BR112014015332A8 - revestimento de laminação de íons em arco de baixa temperatura - Google Patents

revestimento de laminação de íons em arco de baixa temperatura

Info

Publication number
BR112014015332A8
BR112014015332A8 BR112014015332A BR112014015332A BR112014015332A8 BR 112014015332 A8 BR112014015332 A8 BR 112014015332A8 BR 112014015332 A BR112014015332 A BR 112014015332A BR 112014015332 A BR112014015332 A BR 112014015332A BR 112014015332 A8 BR112014015332 A8 BR 112014015332A8
Authority
BR
Brazil
Prior art keywords
cathode
arc
coating
anode
solid material
Prior art date
Application number
BR112014015332A
Other languages
English (en)
Other versions
BR112014015332A2 (pt
BR112014015332B1 (pt
Inventor
Kurapov Denis
Lechthaler Markus
Krassnitzer Siegfried
Original Assignee
Oerlikon Trading Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag filed Critical Oerlikon Trading Ag
Publication of BR112014015332A2 publication Critical patent/BR112014015332A2/pt
Publication of BR112014015332A8 publication Critical patent/BR112014015332A8/pt
Publication of BR112014015332B1 publication Critical patent/BR112014015332B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

57) abstract: coating method for arc coating or arc ion plating coating of substrates in a vacuum chamber in which using an arc evaporator solid material that functions as cathode is evaporated, during arc evaporation the motion of the cathode spot on the solid material surface is accelerated using a magnetic field for avoiding ejection of a large amount of macro-particles or droplets from the solid material surface, negative charged particles resulted from the arc evaporation flow from the cathode to an anode, characterized by the motion of the negative charged particles from the cathode to the anode fundamentally doesn't cause an additional increase of the absolute value of the potential difference between cathode and anode allowing a lower increment of the substrate temperature during coating. tradução do resumo resumo patente de invenção para: "revestimento de laminação de íons em arco de baixa temperatura". a presente invenção se refere a um método de revestimento para revestimento de arco ou revestimento de laminação de íons em arco de substratos em uma câmara a vácuo na qual usando um evaporador de arco de material sólido que funciona como catodo é evaporado, durante a evaporação de arco o movimento do ponto de catodo na superfície do material sólido é acelerado usando um campo magnético para evitar a ejeção de uma grande quantidade de macro partículas ou gotículas a partir da superfície do material sólido, as partículas negativamente carregadas resultaram a partir do fluxo de evaporação de arco a partir do catodo para um anodo, caracterizado pelo fato de que o movimento das partículas negativamente carregadas a partir do catodo para o anodo fundamentalmente não causa um aumento adicional do valor absoluto da diferença potencial entre catodo e anodo permitindo um incremento mais baixo da temperatura do substrato durante revestimento.
BR112014015332-9A 2011-12-22 2012-12-14 método para revestimento por laminação de íons em arco de baixa temperatura BR112014015332B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP11010102.9 2011-12-22
EP11010102.9A EP2607517A1 (en) 2011-12-22 2011-12-22 Low temperature arc ion plating coating
PCT/EP2012/005161 WO2013091802A1 (en) 2011-12-22 2012-12-14 Low temperature arc ion plating coating

Publications (3)

Publication Number Publication Date
BR112014015332A2 BR112014015332A2 (pt) 2017-06-13
BR112014015332A8 true BR112014015332A8 (pt) 2017-06-13
BR112014015332B1 BR112014015332B1 (pt) 2021-03-16

Family

ID=47428548

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112014015332-9A BR112014015332B1 (pt) 2011-12-22 2012-12-14 método para revestimento por laminação de íons em arco de baixa temperatura

Country Status (10)

Country Link
US (1) US10865472B2 (pt)
EP (2) EP2607517A1 (pt)
JP (2) JP2015506410A (pt)
KR (2) KR20140104021A (pt)
CN (1) CN104114740B (pt)
BR (1) BR112014015332B1 (pt)
CA (1) CA2860079C (pt)
MX (1) MX2014007674A (pt)
RU (1) RU2634101C2 (pt)
WO (1) WO2013091802A1 (pt)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019110642A1 (de) 2019-04-25 2020-10-29 Vtd Vakuumtechnik Dresden Gmbh Anode für PVD-Prozesse
KR102667048B1 (ko) 2021-07-20 2024-05-22 한국생산기술연구원 중앙부 함몰형 자기장을 가지는 아크 증발원 및 이를 포함하는 아크 이온 플레이팅 장치, 그리고 이를 이용한 금속 및 금속화합물의 증착방법

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Also Published As

Publication number Publication date
CA2860079A1 (en) 2013-06-27
RU2634101C2 (ru) 2017-10-23
BR112014015332A2 (pt) 2017-06-13
JP2015506410A (ja) 2015-03-02
KR102294551B1 (ko) 2021-08-27
WO2013091802A1 (en) 2013-06-27
KR20140104021A (ko) 2014-08-27
CN104114740B (zh) 2017-09-15
RU2014130048A (ru) 2016-02-10
MX2014007674A (es) 2014-11-14
EP2794952B1 (en) 2022-05-11
CA2860079C (en) 2023-08-22
CN104114740A (zh) 2014-10-22
US20150001064A1 (en) 2015-01-01
JP6896691B2 (ja) 2021-06-30
US10865472B2 (en) 2020-12-15
KR20200036034A (ko) 2020-04-06
BR112014015332B1 (pt) 2021-03-16
EP2607517A1 (en) 2013-06-26
JP2019023351A (ja) 2019-02-14
EP2794952A1 (en) 2014-10-29

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Legal Events

Date Code Title Description
B25D Requested change of name of applicant approved

Owner name: OERLIKON SURFACE SOLUTIONS AG, TRUEBBACH (CH)

B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 14/12/2012, OBSERVADAS AS CONDICOES LEGAIS.

B25D Requested change of name of applicant approved

Owner name: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON (CH)

B25G Requested change of headquarter approved

Owner name: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON (CH)