BR0315699A - Processo para a aplicação por vácuo elevado de substratos com cinta com uma cobertura de barreira transparente de óxido de alumìnio - Google Patents

Processo para a aplicação por vácuo elevado de substratos com cinta com uma cobertura de barreira transparente de óxido de alumìnio

Info

Publication number
BR0315699A
BR0315699A BR0315699-0A BR0315699A BR0315699A BR 0315699 A BR0315699 A BR 0315699A BR 0315699 A BR0315699 A BR 0315699A BR 0315699 A BR0315699 A BR 0315699A
Authority
BR
Brazil
Prior art keywords
aluminum oxide
high vacuum
oxide barrier
barrier cover
vacuum application
Prior art date
Application number
BR0315699-0A
Other languages
English (en)
Other versions
BR0315699B1 (pt
Inventor
Nicolas Schiller
Steffen Straach
Mathias Raebisch
Christoph Charton
Matthias Fahland
Original Assignee
Fraunhofer Ges Forschung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Ges Forschung filed Critical Fraunhofer Ges Forschung
Publication of BR0315699A publication Critical patent/BR0315699A/pt
Publication of BR0315699B1 publication Critical patent/BR0315699B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Inorganic Insulating Materials (AREA)
  • Chemically Coating (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

"PROCESSO PARA A APLICAçãO POR VáCUO ELEVADO DE SUBSTRATOS COM CINTA COM UMA COBERTURA DE BARREIRA TRANSPARENTE DE óXIDO DE ALUMìNIO". A invenção corresponde a um processo para a vaporização de substratos com cinta com uma cobertura de barreira transparente, mediante a vaporização reativa de alumínio e entrada de gás reativo, em uma instalação de vaporização com cinta, processo por meio do qual, antes do revestimento com óxido de alumínio, sobre o substrato, é expandida uma cobertura fechada incompleta de um metal ou de um óxido metálico mediante o bombardeamento de magnetron.
BRPI0315699-0A 2002-11-29 2003-10-16 processo de deposição de vapor de substratos em forma de fita com uma camada de barreira de óxido de alumìnio transparente por evaporação reativa de alumìnio e admissão de gás reativo em uma instalação de deposição de vapor de fita. BR0315699B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10255822A DE10255822B4 (de) 2002-11-29 2002-11-29 Verfahren zum Bedampfen bandförmiger Substrate mit einer transparenten Barriereschicht aus Aluminiumoxid
DE10255822.1 2002-11-29
PCT/EP2003/011477 WO2004050945A2 (de) 2002-11-29 2003-10-16 Verfahren zum bedampfen bandförmiger substrate mit einer transparenten barriereschicht aus aluminiumoxid

Publications (2)

Publication Number Publication Date
BR0315699A true BR0315699A (pt) 2005-09-06
BR0315699B1 BR0315699B1 (pt) 2012-11-27

Family

ID=32318811

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0315699-0A BR0315699B1 (pt) 2002-11-29 2003-10-16 processo de deposição de vapor de substratos em forma de fita com uma camada de barreira de óxido de alumìnio transparente por evaporação reativa de alumìnio e admissão de gás reativo em uma instalação de deposição de vapor de fita.

Country Status (14)

Country Link
US (1) US7541070B2 (pt)
EP (1) EP1565591B1 (pt)
AT (1) ATE375409T1 (pt)
AU (1) AU2003274021A1 (pt)
BR (1) BR0315699B1 (pt)
CA (1) CA2505027C (pt)
CO (1) CO5690658A2 (pt)
CR (1) CR7821A (pt)
DE (2) DE10255822B4 (pt)
EC (1) ECSP055797A (pt)
ES (1) ES2290496T3 (pt)
MX (1) MXPA05005113A (pt)
RU (1) RU2352683C2 (pt)
WO (1) WO2004050945A2 (pt)

