CN102477527A - 壳体的制作方法及由该方法制得的壳体 - Google Patents

壳体的制作方法及由该方法制得的壳体 Download PDF

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CN102477527A
CN102477527A CN2010105551892A CN201010555189A CN102477527A CN 102477527 A CN102477527 A CN 102477527A CN 2010105551892 A CN2010105551892 A CN 2010105551892A CN 201010555189 A CN201010555189 A CN 201010555189A CN 102477527 A CN102477527 A CN 102477527A
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CN102477527B (zh
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张新倍
陈文荣
蒋焕梧
陈正士
张�成
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Beijing Zhongcai Wyse Education Technology Co ltd
Nantong Dongfang Science & Technology Co ltd
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Abstract

本发明提供一种壳体的制作方法，提供基体，采用磁控溅射方法在基体的表面形成色彩层，之后，在金属靶材前端设置一移动的挡板，开启靶材电源，该靶材为钛靶、铬靶或锆靶中的任一靶材，调节该挡板至靶材正前方，沉积一定时间，使靶材原子溅射到该挡板上，并当溅射到靶材原子数量和溅射速度都稳定时，移开挡板，使靶材原子溅射到基体上，继续溅射一段时间后，关闭靶材电源，使图案层于色彩层表面的沉积停留于形核阶段，以在该色彩层上形成图案层。由上述方法所制得的壳体，该壳体包括一基体、一色彩层、一图案层，所述色彩层形成于基体的表面，所述图案层形成于色彩层的表面，所述图案层为Ti、Cr或Zr膜层。

Description

壳体的制作方法及由该方法制得的壳体
技术领域
本发明涉及一种壳体的制作方法及由该方法制得的壳体。
背景技术
随着科技的不断进步，手机及计算机等各式电子装置也迅速发展，其功能亦愈来愈丰富。为了使电子装置的外观图案设计更加丰富多彩，传统上可通过移印、印刷或激光雕刻等方式在壳体表面形成图案，或藉由喷漆方式在电子装置的壳体表面形成图案层，使其呈现良好的外观。
磁控溅射技术因其环保、制备的薄膜的外观极具金属质感等特点，在装饰性镀膜领域的应用越来越广。目前，以磁控溅射技术在电子装置的壳体上形成图案层的做法通常是先于壳体上磁控溅射一颜色层，然后激光雕刻该颜色层形成所要的图案或纹路。但是，此种方法在形成微小点状的不规则图案和纹路时，加工的效果不好，且整体上加工效率不高，严重制约了产量的提升，限制了在电子装置壳体装饰领域的竞争力。
发明内容
鉴于此，有必要提供一种具有星芒状图案的壳体制作方法。
另外，还有必要提供一种由上述方法所制得的壳体。
一种壳体的制造方法，包括以下步骤：
提供基体；
采用磁控溅射方法在基体的表面形成色彩层；
在该色彩层上继续以磁控溅射方法形成图案层，在金属靶材前端设置一移动的挡板，开启靶材电源，该靶材为钛靶、铬靶或锆靶中的任一靶材，加热基体至500～800℃，调节该挡板至靶材正前方，沉积1～3分钟，使靶材原子溅射到该挡板上，并使溅射的靶材原子数量和溅射速度稳定，移开挡板，继续溅射1～5分钟后关闭靶材电源，使图案层于色彩层表面的沉积停留于形核阶段。
一种由上述方法制得的壳体，该壳体包括一基体、一色彩层、一图案层，所述色彩层形成于基体的表面，所述图案层形成于色彩层的表面，所述图案层为Ti、Cr或Zr膜层。
本发明壳体的制作方法在形成图案层时，通过镀膜参数的控制基体使所述图案层于色彩层表面的沉积停留于形核阶段，在高温作用下，形成图案层的靶材原子持续向形核中心扩散使核心不断长大，产生一种星芒的装饰效果基体，丰富了磁控溅射层的表面装饰效果，提高了产品的外观竞争力。
附图说明
图1是本发明较佳实施例的壳体的剖视示意图。
图2是本发明较佳实施例制作所述壳体的流程图。
主要元件符号说明
  壳体   10
  基体   11
  色彩层   13
  图案层   15
  防护层   17
具体实施方式
请参阅图1及图2，本发明一较佳实施方式的壳体10的制作方法包括如下步骤：
提供一基体11，该基体11可以为玻璃、陶瓷或者不锈钢。
对基体11进行表面清洗，以除去基体11表面的杂质和油污等，清洗完毕后烘干备用。所述清洗包括将基体11放入盛装有乙醇或丙酮溶液的超声波清洗器中进行震动清洗。
将清洗后的基体11固定于一磁控溅射镀膜机(图未示)的转架上，并对该磁控溅射镀膜机的真空室进行抽真空，使该真空室内的压强为3×10-8Pa，之后，通入流量为100～400sccm(标准状态毫升/分钟)的氩气(工作气体)；并使该腔体的温度保持在100～200℃左右，以氮气为反应气体，设定氮气流量为2～4sccm；在本实施例中使用的靶材可为钛靶、也可为铬靶或锆靶等制备颜色膜层常用的靶材。本发明优选的实施例中使用Ti靶，设定钛靶电源功率为4～9kw，对基体11施加-100～-300V的偏压，占空比为30～70％，并设置转架的公转转速为3转每分钟(revolution per minute，rpm)，于基体11表面磁控溅射色彩层13。磁控溅射色彩层13的时间为10～40分钟。
请再一次参阅图1，在色彩层13上再形成一图案层15，制备该图案层15的步骤为：在所述磁控溅射镀膜机中的真空室内设置一可移动的挡板，并调节该挡板至靶材正前方(挡板的移动可通过镀膜机控制系统操作)。在本发明中形成图案层15使用的靶材可为钛靶，也可为铬靶或锆靶等靶材。形成的图案层15为Ti、Cr、或Zr膜层。开启靶材，设定靶材功率为4～9kw，对基体11施加-100～-300V的偏压，占空比30～70％，Ar气流量100～400sccm，加热基体至500～800℃，开设溅镀。因为挡板的遮挡作用，此时不会在基体11上镀膜。1～3分钟之后，当从靶材溅射出来的离子，其数量和速度都较为稳定时，迅速移开靶前的挡板，此时，靶材所溅射的原子开始在基体11上高速沉积，再经过1～5分钟后关闭靶电源，使使靶材原子于色彩层13上的沉积生长停留在形核阶段，核心不断的生长并与相邻的核心接触从而形成连续的星芒状图层，此时在上述高温作用下，基体11表面的靶材原子具有较高的能量，仍会持续向形核中心扩散，使核心不断长大。1～10分钟后停止加热，待基体冷却后，充入空气结束镀膜。
上述制备方法中形成星芒图案的原理为，在离子沉积过程包括了原子的吸附、表面扩散、凝结以及形核生长过程。经溅射到基体11表面的气相原子都带有一定的能量，到达基体11后会与其表面原子进行能量交换，使基体11表面自由能降低，从而变得稳定，由此完成吸附过程。溅射到基体11表面的气相原子被吸附后失去了在表面法向方向的动能，只具有平行表面方向的动能，依靠这种动能，被吸附原子在表面做扩散运动，此过程中被吸附的原子相互碰撞而凝结，当原子团的原子数超过某一临界值便形成稳定原子团，可以捕获其它吸附原子和入射原子，并形成核，核心不断的生长并与相邻的核心接触从而形成连续的星芒状图层。通过上述的沉积步骤和方法可以在基体11上形成不规则点状，类似于夜晚中点点繁星的外观图案效果，使得采用上述方法所形成的图案层15具有类似星芒状外观。
形成所述图案层15后，继续以磁控溅射的方法在此图案层15上制备一层透明的防护层17，以提高图案层15耐磨、耐腐蚀性能。具体的制备方法为：待基体11温度下降，抽真空该镀膜机的腔体至3×10-8Pa，通入流量为100～400sccm(标准状态毫升/分钟)的氩气；并使该腔体的温度保持在100～200℃左右，以氧气为反应气体，设定氧气流量为200～150sccm；本发明中可用Ti靶、Al靶或Zr靶，形成所述防护层17可以是Ti-O层，Al-O层或Zr-O层。本发明优选的实施例中使用Ti靶，设定钛靶电源功率为5～12kw，对基体11施加-100～-300V的偏压，占空比为30～70％，温度100～200℃，并设置转架的公转转速为3转每分钟(revolution per minute，rpm)，溅射形成该防护层17的时间为5～30分钟。
请再一次参阅图1，由上述方法所制得的壳体10，该壳体10包括一基体11、一色彩层13、一图案层15及一防护层17，所述色彩层13形成于基体11的表面，所述图案层15形成于色彩层13的表面，所述防护层17形成于图案层15的表面，所述色彩层13可为Ti-N层、Cr-N层或Zr-N层，所述图案层15可为Ti层、Cr层或Zr层，所述的防护层17可以是Al-O层、Si-O层或Zr-O层。
基体11可以为玻璃、陶瓷或者不锈钢。
应该指出，上述实施方式仅为本发明的较佳实施方式，本领域技术人员还可在本发明精神内做其它变化。这些依据本发明精神所做的变化，都应包含在本发明所要求保护的范围之内。

Claims (9)

1.一种壳体的制作方法，其包括如下步骤：
提供基体；
采用磁控溅射方法在基体的表面形成色彩层；
在该色彩层上以磁控溅射方法形成图案层，形成所述图案层的主要步骤参数为：在金属靶材前端设置一移动的挡板，该靶材为钛靶、铬靶或锆靶中的任一靶材；开启靶材电源，加热基体至500～800℃，调节该挡板至靶材正前方，沉积1～3分钟，使靶材原子溅射到该挡板上；待溅射的靶材原子数量和溅射速度稳定后，移开挡板，靶材原子溅射至基体的色彩层上约1～5分钟后关闭靶材电源，使靶材原子于色彩层表面的沉积停留于形核阶段以形成所述图案层。
2.如权利要求1所述的壳体的制作方法，其特征在于：磁控溅射形成所述图案层的工艺参数具体为：靶材功率为4～9kw，对基材施加偏压为-100～-300V，占空比为30～70％。
3.如权利要求1所述的壳体的制作方法，其特征在于：所述图案层为Ti、Cr或Zr膜层。
4.如权利要求1所述的壳体的制作方法，其特征在于：磁控溅射形成色彩层的工艺参数为：靶材为钛靶、铬靶或锆靶中的任一靶材，以氩气为工作气体，镀膜腔体的温度保持在100-200℃，钛靶的功率为4～9kw，形成色彩层的膜层为Ti-N层、Cr-N层或Zr-N层。
5.如权利要求1所述的壳体的制作方法，其特征在于：所述方法还包括在所述图案层上磁控溅射防护层的步骤，该防护层为Al-O层、Si-O层或Zr-O层。
6.如权利要求1所述的壳体的制作方法，其特征在于：磁控溅射所述防护层的工艺参数为：以氧气为反应气体，设定氧气流量为200～150s ccm，溅射形成该防护层的时间为5～30分钟，靶材电源功率为5～12kw，对基体施加-100～-300V的偏压，占空比为30～70％，镀膜时间5～30分钟。
7.如权利要求6所述的壳体的制作方法，其特征在于：所述形成保护层的靶材为钛靶、铝靶或锆靶。
8.如权利要求1所述的壳体的制作方法，其特征在于：所述基体为玻璃、陶瓷或不锈钢。
9.一种由权利要求1-8中的任一项所述的方法制得的壳体。
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109334333A (zh) * 2018-11-30 2019-02-15 维沃移动通信有限公司 壳体的制备方法、壳体以及终端设备
CN109561177A (zh) * 2018-11-19 2019-04-02 潮州三环（集团）股份有限公司 一种便携式电子设备盖板及其制备方法
CN111630202A (zh) * 2018-01-23 2020-09-04 株式会社Selcos 非导电性金属色彩半透明膜及其制备方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10202679B2 (en) * 2013-03-08 2019-02-12 Vapor Technologies Coated article having a vivid color
CN110499495A (zh) * 2019-09-05 2019-11-26 西安交通大学 一种以Zr为基底的Cr-Me多层膜及其制备方法

