BR8201500A - Processo para o tratamento de camadas fotossensiveis,contendo compostos diazoicos,que trabalham positivamente,expostas a luz e reveladas,durante a producao de moldes de impressao"offset" - Google Patents

Processo para o tratamento de camadas fotossensiveis,contendo compostos diazoicos,que trabalham positivamente,expostas a luz e reveladas,durante a producao de moldes de impressao"offset"

Info

Publication number
BR8201500A
BR8201500A BR8201500A BR8201500A BR8201500A BR 8201500 A BR8201500 A BR 8201500A BR 8201500 A BR8201500 A BR 8201500A BR 8201500 A BR8201500 A BR 8201500A BR 8201500 A BR8201500 A BR 8201500A
Authority
BR
Brazil
Prior art keywords
light
during
offset
revealed
exposed
Prior art date
Application number
BR8201500A
Other languages
English (en)
Inventor
Gunter Berghauser
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8201500A publication Critical patent/BR8201500A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Printing Methods (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Materials For Photolithography (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Electrophonic Musical Instruments (AREA)
  • Stringed Musical Instruments (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Prostheses (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
BR8201500A 1981-03-19 1982-03-18 Processo para o tratamento de camadas fotossensiveis,contendo compostos diazoicos,que trabalham positivamente,expostas a luz e reveladas,durante a producao de moldes de impressao"offset" BR8201500A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813110632 DE3110632A1 (de) 1981-03-19 1981-03-19 Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen

Publications (1)

Publication Number Publication Date
BR8201500A true BR8201500A (pt) 1983-02-01

Family

ID=6127675

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8201500A BR8201500A (pt) 1981-03-19 1982-03-18 Processo para o tratamento de camadas fotossensiveis,contendo compostos diazoicos,que trabalham positivamente,expostas a luz e reveladas,durante a producao de moldes de impressao"offset"

Country Status (11)

Country Link
US (1) US4487827A (pt)
EP (1) EP0061059B1 (pt)
JP (1) JPS57167029A (pt)
AT (1) ATE17612T1 (pt)
AU (1) AU548473B2 (pt)
BR (1) BR8201500A (pt)
CA (1) CA1177303A (pt)
DE (2) DE3110632A1 (pt)
ES (1) ES510533A0 (pt)
FI (1) FI820918L (pt)
ZA (1) ZA821474B (pt)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
JPS60169852A (ja) * 1984-02-14 1985-09-03 Fuji Photo Film Co Ltd 湿し水不要ネガ型感光性平版印刷版の製版法
JP2597981B2 (ja) * 1985-08-28 1997-04-09 ソニー株式会社 レジスト膜の硬化処理方法
JPS62113141A (ja) * 1985-11-13 1987-05-25 Fuji Electric Co Ltd フオトリソグラフイ法
JPH0679162B2 (ja) * 1986-06-16 1994-10-05 ウシオ電機株式会社 半導体ウエハ用の処理台温度制御方法
DE4004511A1 (de) * 1990-02-14 1991-08-22 Hoechst Ag Vorrichtung zum einbrennen von lichtempfindlichen schichten waehrend der herstellung von druckformen
JPH06186755A (ja) * 1993-07-01 1994-07-08 Fujitsu Ltd レジストパターンの形成方法
JP4238948B2 (ja) 1999-04-08 2009-03-18 日本ゼオン株式会社 共役ジエンを含有する炭化水素混合物の分離精製装置の詰まりを防止する方法。
CN1839354B (zh) * 2003-07-17 2010-09-29 柯达彩色绘图有限责任公司 处理成像材料的设备及方法
DE102009026288A1 (de) 2009-07-29 2011-02-10 Sabinski, Joachim, Dr.-Ing. Permanentmagnetläufer mit geschützt und versenkt angeordneten, radial ausgerichteten Permanentmagneten bei tangentialer Ausrichtung der Magnetpole als Innenläuferausführung oder Außenläuferausführung rotierender elektrischer Maschinen und Verfahren zur Montage dieser Permanentmagnetläufer
DE102011000438A1 (de) 2011-02-01 2012-08-02 Uwe Guthardt Permanentmagetläufer für rotierende elektrische Maschinen mit geschützt und vergraben angeordneten, radial ausgerichteten Permanentmagneten bei tangentialer Ausrichtung der Magnetopole und Verfahren zur Montage dieser Permanentmagnetläufer

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE7805619U1 (de) * 1978-08-24 Wilhelm Staub Gmbh, 6078 Neu-Isenburg Gerät zur Wärmebehandlung von Druckplatten, insbesondere Offsetdruckplatten
US3046121A (en) * 1949-07-23 1962-07-24 Azoplate Corp Process for the manufacture of printing plates and light-sensitive material suttablefor use therein
US2702243A (en) * 1950-06-17 1955-02-15 Azoplate Corp Light-sensitive photographic element and process of producing printing plates
DE1447963B2 (de) * 1965-11-24 1972-09-07 KaIIe AG, 6202 Wiesbaden Biebnch Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
US3589261A (en) * 1968-01-16 1971-06-29 Du Pont Photographic developing apparatus
BE758409A (fr) * 1969-11-04 1971-05-03 Kalle Ag Procede et dispositif pour la cuisson de couches sur des plaques d'impression
BE793979A (fr) * 1972-01-15 1973-07-12 Kalle Ag Procede pour produire des cliches pour l'impression a plat et matiere pour de tels cliches
DE7202150U (de) * 1972-01-21 1972-05-04 W Staub Gmbh Auflagevorrichtung fuer offsetdruckplatten beim einbrennen derselben
BE795755A (fr) * 1972-02-24 1973-08-21 Kalle Ag Procede de fabrication de formes d'impression offset
US4093461A (en) * 1975-07-18 1978-06-06 Gaf Corporation Positive working thermally stable photoresist composition, article and method of using
JPS5223401A (en) * 1975-08-15 1977-02-22 Hitachi Ltd Method of etching photography
US4326018A (en) * 1977-12-12 1982-04-20 Polychrome Corporation Lithographic printing plate
JPS566236A (en) * 1979-06-28 1981-01-22 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
US4396284A (en) * 1980-04-21 1983-08-02 Howard A. Fromson Apparatus for making lithographic printing plates

Also Published As

Publication number Publication date
JPH0345826B2 (pt) 1991-07-12
AU548473B2 (en) 1985-12-12
ES8303727A1 (es) 1983-02-01
EP0061059A1 (de) 1982-09-29
ZA821474B (en) 1983-01-26
EP0061059B1 (de) 1986-01-22
FI820918L (fi) 1982-09-20
AU8157482A (en) 1982-09-23
CA1177303A (en) 1984-11-06
DE3268621D1 (en) 1986-03-06
ES510533A0 (es) 1983-02-01
US4487827A (en) 1984-12-11
DE3110632A1 (de) 1982-09-30
JPS57167029A (en) 1982-10-14
ATE17612T1 (de) 1986-02-15

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