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US8025985B2 (en) * 2005-08-11 2011-09-27 E. I. Du Pont De Nemours And Company Porous metallized sheets coated with an inorganic layer having low emissivity and high moisture vapor permeability
DE102007003766B4 (de) * 2006-12-23 2008-09-11 Hvb Hoch-Vakuum-Beschichtungs Gmbh High Vacuum Coating Transparente Barrierefolien für die Verpackungsindustrie
EP2222459A4 (en) * 2007-12-10 2012-12-05 Toray Plastics America Inc HIGH-LOCKING BIAXIALLY ORIENTED POLYMILIC ACID FILM
MX2011001623A (es) 2008-08-15 2011-05-24 Toray Plastics America Inc Pelicula de acido polilactico biaxialmente orientada con alta barrera.
US9150004B2 (en) 2009-06-19 2015-10-06 Toray Plastics (America), Inc. Biaxially oriented polylactic acid film with improved heat seal properties
US9023443B2 (en) 2009-09-25 2015-05-05 Toray Plastics (America), Inc. Multi-layer high moisture barrier polylactic acid film
WO2011103452A1 (en) 2010-02-19 2011-08-25 Toray Plastics (America) , Inc. Multi-layer high moisture barrier polylactic acid film
US9492962B2 (en) 2010-03-31 2016-11-15 Toray Plastics (America), Inc. Biaxially oriented polylactic acid film with reduced noise level and improved moisture barrier
EP2552689B1 (en) 2010-03-31 2017-10-25 Toray Plastics (America) , Inc. Biaxially oriented polyactic acid film with reduced noise level
EP2431995A1 (en) 2010-09-17 2012-03-21 Asociacion de la Industria Navarra (AIN) Ionisation device
JP5649431B2 (ja) * 2010-12-16 2015-01-07 株式会社神戸製鋼所 プラズマｃｖｄ装置
EP2474647A1 (en) 2011-01-05 2012-07-11 Asociacion de la Industria Navarra (AIN) Coating barrier layer and manufacturing process
EP2497636A1 (de) 2011-03-11 2012-09-12 Deutsche SiSi-Werke Betriebs GmbH Verbessertes Verbundsystem für Verpackungen
CN102691062A (zh) * 2011-03-23 2012-09-26 鸿富锦精密工业（深圳）有限公司 壳体及其制造方法
DE102011017404A1 (de) * 2011-04-18 2012-10-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden eines transparenten Barriereschichtsystems
DE102011017403A1 (de) * 2011-04-18 2012-10-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden eines transparenten Barriereschichtsystems
CN103451652B (zh) * 2012-05-29 2015-10-21 吉林师范大学 一种银纳米粒子包覆氧化锌纳米管衬底的制备方法
RU2564650C1 (ru) * 2014-07-22 2015-10-10 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" (ФГУП "ВИАМ") Способ нанесения электропроводящего покрытия для электрообогреваемого элемента органического остекления
RU2704949C2 (ru) * 2014-12-19 2019-10-31 Сандвик Интеллекчуал Проперти Аб Режущий инструмент с хогф-покрытием
RU2676720C1 (ru) * 2018-03-28 2019-01-10 Федеральное государственное бюджетное учреждение науки Институт электрофизики Уральского отделения Российской академии наук Способ вакуумного ионно-плазменного низкотемпературного осаждения нанокристаллического покрытия из оксида алюминия
CN113874543A (zh) * 2019-05-31 2021-12-31 东洋纺株式会社 透明阻气薄膜和其制造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0699798B2 (ja) * 1985-10-29 1994-12-07 東洋メタライジング株式会社 透明ガス遮断性フイルムの製造方法
US5178967A (en) * 1989-02-03 1993-01-12 Alcan International Limited Bilayer oxide film and process for producing same
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US5792550A (en) * 1989-10-24 1998-08-11 Flex Products, Inc. Barrier film having high colorless transparency and method
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CA2044053C (en) 1990-06-08 2001-11-27 Roger W. Phillips Barrier film having high colorless transparency and method
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IT1261918B (it) * 1993-06-11 1996-06-04 Cetev Cent Tecnolog Vuoto Struttura per deposizione reattiva di metalli in impianti da vuoto continui e relativo processo.
DE4343040C1 (de) * 1993-12-16 1995-01-26 Fraunhofer Ges Forschung Barrierefolie
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DE19845268C1 (de) * 1998-10-01 2000-01-05 Fraunhofer Ges Forschung Verfahren zum Bedampfen bandförmiger Substrate mit einer transparenten Barriereschicht aus Aluminiumoxid
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TWI293091B (en) 2001-09-26 2008-02-01 Tohcello Co Ltd Deposited film and process for producing the same

Also Published As

Publication number Publication date
DE50308370D1 (de) 2007-11-22
WO2004050945A2 (de) 2004-06-17
RU2352683C2 (ru) 2009-04-20
ECSP055797A (es) 2005-08-11
EP1565591A2 (de) 2005-08-24
EP1565591B1 (de) 2007-10-10
DE10255822A1 (de) 2004-06-17
MXPA05005113A (es) 2008-03-11
AU2003274021A1 (en) 2004-06-23
DE10255822B4 (de) 2004-10-28
CO5690658A2 (es) 2006-10-31
AU2003274021A8 (en) 2004-06-23
ATE375409T1 (de) 2007-10-15
US20060257585A1 (en) 2006-11-16
ES2290496T3 (es) 2008-02-16
US7541070B2 (en) 2009-06-02
CA2505027C (en) 2011-02-22
BR0315699B1 (pt) 2012-11-27
WO2004050945A3 (de) 2004-08-12
RU2005116674A (ru) 2007-01-10
CA2505027A1 (en) 2004-06-17
CR7821A (es) 2005-11-15

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Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 16/10/2003, MEDIANTE O RECOLHIMENTO DA TAXAQUINQUENAL DE MANUTENCAO (ARTIGOS 119 E 120 DA LPI) E OBSERVADAS AS DEMAIS CONDICOES LEGAIS.