DE60104709D1 - Zerstäubungstarget - Google Patents

Zerstäubungstarget

Info

Publication number
DE60104709D1
DE60104709D1 DE60104709T DE60104709T DE60104709D1 DE 60104709 D1 DE60104709 D1 DE 60104709D1 DE 60104709 T DE60104709 T DE 60104709T DE 60104709 T DE60104709 T DE 60104709T DE 60104709 D1 DE60104709 D1 DE 60104709D1
Authority
DE
Germany
Prior art keywords
layer
sputtering
sputtering target
plugs
building
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60104709T
Other languages
English (en)
Other versions
DE60104709T2 (de
Inventor
Bernd Hermeler
Alexander Wuropulos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cemecon AG
Original Assignee
Cemecon AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cemecon AG filed Critical Cemecon AG
Priority to DE60104709T priority Critical patent/DE60104709T2/de
Publication of DE60104709D1 publication Critical patent/DE60104709D1/de
Application granted granted Critical
Publication of DE60104709T2 publication Critical patent/DE60104709T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Insulating Materials (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Surgical Instruments (AREA)
DE60104709T 2000-08-08 2001-08-07 Zerstäubungstarget Expired - Lifetime DE60104709T2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE60104709T DE60104709T2 (de) 2000-08-08 2001-08-07 Zerstäubungstarget

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10039478A DE10039478A1 (de) 2000-08-08 2000-08-08 Zerstäubungs-Bauteil
DE10039478 2000-08-08
DE60104709T DE60104709T2 (de) 2000-08-08 2001-08-07 Zerstäubungstarget
PCT/EP2001/009119 WO2002012584A2 (en) 2000-08-08 2001-08-07 Sputtertarget

Publications (2)

Publication Number Publication Date
DE60104709D1 true DE60104709D1 (de) 2004-09-09
DE60104709T2 DE60104709T2 (de) 2005-03-10

Family

ID=7652252

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10039478A Withdrawn DE10039478A1 (de) 2000-08-08 2000-08-08 Zerstäubungs-Bauteil
DE60104709T Expired - Lifetime DE60104709T2 (de) 2000-08-08 2001-08-07 Zerstäubungstarget

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10039478A Withdrawn DE10039478A1 (de) 2000-08-08 2000-08-08 Zerstäubungs-Bauteil

Country Status (6)

Country Link
US (1) US6852201B2 (de)
EP (1) EP1325167B8 (de)
AT (1) ATE272726T1 (de)
AU (1) AU2001291747A1 (de)
DE (2) DE10039478A1 (de)
WO (1) WO2002012584A2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9051211B2 (en) * 2004-04-27 2015-06-09 Ppg Industries Ohio, Inc. Effects of methods of manufacturing sputtering targets on characteristics of coatings
DE102008005771A1 (de) 2008-01-24 2009-07-30 Wolf Beschichtungstechnologie Gmbh Zerstäubungstarget zur Herstellung von PVD-Beschichtungen aus mehreren chemischen Elementen
CN101775576A (zh) * 2009-01-12 2010-07-14 上海广电电子股份有限公司 ZnO基粉末-金属复合溅射靶材及其制备方法
US8821701B2 (en) 2010-06-02 2014-09-02 Clifton Higdon Ion beam sputter target and method of manufacture
DE102012013577A1 (de) 2012-07-10 2014-01-16 Oerlikon Trading Ag, Trübbach Hochleistungsimpulsbeschichtungsmethode
DE102012024638A1 (de) 2012-12-17 2014-06-18 Kennametal Inc. Werkzeug zur spanenden Bearbeitung von Werkstücken und Verfahren zum Beschichten von Substratkörpern
EP4219786A3 (de) 2016-02-09 2023-10-11 Wilsonart LLC Verfahren zum beschichten von edelstahlpressplatten und damit hergestellte beschichtete pressplatten
RU178867U1 (ru) * 2016-05-04 2018-04-20 Общество с ограниченной ответственностью Научно-производственное предприятие "НОК" Вакуумная микроразмерная кристаллизационная ячейка
CN106178113A (zh) * 2016-08-05 2016-12-07 北京爱康宜诚医疗器材有限公司 溅射靶、溅射仪和假体涂层方法
DE102021104255A1 (de) 2021-02-23 2022-08-25 Cemecon Ag. Zerstäubungstarget

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE465699C (de) * 1926-07-22 1928-09-21 Ernst Albers Schoenberg Dr Aus Stuecken verschiedener Metalle bestehende Kathode zur Herstellung elektrischer Widerstaende
DE2914618C2 (de) * 1979-04-11 1983-09-29 Glyco-Metall-Werke Daelen & Loos Gmbh, 6200 Wiesbaden Schichtwerkstoff mit auf einer Trägerschicht im Drahtexplosionsverfahren oder Kathodenzerstäubung (Sputtering) aufgebrachter Gleit- oder Reibschicht, Verfahren zu seiner Herstellung und Target zur Durchführung des Verfahrens
JPS5747871A (en) * 1980-09-05 1982-03-18 Hitachi Ltd Sputtering target
US4610774A (en) * 1984-11-14 1986-09-09 Hitachi, Ltd. Target for sputtering
JPS61291969A (ja) * 1985-06-18 1986-12-22 Matsushita Electric Ind Co Ltd スパツタリング用タ−ゲツト
JPS627852A (ja) 1985-07-04 1987-01-14 Toshiba Corp 薄膜形成方法
US4915810A (en) * 1988-04-25 1990-04-10 Unisys Corporation Target source for ion beam sputter deposition
JPH08158047A (ja) * 1994-11-29 1996-06-18 Toshiba Corp スパッタリング用ターゲットおよびその製法

Also Published As

Publication number Publication date
WO2002012584A3 (en) 2002-04-25
AU2001291747A1 (en) 2002-02-18
EP1325167B8 (de) 2004-09-29
US20030173216A1 (en) 2003-09-18
US6852201B2 (en) 2005-02-08
EP1325167B1 (de) 2004-08-04
ATE272726T1 (de) 2004-08-15
WO2002012584A2 (en) 2002-02-14
DE10039478A1 (de) 2002-02-28
DE60104709T2 (de) 2005-03-10
EP1325167A2 (de) 2003-07-09

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