IT7950987A0 - Un ricoprimento di piombo-stagno procedimento per elettrodepositare allontanando ioni rame dal bagno - Google Patents

Un ricoprimento di piombo-stagno procedimento per elettrodepositare allontanando ioni rame dal bagno

Info

Publication number
IT7950987A0
IT7950987A0 IT7950987A IT5098779A IT7950987A0 IT 7950987 A0 IT7950987 A0 IT 7950987A0 IT 7950987 A IT7950987 A IT 7950987A IT 5098779 A IT5098779 A IT 5098779A IT 7950987 A0 IT7950987 A0 IT 7950987A0
Authority
IT
Italy
Prior art keywords
electrodepositing
bath
lead
copper ions
tin coating
Prior art date
Application number
IT7950987A
Other languages
English (en)
Other versions
IT1120140B (it
Inventor
Wayne A Kruper
Original Assignee
Gould Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gould Inc filed Critical Gould Inc
Publication of IT7950987A0 publication Critical patent/IT7950987A0/it
Application granted granted Critical
Publication of IT1120140B publication Critical patent/IT1120140B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/10—Bearings
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/20—Regeneration of process solutions of rinse-solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
IT50987/79A 1979-01-22 1979-12-04 Procedimento per elettrodepositare un ricoprimento di piombo-stagno allontanando ioni rame dal bagno IT1120140B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/005,602 US4187166A (en) 1979-01-22 1979-01-22 Method of removing copper ions from a bath containing same

Publications (2)

Publication Number Publication Date
IT7950987A0 true IT7950987A0 (it) 1979-12-04
IT1120140B IT1120140B (it) 1986-03-19

Family

ID=21716702

Family Applications (1)

Application Number Title Priority Date Filing Date
IT50987/79A IT1120140B (it) 1979-01-22 1979-12-04 Procedimento per elettrodepositare un ricoprimento di piombo-stagno allontanando ioni rame dal bagno

Country Status (12)

Country Link
US (1) US4187166A (it)
JP (1) JPS55100992A (it)
KR (1) KR850000304B1 (it)
AU (1) AU527503B2 (it)
BR (1) BR7908545A (it)
CA (1) CA1153728A (it)
DE (1) DE2947998A1 (it)
FR (1) FR2446872A1 (it)
GB (1) GB2039955B (it)
IN (1) IN152023B (it)
IT (1) IT1120140B (it)
MX (1) MX153508A (it)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4405412A (en) * 1982-03-29 1983-09-20 Dart Industries Inc. Removal of copper contamination from tin plating baths
DE3502278A1 (de) * 1985-01-24 1986-07-24 MTU Motoren- und Turbinen-Union München GmbH, 8000 München Vorrichtung zur messung von druecken in rotierenden anordnungen (systemen)
JPH0288847A (ja) * 1988-09-26 1990-03-29 Oyo Kikaku:Kk 二重床構築方法
JPH0293096A (ja) * 1988-09-30 1990-04-03 Daiwa Kasei Kenkyusho:Kk 滑り軸受の表面合金層の製造法
JPH0491712U (it) * 1990-12-28 1992-08-10
US6143146A (en) * 1998-08-25 2000-11-07 Strom; Doug Filter system
US6332973B1 (en) * 2000-01-25 2001-12-25 Advanced Micro Devices, Inc. CMOS chemical bath purification
US6740221B2 (en) 2001-03-15 2004-05-25 Applied Materials Inc. Method of forming copper interconnects
US7239747B2 (en) * 2002-01-24 2007-07-03 Chatterbox Systems, Inc. Method and system for locating position in printed texts and delivering multimedia information
US20030188974A1 (en) * 2002-04-03 2003-10-09 Applied Materials, Inc. Homogeneous copper-tin alloy plating for enhancement of electro-migration resistance in interconnects
JP4243985B2 (ja) * 2002-09-24 2009-03-25 大日本スクリーン製造株式会社 金属イオンの除去方法及び基板処理装置
US20040118699A1 (en) * 2002-10-02 2004-06-24 Applied Materials, Inc. Homogeneous copper-palladium alloy plating for enhancement of electro-migration resistance in interconnects
US20190345624A1 (en) * 2018-05-09 2019-11-14 Applied Materials, Inc. Systems and methods for removing contaminants in electroplating systems

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2734024A (en) * 1956-02-07 Method of making bearings
FR1334413A (fr) * 1962-06-25 1963-08-09 Coussinets Ste Indle Procédés de préparation ou de régénération de bains mixtes de fluoborates de plomb et d'étain
US3812020A (en) * 1969-08-11 1974-05-21 Allied Chem Electrolyte and method for electroplating an indium-copper alloy and printed circuits so plated
US3940319A (en) * 1974-06-24 1976-02-24 Nasglo International Corporation Electrodeposition of bright tin-nickel alloy

Also Published As

Publication number Publication date
IN152023B (it) 1983-10-01
DE2947998A1 (de) 1980-07-31
AU5356079A (en) 1981-07-02
BR7908545A (pt) 1980-09-02
GB2039955A (en) 1980-08-20
US4187166A (en) 1980-02-05
JPS6214038B2 (it) 1987-03-31
KR830002066A (ko) 1983-05-21
MX153508A (es) 1986-11-10
KR850000304B1 (ko) 1985-03-18
IT1120140B (it) 1986-03-19
DE2947998C2 (it) 1988-10-27
FR2446872A1 (fr) 1980-08-14
AU527503B2 (en) 1983-03-10
CA1153728A (en) 1983-09-13
FR2446872B1 (it) 1983-01-14
GB2039955B (en) 1983-01-26
JPS55100992A (en) 1980-08-01

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Legal Events

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TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19951130