a process for the production thereof |
KR19990023544A (ko) * | 1997-08-19 | 1999-03-25 | 마쯔모또 에이찌 | 무기 입자의 수성 분산체와 그의 제조 방법 |
US5944866A (en) * | 1997-09-26 | 1999-08-31 | Lucent Technologies Inc. | Fabrication including sol-gel processing |
US6132298A (en) * | 1998-11-25 | 2000-10-17 | Applied Materials, Inc. | Carrier head with edge control for chemical mechanical polishing |
CN1089077C (zh) * | 1998-11-04 | 2002-08-14 | 中国科学院山西煤炭化学研究所 | 一种二氧化硅溶胶胶粒表面修饰方法 |
JP4428473B2 (ja) | 1999-01-18 | 2010-03-10 | 株式会社東芝 | 気相法無機酸化物粒子の含水固体状物質及び研磨用スラリーの製造方法 |
JP3721497B2 (ja) | 1999-07-15 | 2005-11-30 | 株式会社フジミインコーポレーテッド | 研磨用組成物の製造方法 |
DE19936478A1 (de) * | 1999-08-03 | 2001-02-15 | Degussa | Sinterwerkstoffe |
US6638982B2 (en) * | 2000-11-15 | 2003-10-28 | Cabot Corporation | Method of preparing a fumed metal oxide dispersion |
JP4426192B2 (ja) * | 2003-02-14 | 2010-03-03 | ニッタ・ハース株式会社 | 研磨用組成物の製造方法 |
JP5164129B2 (ja) * | 2004-03-29 | 2013-03-13 | ニッタ・ハース株式会社 | 半導体研磨用組成物 |
JP2005286047A (ja) | 2004-03-29 | 2005-10-13 | Nitta Haas Inc | 半導体研磨用組成物 |
GB0407198D0 (en) | 2004-03-30 | 2004-05-05 | British Telecomm | Joint fault detection |
DE102004021092A1 (de) * | 2004-04-29 | 2005-11-24 | Degussa Ag | Verwendung einer kationischen Siliciumdioxid-Dispersion als Textilveredlungsmittel |
DE102005012409A1 (de) | 2005-03-17 | 2006-09-21 | Wacker Chemie Ag | Wäßrige Dispersionen teilhydrophober Kieselsäuren |
JP4837483B2 (ja) * | 2006-08-04 | 2011-12-14 | 住友大阪セメント株式会社 | 高強度コンクリート用シリカフュームスラリー |
DE102008041466A1 (de) * | 2008-08-22 | 2010-02-25 | Wacker Chemie Ag | Wäßrige Dispersionen hydrophober Kieselsäuren |
WO2011081874A1 (en) * | 2009-12-29 | 2011-07-07 | W. R. Grace & Co.-Conn. | Composite inorganic particles and methods of making and using the same |
NO342672B1 (en) * | 2016-09-13 | 2018-06-25 | Elkem As | Microsilica slurry and method for producing such slurry |
US20200261334A1 (en) * | 2017-08-09 | 2020-08-20 | Wacker Chemie Ag | A water dispersion and a method for producing a water dispersion, also, an oil-in-water emulsion, a method for producing an oil-in-water emulsion and a method for designing an oil-in-water emulsion |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2984629A (en) * | 1957-11-04 | 1961-05-16 | Cabot Corp | Aqueous dispersions of pyrogenic silica |
US3291626A (en) * | 1962-12-26 | 1966-12-13 | Huber Corp J M | Stabilized pigment slurries |
DE1442656C3 (de) * | 1964-09-25 | 1975-07-17 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Verfahren zur Herstellung einer stabilen Dispersion pyrogen gewonnenen feinteiligen Sillciumdioxids |
GB1326574A (en) * | 1970-10-30 | 1973-08-15 | Degussa | Production of stabilised dispersions of pyrogenic silica |
FR2094790A5 (fr) * | 1970-11-24 | 1972-02-04 | Degussa | Procede pour la preparation de dispersions aqueuses stables de dioxydes de silicium par voie ignee |
US4042361A (en) * | 1976-04-26 | 1977-08-16 | Corning Glass Works | Method of densifying metal oxides |
DE2844052A1 (de) * | 1978-10-10 | 1980-04-30 | Degussa | Waessrige dispersion einer hydrophoben kieselsaeure |
US4321243A (en) * | 1980-08-05 | 1982-03-23 | Cornwell Charles E | Method of producing stabilized aqueous dispersions of silica fume |
-
1990
- 1990-03-01 DE DE4006392A patent/DE4006392A1/de not_active Ceased
- 1990-03-19 GB GB9006122A patent/GB2229432B/en not_active Expired - Fee Related
- 1990-03-20 JP JP2068568A patent/JP2949633B2/ja not_active Expired - Lifetime
- 1990-03-20 FR FR9003557A patent/FR2644768B1/fr not_active Expired - Fee Related
- 1990-03-20 KR KR1019900003705A patent/KR0148692B1/ko not_active IP Right Cessation
- 1990-03-21 IT IT19748A patent/IT1239546B/it active IP Right Grant
- 1990-03-21 AU AU52010/90A patent/AU625980B2/en not_active Ceased
- 1990-03-21 CA CA002012719A patent/CA2012719C/en not_active Expired - Lifetime
- 1990-03-21 BE BE9000319A patent/BE1002854A3/fr not_active IP Right Cessation
- 1990-03-21 BR BR909001302A patent/BR9001302A/pt not_active IP Right Cessation
- 1990-03-21 CN CN90101525A patent/CN1027162C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1045754A (zh) | 1990-10-03 |
IT9019748A1 (it) | 1991-09-21 |
IT9019748A0 (it) | 1990-03-21 |
AU625980B2 (en) | 1992-07-23 |
AU5201090A (en) | 1990-09-27 |
DE4006392A1 (de) | 1990-09-27 |
GB9006122D0 (en) | 1990-05-16 |
GB2229432A (en) | 1990-09-26 |
BE1002854A3 (fr) | 1991-07-02 |
CA2012719A1 (en) | 1990-09-21 |
IT1239546B (it) | 1993-11-05 |
KR0148692B1 (ko) | 1998-08-17 |
JP2949633B2 (ja) | 1999-09-20 |
JPH0360420A (ja) | 1991-03-15 |
KR900014248A (ko) | 1990-10-23 |
GB2229432B (en) | 1992-09-23 |
CA2012719C (en) | 1999-06-08 |
FR2644768B1 (fr) | 1994-02-11 |
FR2644768A1 (fr) | 1990-09-28 |
CN1027162C (zh) | 1994-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FB20 | Grant procedure suspended (art. 20) | ||
FB19 | Grant procedure suspended (art. 19) | ||
FF | Decision: intention to grant | ||
KD | Notifcation of receipt (letter patent) | ||
FG9A | Patent or certificate of addition granted | ||
TE | Change of address | ||
TE | Change of address | ||
PC | Transfer |
Free format text: CABOT CORPORATION (US), CABOT MICROELECTRONICS CORPORATION (US) |
|
B21A | Patent or certificate of addition expired [chapter 21.1 patent gazette] |
Free format text: PATENTE EXTINTA EM 21/03/2010 |