BR8406196A - Arranjo de matriz eletronico - Google Patents

Arranjo de matriz eletronico

Info

Publication number
BR8406196A
BR8406196A BR8406196A BR8406196A BR8406196A BR 8406196 A BR8406196 A BR 8406196A BR 8406196 A BR8406196 A BR 8406196A BR 8406196 A BR8406196 A BR 8406196A BR 8406196 A BR8406196 A BR 8406196A
Authority
BR
Brazil
Prior art keywords
matrix arrangement
electronic matrix
electronic
arrangement
matrix
Prior art date
Application number
BR8406196A
Other languages
English (en)
Inventor
Robert Royce Johnson
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of BR8406196A publication Critical patent/BR8406196A/pt

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/20—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
    • H10B63/82—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays the switching components having a common active material layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20—Multistable switching devices, e.g. memristors
    • H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/821—Device geometry
    • H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8828—Tellurides, e.g. GeSbTe
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/90—Bulk effect device making
BR8406196A 1983-12-05 1984-12-05 Arranjo de matriz eletronico BR8406196A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/558,216 US4677742A (en) 1983-01-18 1983-12-05 Electronic matrix arrays and method for making the same

Publications (1)

Publication Number Publication Date
BR8406196A true BR8406196A (pt) 1985-10-01

Family

ID=24228635

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8406196A BR8406196A (pt) 1983-12-05 1984-12-05 Arranjo de matriz eletronico

Country Status (5)

Country Link
US (1) US4677742A (pt)
EP (1) EP0144604A3 (pt)
JP (1) JPS60186054A (pt)
BR (1) BR8406196A (pt)
CA (1) CA1222820A (pt)

Families Citing this family (107)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6184054A (ja) * 1984-09-27 1986-04-28 シーメンス、アクチエンゲゼルシヤフト 集積ｍｏｓ回路
US4679085A (en) * 1984-12-04 1987-07-07 Energy Conversion Devices, Inc. Digital integrated electronic storage system for video and audio playback
US4876668A (en) * 1985-07-31 1989-10-24 California Institute Of Technology Thin film memory matrix using amorphous and high resistive layers
EP0243486A1 (en) * 1985-10-29 1987-11-04 4C Electronics, Inc. Programmable integrated crosspoint switch
DE3650362T2 (de) * 1986-01-06 1996-01-25 Sel Semiconductor Energy Laboratory Co., Ltd., Atsugi, Kanagawa Photoelektrische Umwandlungsvorrichtung mit hoher Ansprechgeschwindigkeit und Herstellungsverfahren.
US5989943A (en) * 1989-09-07 1999-11-23 Quicklogic Corporation Method for fabrication of programmable interconnect structure
US5624741A (en) * 1990-05-31 1997-04-29 E. I. Du Pont De Nemours And Company Interconnect structure having electrical conduction paths formable therein
KR970001735B1 (en) * 1991-04-05 1997-02-14 Sharp Kk A liquid crystal display device and a liquid crystal display system using the liquid crystal display device
US5753947A (en) * 1995-01-20 1998-05-19 Micron Technology, Inc. Very high-density DRAM cell structure and method for fabricating it
US5789758A (en) * 1995-06-07 1998-08-04 Micron Technology, Inc. Chalcogenide memory cell with a plurality of chalcogenide electrodes
US5831276A (en) * 1995-06-07 1998-11-03 Micron Technology, Inc. Three-dimensional container diode for use with multi-state material in a non-volatile memory cell
US5879955A (en) * 1995-06-07 1999-03-09 Micron Technology, Inc. Method for fabricating an array of ultra-small pores for chalcogenide memory cells
US6420725B1 (en) 1995-06-07 2002-07-16 Micron Technology, Inc. Method and apparatus for forming an integrated circuit electrode having a reduced contact area
US5869843A (en) * 1995-06-07 1999-02-09 Micron Technology, Inc. Memory array having a multi-state element and method for forming such array or cells thereof
US5962903A (en) * 1995-06-08 1999-10-05 Taiwan Semiconductor Manufacturing Company, Ltd. Planarized plug-diode mask ROM structure
US6653733B1 (en) * 1996-02-23 2003-11-25 Micron Technology, Inc. Conductors in semiconductor devices
US6025220A (en) 1996-06-18 2000-02-15 Micron Technology, Inc. Method of forming a polysilicon diode and devices incorporating such diode
US6337266B1 (en) 1996-07-22 2002-01-08 Micron Technology, Inc. Small electrode for chalcogenide memories
US5789277A (en) 1996-07-22 1998-08-04 Micron Technology, Inc. Method of making chalogenide memory device
US5814527A (en) * 1996-07-22 1998-09-29 Micron Technology, Inc. Method of making small pores defined by a disposable internal spacer for use in chalcogenide memories
US5985698A (en) * 1996-07-22 1999-11-16 Micron Technology, Inc. Fabrication of three dimensional container diode for use with multi-state material in a non-volatile memory cell
US5998244A (en) * 1996-08-22 1999-12-07 Micron Technology, Inc. Memory cell incorporating a chalcogenide element and method of making same
US5812441A (en) * 1996-10-21 1998-09-22 Micron Technology, Inc. MOS diode for use in a non-volatile memory cell
US6015977A (en) 1997-01-28 2000-01-18 Micron Technology, Inc. Integrated circuit memory cell having a small active area and method of forming same
JPH10289571A (ja) * 1997-04-11 1998-10-27 Sharp Corp 半導体記憶装置
US5952671A (en) * 1997-05-09 1999-09-14 Micron Technology, Inc. Small electrode for a chalcogenide switching device and method for fabricating same
US6087689A (en) 1997-06-16 2000-07-11 Micron Technology, Inc. Memory cell having a reduced active area and a memory array incorporating the same
NO304956B1 (no) * 1997-07-22 1999-03-08 Opticom As Elektrodeanordning uten og med et funksjonselement, samt en elektrodeinnretning dannet av elektrodeanordninger med funksjonselement og anvendelser derav
NO973993L (no) * 1997-09-01 1999-03-02 Opticom As Leseminne og leseminneinnretninger
DE19842883A1 (de) 1998-09-18 2000-03-30 Siemens Ag Elektrisch programmierbare, nichtflüchtige Speicherzellenanordnung
US6351406B1 (en) 1998-11-16 2002-02-26 Matrix Semiconductor, Inc. Vertically stacked field programmable nonvolatile memory and method of fabrication
US6483736B2 (en) 1998-11-16 2002-11-19 Matrix Semiconductor, Inc. Vertically stacked field programmable nonvolatile memory and method of fabrication
AU1591301A (en) 1999-11-09 2001-06-06 Sri International Workstation, apparatus, and methods for the high-throughput synthesis, screeningand characterization of combinatorial libraries
US7033840B1 (en) 1999-11-09 2006-04-25 Sri International Reaction calorimeter and differential scanning calorimeter for the high-throughput synthesis, screening and characterization of combinatorial libraries
US8575719B2 (en) 2000-04-28 2013-11-05 Sandisk 3D Llc Silicon nitride antifuse for use in diode-antifuse memory arrays
US6888750B2 (en) * 2000-04-28 2005-05-03 Matrix Semiconductor, Inc. Nonvolatile memory on SOI and compound semiconductor substrates and method of fabrication
US6440837B1 (en) 2000-07-14 2002-08-27 Micron Technology, Inc. Method of forming a contact structure in a semiconductor device
US6563156B2 (en) 2001-03-15 2003-05-13 Micron Technology, Inc. Memory elements and methods for making same
US6711043B2 (en) 2000-08-14 2004-03-23 Matrix Semiconductor, Inc. Three-dimensional memory cache system
US6545891B1 (en) * 2000-08-14 2003-04-08 Matrix Semiconductor, Inc. Modular memory device
EP1312120A1 (en) 2000-08-14 2003-05-21 Matrix Semiconductor, Inc. Dense arrays and charge storage devices, and methods for making same
US6765813B2 (en) * 2000-08-14 2004-07-20 Matrix Semiconductor, Inc. Integrated systems using vertically-stacked three-dimensional memory cells
US6658438B1 (en) * 2000-08-14 2003-12-02 Matrix Semiconductor, Inc. Method for deleting stored digital data from write-once memory device
US6424581B1 (en) 2000-08-14 2002-07-23 Matrix Semiconductor, Inc. Write-once memory array controller, system, and method
US6515888B2 (en) 2000-08-14 2003-02-04 Matrix Semiconductor, Inc. Low cost three-dimensional memory array
US6580124B1 (en) 2000-08-14 2003-06-17 Matrix Semiconductor Inc. Multigate semiconductor device with vertical channel current and method of fabrication
US6567293B1 (en) 2000-09-29 2003-05-20 Ovonyx, Inc. Single level metal memory cell using chalcogenide cladding
US6897514B2 (en) * 2001-03-28 2005-05-24 Matrix Semiconductor, Inc. Two mask floating gate EEPROM and method of making
US6809955B2 (en) * 2001-05-07 2004-10-26 Advanced Micro Devices, Inc. Addressable and electrically reversible memory switch
AU2002340793A1 (en) * 2001-05-07 2002-11-18 Coatue Corporation Molecular memory device
WO2002091496A2 (en) 2001-05-07 2002-11-14 Advanced Micro Devices, Inc. Reversible field-programmable electric interconnects
WO2002091385A1 (en) * 2001-05-07 2002-11-14 Advanced Micro Devices, Inc. Molecular memory cell
DE60220912T2 (de) * 2001-05-07 2008-02-28 Advanced Micro Devices, Inc., Sunnyvale Speichervorrichtung mit einem sich selbst einbauenden polymer und verfahren zur herstellung derselben
US6627944B2 (en) 2001-05-07 2003-09-30 Advanced Micro Devices, Inc. Floating gate memory device using composite molecular material
US6646912B2 (en) * 2001-06-05 2003-11-11 Hewlett-Packard Development Company, Lp. Non-volatile memory
US6552409B2 (en) * 2001-06-05 2003-04-22 Hewlett-Packard Development Company, Lp Techniques for addressing cross-point diode memory arrays
US6841813B2 (en) * 2001-08-13 2005-01-11 Matrix Semiconductor, Inc. TFT mask ROM and method for making same
US6858481B2 (en) * 2001-08-13 2005-02-22 Advanced Micro Devices, Inc. Memory device with active and passive layers
US6525953B1 (en) 2001-08-13 2003-02-25 Matrix Semiconductor, Inc. Vertically-stacked, field-programmable, nonvolatile memory and method of fabrication
US6806526B2 (en) 2001-08-13 2004-10-19 Advanced Micro Devices, Inc. Memory device
EP1434232B1 (en) 2001-08-13 2007-09-19 Advanced Micro Devices, Inc. Memory cell
US6593624B2 (en) 2001-09-25 2003-07-15 Matrix Semiconductor, Inc. Thin film transistors with vertically offset drain regions
US6768157B2 (en) 2001-08-13 2004-07-27 Advanced Micro Devices, Inc. Memory device
US6838720B2 (en) * 2001-08-13 2005-01-04 Advanced Micro Devices, Inc. Memory device with active passive layers
US6798693B2 (en) * 2001-09-18 2004-09-28 Kilopass Technologies, Inc. Semiconductor memory cell and memory array using a breakdown phenomena in an ultra-thin dielectric
JP4599059B2 (ja) * 2001-09-18 2010-12-15 キロパス テクノロジー インコーポレイテッド 超薄膜誘電体のブレークダウン現象を利用した半導体メモリセルセル及びメモリアレイ
US6766960B2 (en) * 2001-10-17 2004-07-27 Kilopass Technologies, Inc. Smart card having memory using a breakdown phenomena in an ultra-thin dielectric
US6700151B2 (en) * 2001-10-17 2004-03-02 Kilopass Technologies, Inc. Reprogrammable non-volatile memory using a breakdown phenomena in an ultra-thin dielectric
US6624485B2 (en) 2001-11-05 2003-09-23 Matrix Semiconductor, Inc. Three-dimensional, mask-programmed read only memory
KR100433407B1 (ko) * 2002-02-06 2004-05-31 삼성광주전자 주식회사 업라이트형 진공청소기
JP2006508522A (ja) * 2002-02-22 2006-03-09 オヴォニクス インコーポレイテッド カルコゲニドクラッド法を使用する単一レベルの金属メモリーセル
US6683322B2 (en) 2002-03-01 2004-01-27 Hewlett-Packard Development Company, L.P. Flexible hybrid memory element
US6853049B2 (en) * 2002-03-13 2005-02-08 Matrix Semiconductor, Inc. Silicide-silicon oxide-semiconductor antifuse device and method of making
US6992925B2 (en) * 2002-04-26 2006-01-31 Kilopass Technologies, Inc. High density semiconductor memory cell and memory array using a single transistor and having counter-doped poly and buried diffusion wordline
US6940751B2 (en) * 2002-04-26 2005-09-06 Kilopass Technologies, Inc. High density semiconductor memory cell and memory array using a single transistor and having variable gate oxide breakdown
US6898116B2 (en) * 2002-04-26 2005-05-24 Kilopass Technologies, Inc. High density semiconductor memory cell and memory array using a single transistor having a buried N+ connection
US6777757B2 (en) * 2002-04-26 2004-08-17 Kilopass Technologies, Inc. High density semiconductor memory cell and memory array using a single transistor
US6737675B2 (en) 2002-06-27 2004-05-18 Matrix Semiconductor, Inc. High density 3D rail stack arrays
US6964906B2 (en) * 2002-07-02 2005-11-15 International Business Machines Corporation Programmable element with selectively conductive dopant and method for programming same
US7012276B2 (en) * 2002-09-17 2006-03-14 Advanced Micro Devices, Inc. Organic thin film Zener diodes
US7042772B2 (en) * 2002-09-26 2006-05-09 Kilopass Technology, Inc. Methods and circuits for programming of a semiconductor memory cell and memory array using a breakdown phenomenon in an ultra-thin dielectric
US7031209B2 (en) * 2002-09-26 2006-04-18 Kilopass Technology, Inc. Methods and circuits for testing programmability of a semiconductor memory cell and memory array using a breakdown phenomenon in an ultra-thin dielectric
TW577194B (en) * 2002-11-08 2004-02-21 Endpoints Technology Corp Digital adjustable chip oscillator
US6791891B1 (en) 2003-04-02 2004-09-14 Kilopass Technologies, Inc. Method of testing the thin oxide of a semiconductor memory cell that uses breakdown voltage
US6924664B2 (en) * 2003-08-15 2005-08-02 Kilopass Technologies, Inc. Field programmable gate array
US6972986B2 (en) * 2004-02-03 2005-12-06 Kilopass Technologies, Inc. Combination field programmable gate array allowing dynamic reprogrammability and non-votatile programmability based upon transistor gate oxide breakdown
US7064973B2 (en) * 2004-02-03 2006-06-20 Klp International, Ltd. Combination field programmable gate array allowing dynamic reprogrammability
US20050218929A1 (en) * 2004-04-02 2005-10-06 Man Wang Field programmable gate array logic cell and its derivatives
US8735297B2 (en) 2004-05-06 2014-05-27 Sidense Corporation Reverse optical proximity correction method
US9123572B2 (en) 2004-05-06 2015-09-01 Sidense Corporation Anti-fuse memory cell
US7755162B2 (en) * 2004-05-06 2010-07-13 Sidense Corp. Anti-fuse memory cell
WO2005109516A1 (en) * 2004-05-06 2005-11-17 Sidense Corp. Split-channel antifuse array architecture
US7164290B2 (en) * 2004-06-10 2007-01-16 Klp International, Ltd. Field programmable gate array logic unit and its cluster
US20050275427A1 (en) * 2004-06-10 2005-12-15 Man Wang Field programmable gate array logic unit and its cluster
US7135886B2 (en) * 2004-09-20 2006-11-14 Klp International, Ltd. Field programmable gate arrays using both volatile and nonvolatile memory cell properties and their control
US20060067117A1 (en) * 2004-09-29 2006-03-30 Matrix Semiconductor, Inc. Fuse memory cell comprising a diode, the diode serving as the fuse element
US7193436B2 (en) * 2005-04-18 2007-03-20 Klp International Ltd. Fast processing path using field programmable gate array logic units
DE602005011111D1 (de) 2005-06-03 2009-01-02 St Microelectronics Srl Selbstjustiertes Verfahren zur Herstellung von Phasenwechselspeicherzellen
US7295462B2 (en) * 2005-12-12 2007-11-13 Micron Technology, Inc. Method and apparatus processing variable resistance memory cell write operation
US20080308901A1 (en) * 2007-06-12 2008-12-18 Broadcom Corporation Integrated circuit having a thin passivation layer that facilitates laser programming, and applications thereof
US8120068B2 (en) 2008-12-24 2012-02-21 Sandisk 3D Llc Three-dimensional memory structures having shared pillar memory cells
US8270199B2 (en) 2009-04-03 2012-09-18 Sandisk 3D Llc Cross point non-volatile memory cell
US8779592B2 (en) * 2012-05-01 2014-07-15 Taiwan Semiconductor Manufacturing Company, Ltd. Via-free interconnect structure with self-aligned metal line interconnections
US9627395B2 (en) 2015-02-11 2017-04-18 Sandisk Technologies Llc Enhanced channel mobility three-dimensional memory structure and method of making thereof
US9478495B1 (en) 2015-10-26 2016-10-25 Sandisk Technologies Llc Three dimensional memory device containing aluminum source contact via structure and method of making thereof
US20170338282A1 (en) * 2016-05-20 2017-11-23 Intel Corporation Memory module with unpatterned storage material
WO2020028402A1 (en) * 2018-07-30 2020-02-06 mPower Technology, Inc. In-situ rapid annealing and operation of solar cells for extreme environment applications

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4001871A (en) * 1968-06-17 1977-01-04 Nippon Electric Company, Ltd. Semiconductor device
US3699543A (en) * 1968-11-04 1972-10-17 Energy Conversion Devices Inc Combination film deposited switch unit and integrated circuits
US3629863A (en) * 1968-11-04 1971-12-21 Energy Conversion Devices Inc Film deposited circuits and devices therefor
US3571809A (en) * 1968-11-04 1971-03-23 Energy Conversion Devices Inc Memory matrix having serially connected threshold and memory switch devices at each cross-over point
US3886577A (en) * 1973-09-12 1975-05-27 Energy Conversion Devices Inc Filament-type memory semiconductor device and method of making the same
US3875566A (en) * 1973-10-29 1975-04-01 Energy Conversion Devices Inc Resetting filament-forming memory semiconductor devices with multiple reset pulses
US3877049A (en) * 1973-11-28 1975-04-08 William D Buckley Electrodes for amorphous semiconductor switch devices and method of making the same
JPS5598852A (en) * 1979-01-23 1980-07-28 Nec Corp Memory device
US4281208A (en) * 1979-02-09 1981-07-28 Sanyo Electric Co., Ltd. Photovoltaic device and method of manufacturing thereof
IL61671A (en) * 1979-12-13 1984-04-30 Energy Conversion Devices Inc Diode and rom or eeprom devices using it
FR2478879A1 (fr) * 1980-03-24 1981-09-25 Commissariat Energie Atomique Procede de realisation de dispositifs a effet memoire a semi-conducteurs amorphes
US4339285A (en) * 1980-07-28 1982-07-13 Rca Corporation Method for fabricating adjacent conducting and insulating regions in a film by laser irradiation
JPS57106083A (en) * 1980-12-23 1982-07-01 Toshiba Corp Amorphous silicon diode array
JPS58118142A (ja) * 1982-01-06 1983-07-14 Semiconductor Energy Lab Co Ltd 半導体装置
US4545111A (en) * 1983-01-18 1985-10-08 Energy Conversion Devices, Inc. Method for making, parallel preprogramming or field programming of electronic matrix arrays
AU562641B2 (en) * 1983-01-18 1987-06-18 Energy Conversion Devices Inc. Electronic matrix array

Also Published As

Publication number Publication date
US4677742A (en) 1987-07-07
CA1222820A (en) 1987-06-09
EP0144604A3 (en) 1987-01-07
EP0144604A2 (en) 1985-06-19
JPS60186054A (ja) 1985-09-21

Similar Documents

Publication Publication Date Title
BR8406196A (pt) Arranjo de matriz eletronico
BR8405342A (pt) Pedal eletronico
FI850868A0 (fi) Elektroniskt stroe-system.
FR2564260B1 (fr) Circuit de preaccentuation
AT381392B (de) Elektronischer druckschreiber
BR8506439A (pt) Registrador de demanda eletronico
FI830324A0 (fi) Elektroniskt ballastsystem foer gasurladdningsroer
FR2568709B1 (fr) Circuit matriciel
IT1169495B (it) Sirena elettronica
BR8401717A (pt) Maquina de escrever eletronica
DK166340C (da) Elektronisk skiftesystem
BR8501220A (pt) Maquina de escrever eletronica
FI822593A0 (fi) Elektroniska byggdelar
FI830771L (fi) Elektronisk vaog
FI830014A0 (fi) Press
KR860004091U (ko) 전자부품
BR6300508U (pt) Minuteria eletronica
SE8301164D0 (sv) Elektroniska attiraljer
SE8406348D0 (sv) Elektronikst drivdon
BR8403605A (pt) Minuteria eletronica
BR6400495U (pt) Adorno eletronico
KR850010451U (ko) 전자 부품
BR8300833A (pt) Mecanismo de credenciamento eletronico de software
BR8204831A (pt) Rodeio eletronico
KR850005218U (ko) 매트릭스 제어회로