BR112014003893A2 - método para formar uma imagem condutiva em uma superfície não condutiva - Google Patents
método para formar uma imagem condutiva em uma superfície não condutivaInfo
- Publication number
- BR112014003893A2 BR112014003893A2 BR112014003893A BR112014003893A BR112014003893A2 BR 112014003893 A2 BR112014003893 A2 BR 112014003893A2 BR 112014003893 A BR112014003893 A BR 112014003893A BR 112014003893 A BR112014003893 A BR 112014003893A BR 112014003893 A2 BR112014003893 A2 BR 112014003893A2
- Authority
- BR
- Brazil
- Prior art keywords
- forming
- conductive image
- nonconductive surface
- nonconductive
- conductive
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
- H01L21/76879—Filling of holes, grooves or trenches, e.g. vias, with conductive material by selective deposition of conductive material in the vias, e.g. selective C.V.D. on semiconductor material, plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1664—Process features with additional means during the plating process
- C23C18/1673—Magnetic field
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/104—Using magnetic force, e.g. to align particles or for a temporary connection during processing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1157—Using means for chemical reduction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161525662P | 2011-08-19 | 2011-08-19 | |
US201161568736P | 2011-12-09 | 2011-12-09 | |
US13/403,797 US8784952B2 (en) | 2011-08-19 | 2012-02-23 | Method of forming a conductive image on a non-conductive surface |
PCT/US2012/051193 WO2013028473A1 (en) | 2011-08-19 | 2012-08-16 | Method of forming a conductive image on a non-conductive surface |
Publications (1)
Publication Number | Publication Date |
---|---|
BR112014003893A2 true BR112014003893A2 (pt) | 2017-03-14 |
Family
ID=47711823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112014003893A BR112014003893A2 (pt) | 2011-08-19 | 2012-08-16 | método para formar uma imagem condutiva em uma superfície não condutiva |
Country Status (23)
Country | Link |
---|---|
US (3) | US8784952B2 (pt) |
EP (1) | EP2745658B1 (pt) |
JP (2) | JP2014525992A (pt) |
CN (1) | CN104025724B (pt) |
AU (2) | AU2012299226A1 (pt) |
BR (1) | BR112014003893A2 (pt) |
CA (1) | CA2845822A1 (pt) |
CY (1) | CY1117130T1 (pt) |
DK (1) | DK2745658T3 (pt) |
EA (1) | EA027161B1 (pt) |
ES (1) | ES2548415T3 (pt) |
HR (1) | HRP20151016T1 (pt) |
HU (1) | HUE028044T2 (pt) |
IL (1) | IL231045A0 (pt) |
MX (2) | MX2014001980A (pt) |
MY (1) | MY185302A (pt) |
PL (1) | PL2745658T4 (pt) |
PT (1) | PT2745658E (pt) |
RS (1) | RS54497B1 (pt) |
SG (2) | SG10201504593RA (pt) |
SI (1) | SI2745658T1 (pt) |
SM (1) | SMT201500269B (pt) |
WO (1) | WO2013028473A1 (pt) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2014305949A1 (en) * | 2013-08-06 | 2016-03-03 | Earthone Circuit Technologies Corporation | Forming a conductive image using high speed electroless plating |
US9398703B2 (en) | 2014-05-19 | 2016-07-19 | Sierra Circuits, Inc. | Via in a printed circuit board |
US9380700B2 (en) | 2014-05-19 | 2016-06-28 | Sierra Circuits, Inc. | Method for forming traces of a printed circuit board |
US9706667B2 (en) | 2014-05-19 | 2017-07-11 | Sierra Circuits, Inc. | Via in a printed circuit board |
KR101698160B1 (ko) * | 2014-09-17 | 2017-01-19 | 주식회사 엘지화학 | 도전성 패턴 형성용 조성물 및 도전성 패턴을 갖는 수지 구조체 |
US10677837B2 (en) | 2016-06-01 | 2020-06-09 | Kyzen Corporation | System and method for electrical circuit monitoring |
CN105451456A (zh) * | 2015-12-08 | 2016-03-30 | 昆山联滔电子有限公司 | 非导电基材的导体线路的制造方法 |
