BR7908545A - Processo para eletrodepositar uma camada de cobertura de chumbo-estanho sobre a superficie de uma estrutura de mancal,e processo para remover ions de cobre a partir de um banho contendo ions de chumbo,ions de cobre e ions de estanho - Google Patents
Processo para eletrodepositar uma camada de cobertura de chumbo-estanho sobre a superficie de uma estrutura de mancal,e processo para remover ions de cobre a partir de um banho contendo ions de chumbo,ions de cobre e ions de estanhoInfo
- Publication number
- BR7908545A BR7908545A BR7908545A BR7908545A BR7908545A BR 7908545 A BR7908545 A BR 7908545A BR 7908545 A BR7908545 A BR 7908545A BR 7908545 A BR7908545 A BR 7908545A BR 7908545 A BR7908545 A BR 7908545A
- Authority
- BR
- Brazil
- Prior art keywords
- ions
- copper ions
- electrodepositing
- cover layer
- bearing structure
- Prior art date
Links
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 title 2
- 229910001431 copper ion Inorganic materials 0.000 title 2
- 150000002500 ions Chemical class 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/10—Bearings
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/20—Regeneration of process solutions of rinse-solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/005,602 US4187166A (en) | 1979-01-22 | 1979-01-22 | Method of removing copper ions from a bath containing same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR7908545A true BR7908545A (pt) | 1980-09-02 |
Family
ID=21716702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR7908545A BR7908545A (pt) | 1979-01-22 | 1979-12-27 | Processo para eletrodepositar uma camada de cobertura de chumbo-estanho sobre a superficie de uma estrutura de mancal,e processo para remover ions de cobre a partir de um banho contendo ions de chumbo,ions de cobre e ions de estanho |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4187166A (OSRAM) |
| JP (1) | JPS55100992A (OSRAM) |
| KR (1) | KR850000304B1 (OSRAM) |
| AU (1) | AU527503B2 (OSRAM) |
| BR (1) | BR7908545A (OSRAM) |
| CA (1) | CA1153728A (OSRAM) |
| DE (1) | DE2947998A1 (OSRAM) |
| FR (1) | FR2446872A1 (OSRAM) |
| GB (1) | GB2039955B (OSRAM) |
| IN (1) | IN152023B (OSRAM) |
| IT (1) | IT1120140B (OSRAM) |
| MX (1) | MX153508A (OSRAM) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4405412A (en) * | 1982-03-29 | 1983-09-20 | Dart Industries Inc. | Removal of copper contamination from tin plating baths |
| DE3502278C2 (de) * | 1985-01-24 | 1987-05-07 | MTU Motoren- und Turbinen-Union München GmbH, 8000 München | Vorrichtung zur Erfassung von Meßwerten in rotierenden Anordnungen |
| JPH0288847A (ja) * | 1988-09-26 | 1990-03-29 | Oyo Kikaku:Kk | 二重床構築方法 |
| JPH0293096A (ja) * | 1988-09-30 | 1990-04-03 | Daiwa Kasei Kenkyusho:Kk | 滑り軸受の表面合金層の製造法 |
| JPH0491712U (OSRAM) * | 1990-12-28 | 1992-08-10 | ||
| US6143146A (en) * | 1998-08-25 | 2000-11-07 | Strom; Doug | Filter system |
| US6332973B1 (en) * | 2000-01-25 | 2001-12-25 | Advanced Micro Devices, Inc. | CMOS chemical bath purification |
| US6740221B2 (en) | 2001-03-15 | 2004-05-25 | Applied Materials Inc. | Method of forming copper interconnects |
| US7239747B2 (en) * | 2002-01-24 | 2007-07-03 | Chatterbox Systems, Inc. | Method and system for locating position in printed texts and delivering multimedia information |
| WO2003085713A1 (en) * | 2002-04-03 | 2003-10-16 | Applied Materials, Inc. | Homogeneous copper-tin alloy plating for enhancement of electro-migration resistance in interconnects |
| JP4243985B2 (ja) * | 2002-09-24 | 2009-03-25 | 大日本スクリーン製造株式会社 | 金属イオンの除去方法及び基板処理装置 |
| US20040118699A1 (en) * | 2002-10-02 | 2004-06-24 | Applied Materials, Inc. | Homogeneous copper-palladium alloy plating for enhancement of electro-migration resistance in interconnects |
| TWI820131B (zh) * | 2018-05-09 | 2023-11-01 | 美商應用材料股份有限公司 | 電鍍系統及用於去除電鍍系統內的含錫陰極電解液的銅汙染物之方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2734024A (en) * | 1956-02-07 | Method of making bearings | ||
| FR1334413A (fr) * | 1962-06-25 | 1963-08-09 | Coussinets Ste Indle | Procédés de préparation ou de régénération de bains mixtes de fluoborates de plomb et d'étain |
| US3812020A (en) * | 1969-08-11 | 1974-05-21 | Allied Chem | Electrolyte and method for electroplating an indium-copper alloy and printed circuits so plated |
| US3940319A (en) * | 1974-06-24 | 1976-02-24 | Nasglo International Corporation | Electrodeposition of bright tin-nickel alloy |
-
1979
- 1979-01-22 US US06/005,602 patent/US4187166A/en not_active Expired - Lifetime
- 1979-11-28 DE DE19792947998 patent/DE2947998A1/de active Granted
- 1979-11-30 CA CA000340975A patent/CA1153728A/en not_active Expired
- 1979-12-03 GB GB7941690A patent/GB2039955B/en not_active Expired
- 1979-12-04 IT IT50987/79A patent/IT1120140B/it active
- 1979-12-06 AU AU53560/79A patent/AU527503B2/en not_active Ceased
- 1979-12-07 JP JP15821379A patent/JPS55100992A/ja active Granted
- 1979-12-12 FR FR7930466A patent/FR2446872A1/fr active Granted
- 1979-12-27 BR BR7908545A patent/BR7908545A/pt not_active IP Right Cessation
-
1980
- 1980-01-01 IN IN10/CAL/80A patent/IN152023B/en unknown
- 1980-01-15 MX MX180807A patent/MX153508A/es unknown
- 1980-01-19 KR KR1019800000192A patent/KR850000304B1/ko not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| MX153508A (es) | 1986-11-10 |
| JPS55100992A (en) | 1980-08-01 |
| DE2947998A1 (de) | 1980-07-31 |
| IN152023B (OSRAM) | 1983-10-01 |
| CA1153728A (en) | 1983-09-13 |
| IT7950987A0 (it) | 1979-12-04 |
| KR830002066A (ko) | 1983-05-21 |
| GB2039955B (en) | 1983-01-26 |
| FR2446872A1 (fr) | 1980-08-14 |
| KR850000304B1 (ko) | 1985-03-18 |
| US4187166A (en) | 1980-02-05 |
| IT1120140B (it) | 1986-03-19 |
| GB2039955A (en) | 1980-08-20 |
| FR2446872B1 (OSRAM) | 1983-01-14 |
| DE2947998C2 (OSRAM) | 1988-10-27 |
| JPS6214038B2 (OSRAM) | 1987-03-31 |
| AU5356079A (en) | 1981-07-02 |
| AU527503B2 (en) | 1983-03-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK | Patent expired |
Effective date: 19941227 |