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4745035A (en) * 1985-11-04 1988-05-17 Asulab S.A. Article having a wear resisting precious metal coating
US4997538A (en) * 1988-06-24 1991-03-05 Asulab S.A. Process for depositing a black-colored coating on a substrate and a black-colored coating obtained using this process
US5948548A (en) * 1997-04-30 1999-09-07 Masco Corporation Coated article
US6468908B1 (en) * 2001-07-09 2002-10-22 Taiwan Semiconductor Manufacturing Company Al-Cu alloy sputtering method with post-metal quench
CN1664988A (zh) * 2005-04-19 2005-09-07 中国科学院物理研究所 一种在铝酸镁衬底上制备高质量ZnO单晶薄膜的方法
CN1688739A (zh) * 2002-08-08 2005-10-26 埃西勒国际通用光学公司 制造稳定的掺氟氧化硅薄层的方法、制成的薄层及其在眼科光学中的应用
US7026057B2 (en) * 2002-01-23 2006-04-11 Moen Incorporated Corrosion and abrasion resistant decorative coating
CN1789495A (zh) * 2005-12-14 2006-06-21 中国科学院物理研究所 用于制备高质量氧化锌薄膜的蓝宝石衬底原位处理方法
CN1936068A (zh) * 2005-08-01 2007-03-28 蒸汽技术公司 具有图案化的装饰性涂层的制品
CN101321898A (zh) * 2005-12-02 2008-12-10 卢森特技术有限公司 按需生产晶态结构
CN101503820A (zh) * 2008-02-06 2009-08-12 通用电气公司 用于制造半导体晶圆的方法和设备

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4745035A (en) * 1985-11-04 1988-05-17 Asulab S.A. Article having a wear resisting precious metal coating
US4997538A (en) * 1988-06-24 1991-03-05 Asulab S.A. Process for depositing a black-colored coating on a substrate and a black-colored coating obtained using this process
US5948548A (en) * 1997-04-30 1999-09-07 Masco Corporation Coated article
US6468908B1 (en) * 2001-07-09 2002-10-22 Taiwan Semiconductor Manufacturing Company Al-Cu alloy sputtering method with post-metal quench
US7026057B2 (en) * 2002-01-23 2006-04-11 Moen Incorporated Corrosion and abrasion resistant decorative coating
CN1688739A (zh) * 2002-08-08 2005-10-26 埃西勒国际通用光学公司 制造稳定的掺氟氧化硅薄层的方法、制成的薄层及其在眼科光学中的应用
CN1664988A (zh) * 2005-04-19 2005-09-07 中国科学院物理研究所 一种在铝酸镁衬底上制备高质量ZnO单晶薄膜的方法
CN1936068A (zh) * 2005-08-01 2007-03-28 蒸汽技术公司 具有图案化的装饰性涂层的制品
CN101321898A (zh) * 2005-12-02 2008-12-10 卢森特技术有限公司 按需生产晶态结构
CN1789495A (zh) * 2005-12-14 2006-06-21 中国科学院物理研究所 用于制备高质量氧化锌薄膜的蓝宝石衬底原位处理方法
CN101503820A (zh) * 2008-02-06 2009-08-12 通用电气公司 用于制造半导体晶圆的方法和设备

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111630202A (zh) * 2018-01-23 2020-09-04 株式会社Selcos 非导电性金属色彩半透明膜及其制备方法
CN111630202B (zh) * 2018-01-23 2022-10-11 株式会社Selcos 非导电性金属色彩半透明膜及其制备方法
CN109561177A (zh) * 2018-11-19 2019-04-02 潮州三环（集团）股份有限公司 一种便携式电子设备盖板及其制备方法
CN109334333A (zh) * 2018-11-30 2019-02-15 维沃移动通信有限公司 壳体的制备方法、壳体以及终端设备

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