GB201600214D0 (en) * | 2016-01-06 | 2016-02-17 | Univ Coventry | Material deposition in a magnetic field |
US10849233B2 (en) | 2017-07-10 | 2020-11-24 | Catlam, Llc | Process for forming traces on a catalytic laminate |
US10349520B2 (en) | 2017-06-28 | 2019-07-09 | Catlam, Llc | Multi-layer circuit board using interposer layer and conductive paste |
US10765012B2 (en) | 2017-07-10 | 2020-09-01 | Catlam, Llc | Process for printed circuit boards using backing foil |
US10827624B2 (en) | 2018-03-05 | 2020-11-03 | Catlam, Llc | Catalytic laminate with conductive traces formed during lamination |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2930784A1 (de) * | 1979-07-28 | 1981-02-12 | Licentia Gmbh | Verfahren zur aktivierung von kunststoffoberflaechen |
JPS5917225A (ja) * | 1982-07-20 | 1984-01-28 | Nec Corp | 磁気記録媒体の製造方法 |
JPS5917223A (ja) * | 1982-07-20 | 1984-01-28 | Nec Corp | 磁気記録媒体の製造方法 |
JPS6147695A (ja) * | 1984-08-15 | 1986-03-08 | 株式会社日立製作所 | 部分めつき,エツチング方法 |
US4900618A (en) * | 1986-11-07 | 1990-02-13 | Monsanto Company | Oxidation-resistant metal coatings |
US5506091A (en) * | 1990-04-20 | 1996-04-09 | Nisshinbo Industries, Inc. | Photosensitive resin composition and method of forming conductive pattern |
RU2039128C1 (ru) * | 1990-07-30 | 1995-07-09 | Институт общей и неорганической химии АН Украины | Способ химического никелирования |
US5336370A (en) * | 1993-12-09 | 1994-08-09 | Chipalkatti Makarand H | Pre-treatment for plating technique |
JP3916023B2 (ja) * | 1998-06-26 | 2007-05-16 | 株式会社エフオーアイ | 鍍金システム |
WO2000035259A2 (de) * | 1998-12-10 | 2000-06-15 | Gerhard Naundorf | Verfahren zur herstellung von leiterbahnstrukturen |
JP2001089673A (ja) * | 1999-09-27 | 2001-04-03 | Hideo Kakigi | 高分子成形物およびその製造方法 |
US7622024B1 (en) * | 2000-05-10 | 2009-11-24 | Novellus Systems, Inc. | High resistance ionic current source |
US20050018595A1 (en) * | 2001-06-06 | 2005-01-27 | Spectra Systems Corporation | System for applying markings to optical media |
US6838352B1 (en) * | 2002-07-05 | 2005-01-04 | Newport Fab, Llc. | Damascene trench capacitor for mixed-signal/RF IC applications |
DE10255520B4 (de) * | 2002-11-28 | 2007-12-27 | Infineon Technologies Ag | Verfahren zur elektrischen Kontaktierung mittels gefüllter Flüssigkeiten und elektronische Bauteile mit derartiger Kontaktierung |
KR101038494B1 (ko) * | 2004-12-28 | 2011-06-01 | 삼성테크윈 주식회사 | Rfid 태그용 안테나 제조 방법 |
US7867570B2 (en) * | 2006-10-26 | 2011-01-11 | Basf Coatings Gmbh | Method of producing a coating having metal coordinating and film-forming materials |
US20080116077A1 (en) * | 2006-11-21 | 2008-05-22 | M/A-Com, Inc. | System and method for solder bump plating |
JP5448524B2 (ja) * | 2008-04-23 | 2014-03-19 | 富士フイルム株式会社 | めっき用積層フィルム、表面金属膜材料の作製方法及び表面金属膜材料 |
US20090269510A1 (en) * | 2008-04-25 | 2009-10-29 | Daniel Lieberman | Printed electronics by metal plating through uv light |
KR20100009752A (ko) * | 2008-07-21 | 2010-01-29 | 삼성전자주식회사 | 자기장을 이용한 무전해 도금 장치 및 방법 |
JP2010106316A (ja) * | 2008-10-30 | 2010-05-13 | Du Pont Toray Co Ltd | 導電性繊維の製造方法 |
JP2011124523A (ja) * | 2010-02-02 | 2011-06-23 | Napura:Kk | 電子デバイス用基板、電子デバイス用積層体、電子デバイス及びそれらの製造方法 |
-
2012
- 2012-02-23 US US13/403,797 patent/US8784952B2/en active Active - Reinstated
- 2012-08-16 AU AU2012299226A patent/AU2012299226A1/en not_active Abandoned
- 2012-08-16 ES ES12790696.4T patent/ES2548415T3/es active Active
- 2012-08-16 HU HUE12790696A patent/HUE028044T2/en unknown
- 2012-08-16 US US13/587,785 patent/US8784953B2/en active Active - Reinstated
- 2012-08-16 PL PL12790696T patent/PL2745658T4/pl unknown
- 2012-08-16 MX MX2014001980A patent/MX2014001980A/es active IP Right Grant
- 2012-08-16 WO PCT/US2012/051193 patent/WO2013028473A1/en active Application Filing
- 2012-08-16 DK DK12790696.4T patent/DK2745658T3/en active
- 2012-08-16 SG SG10201504593RA patent/SG10201504593RA/en unknown
- 2012-08-16 SI SI201230313T patent/SI2745658T1/sl unknown
- 2012-08-16 CA CA2845822A patent/CA2845822A1/en not_active Abandoned
- 2012-08-16 RS RS20150869A patent/RS54497B1/en unknown
- 2012-08-16 BR BR112014003893A patent/BR112014003893A2/pt not_active Application Discontinuation
- 2012-08-16 PT PT127906964T patent/PT2745658E/pt unknown
- 2012-08-16 EP EP12790696.4A patent/EP2745658B1/en active Active
- 2012-08-16 CN CN201280051161.2A patent/CN104025724B/zh not_active Expired - Fee Related
- 2012-08-16 MX MX2015007418A patent/MX346900B/es unknown
- 2012-08-16 JP JP2014527191A patent/JP2014525992A/ja active Pending
- 2012-08-16 EA EA201490479A patent/EA027161B1/ru not_active IP Right Cessation
- 2012-08-16 SG SG11201400069VA patent/SG11201400069VA/en unknown
- 2012-08-16 MY MYPI2014000437A patent/MY185302A/en unknown
-
2014
- 2014-02-19 IL IL231045A patent/IL231045A0/en unknown
- 2014-06-13 US US14/304,609 patent/US20140357081A1/en not_active Abandoned
-
2015
- 2015-09-24 CY CY20151100810T patent/CY1117130T1/el unknown
- 2015-09-24 HR HRP20151016TT patent/HRP20151016T1/hr unknown
- 2015-10-29 SM SM201500269T patent/SMT201500269B/it unknown
-
2016
- 2016-08-12 JP JP2016158458A patent/JP2016196708A/ja active Pending
-
2017
- 2017-02-09 AU AU2017200890A patent/AU2017200890A1/en not_active Abandoned
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BR112014003893A2 (pt) | método para formar uma imagem condutiva em uma superfície não condutiva | |
EP2690501A4 (en) | DRIVER ELEMENT FOR ELECTROPHOTOGRAPHY | |
BR112014004988A2 (pt) | processo de ladrilho para recuperação de imagem digital | |
BR112014025522A2 (pt) | método para recuperar hidrocarbonetos de uma formação | |
HK1196630A1 (en) | Method for producing thermally conductive sheet | |
BRDI7105189S (pt) | Configuração aplicada em óculos para imagens em 3d | |
HK1168681A1 (en) | A method for segmenting a foreground image | |
PL3764642T3 (pl) | Sposób kodowania obrazu | |
BR112014013749A2 (pt) | método para aplicação de textura a uma superfície aerodinâmica | |
BR112013030423A2 (pt) | método para produção de biocoque | |
EP2677535A4 (en) | METHOD FOR PRODUCING AN INSULATING FILM | |
GB2487717B (en) | Image encoding method | |
HK1201032A1 (zh) | 包括其表面的適合於示出多個圖像的區域的物體 | |
HK1198695A1 (en) | Apparatus with conductive strip for dust removal | |
BR112014008798A2 (pt) | método para a fabricação de um aglomerado de partículas | |
BR112013030522A2 (pt) | método para fabricar uma ferramenta rosqueada. | |
FI20115424A (fi) | Menetelmä kohteen pinnan muokkaamiseksi | |
BR112014005196A2 (pt) | método para fabricar uma chapa de impressão litográfica | |
BR112013030061A2 (pt) | aparelho para fabricação de ladrilhos | |
EP2906428A4 (en) | METHOD FOR PRODUCING A SUBSTRATE WITH AN IMAGE ON AT LEAST ONE SURFACE | |
SG11201406753VA (en) | Method for dry-docking a floating unit | |
BR112014004392A2 (pt) | método para moldagem por fundição de uma lente de contato | |
BR112013019910A2 (pt) | conexão de plugue para contato elétrico direto de uma placa condutora | |
BRDI7105669S (pt) | Configuração aplicada em oculos para imagens 3d | |
ZA201401839B (en) | Method of forming a conductive image on a non-conductive surface |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |