BR0311729A - Fotoiniciadores difuncionais - Google Patents

Fotoiniciadores difuncionais

Info

Publication number
BR0311729A
BR0311729A BR0311729-4A BR0311729A BR0311729A BR 0311729 A BR0311729 A BR 0311729A BR 0311729 A BR0311729 A BR 0311729A BR 0311729 A BR0311729 A BR 0311729A
Authority
BR
Brazil
Prior art keywords
photoinitiators
optionally
formula
diffunctional
photoinitiator
Prior art date
Application number
BR0311729-4A
Other languages
English (en)
Inventor
Rinaldo Huesler
Andre Fuchs
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR0311729A publication Critical patent/BR0311729A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/46—Friedel-Crafts reactions
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/63—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of halogen; by substitution of halogen atoms by other halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/64—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of functional groups containing oxygen only in singly bound form
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
    • C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/909—Solventless ink

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

"FOTOINICIADORES DIFUNCIONAIS". A presente invenção refere-se a novos fotoiniciadores da fórmula I: em que: A é -O-, -CH~ 2~, -CH(CH~ 3~)- ou -C(CH~ 3~)~ 2~- e R é metila ou trimetil-silila e R pode, além disso, ser hidrogênio quando A é simultaneamente o grupo -C(CH~ 3~)~ 2~-. A invenção também se refere a composições compreendendo: (A) pelo menos um composto etilenicamente insaturado, (B) um fotoiniciador da fórmula I, (C) opcionalmente outros aglutinantes ou aditivos, (D) opcionalmente outros fotoiniciadores ou co-iniciadores. A composição compreendendo: (A) um composto etilenicamente insaturado que contém pelo menos um aminoacrilato, (B) um fotoiniciador da fórmula II ou III: (C) opcionalmente outros aglutinantes ou aditivos, (D) opcionalmente outros fotoiniciadores ou co-iniciadores.
BR0311729-4A 2002-07-19 2003-07-10 Fotoiniciadores difuncionais BR0311729A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02405632 2002-07-19
PCT/EP2003/007482 WO2004009651A1 (en) 2002-07-19 2003-07-10 New difunctional photoinitiators

Publications (1)

Publication Number Publication Date
BR0311729A true BR0311729A (pt) 2005-03-01

Family

ID=30470348

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0311729-4A BR0311729A (pt) 2002-07-19 2003-07-10 Fotoiniciadores difuncionais

Country Status (13)

Country Link
US (1) US7723397B2 (pt)
EP (1) EP1523506B1 (pt)
JP (1) JP4461013B2 (pt)
KR (1) KR20050029228A (pt)
CN (1) CN100523007C (pt)
AU (1) AU2003246675A1 (pt)
BR (1) BR0311729A (pt)
CA (1) CA2486784A1 (pt)
ES (1) ES2394202T3 (pt)
MX (1) MXPA04012672A (pt)
NZ (1) NZ537094A (pt)
TW (1) TWI308154B (pt)
WO (1) WO2004009651A1 (pt)

Families Citing this family (40)

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TWI312786B (en) 2001-11-08 2009-08-01 Ciba Sc Holding Ag Novel difunctional photoinitiators
RU2348652C2 (ru) * 2003-05-06 2009-03-10 Циба Спешиалти Кемикэлз Холдинг Инк. Новые трифункциональные фотоинициаторы
ITVA20030040A1 (it) * 2003-10-27 2005-04-28 Lamberti Spa Fotoiniziatore solido bianco in polvere e procedimento per la sua preparazione.
JP5659447B2 (ja) * 2004-08-30 2015-01-28 コニカミノルタ株式会社 インクジェット用インク組成物及び画像形成方法
JP4967310B2 (ja) * 2004-10-29 2012-07-04 Ｄｉｃ株式会社 活性エネルギー線硬化型インクジェット記録用インク
CA2585631A1 (en) 2004-10-29 2006-05-04 Dainippon Ink And Chemicals, Inc. Active energy ray-curable inkjet recording ink
ITVA20050032A1 (it) * 2005-05-13 2006-11-14 Lamberti Spa Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
JP5204371B2 (ja) * 2005-06-06 2013-06-05 富士フイルム株式会社 インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法
EP1967557B1 (en) * 2005-11-11 2012-02-29 Toyo Ink Mfg. Co., Ltd. Active energy beam-curable inkjet ink
JP4678399B2 (ja) * 2006-12-01 2011-04-27 Ｊｓｒ株式会社 反射防止膜
JP4601009B2 (ja) * 2007-03-30 2010-12-22 富士フイルム株式会社 インクジェット記録用インクセット及びインクジェット記録方法
ES2390609T3 (es) * 2007-10-24 2012-11-14 Agfa Graphics N.V. Líquidos y tintas curables para aplicaciones a juguetes y embalajes de alimentos
CA2808535C (en) 2010-08-20 2017-10-03 Case Western Reserve University Continuous digital light processing additive manufacturing of implants
WO2014085809A1 (en) * 2012-11-30 2014-06-05 Dean H David Absorbant and reflecting biocompatible dyes for highly accurate medical implants
WO2012062333A1 (en) 2010-11-12 2012-05-18 Coloplast A/S Novel polymeric photoinitiators
CN103601629B (zh) * 2010-11-12 2015-08-26 深圳市有为化学技术有限公司 对位或间位官能团化芳香酮类化合物、其制备方法及其光聚合引发剂
CN102417553B (zh) * 2011-09-29 2013-04-10 长沙新宇高分子科技有限公司 能降低直至消除voc排放的羟烷基芳基酮光引发剂
JP5939033B2 (ja) * 2011-10-25 2016-06-22 東洋インキＳｃホールディングス株式会社 活性エネルギー線硬化型インクジェットインキ組成物
CN102504054B (zh) * 2011-11-01 2014-07-02 长沙新宇高分子科技有限公司 降低直至消除voc排放的多官能团羟基酮光引发剂
US9353211B2 (en) 2012-05-16 2016-05-31 Coloplast A/S Polymeric photoinitiators and photoinitiator monomers
ES2683976T3 (es) * 2012-10-19 2018-10-01 Igm Group B.V. Fotoiniciadores híbridos
JP6279603B2 (ja) * 2012-12-05 2018-02-14 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェンＨｅｎｋｅｌ ＡＧ ＆ Ｃｏ． ＫＧａＡ シリコーン相溶性光開始剤
GB2512603A (en) * 2013-04-03 2014-10-08 Brannardi Composites Ltd Printed composite sheet
JP5955275B2 (ja) * 2013-06-12 2016-07-20 富士フイルム株式会社 画像形成方法、加飾シートの製造方法、成形加工方法、加飾シート成形物の製造方法、インモールド成形品の製造方法
JP6123529B2 (ja) * 2013-07-05 2017-05-10 株式会社リコー 光重合性インクジェットインク、インクカートリッジ、及びインクジェット記録装置
JP2015061897A (ja) * 2013-08-23 2015-04-02 Ｄｉｃグラフィックス株式会社 紫外線硬化型コーティングニス組成物の印刷方法
CN103541242A (zh) * 2013-10-23 2014-01-29 合肥聚合辐化技术有限公司 一种低收缩率光亮印花粘合剂及其制备方法
WO2015140541A1 (en) * 2014-03-20 2015-09-24 Fujifilm Speciality Ink Systems Limited Printing ink
WO2016014504A1 (en) * 2014-07-23 2016-01-28 E. I. Du Pont De Nemours And Company Uv-curable dielectric inks for a hydrofluoric acid mask on glass substrates
ES2805524T3 (es) 2014-08-29 2021-02-12 Henkel Ag & Co Kgaa Fotoiniciador modificado con organosilicio y composición adhesiva fotocurable del mismo
US10113075B2 (en) 2014-09-04 2018-10-30 Igm Malta Limited Polycyclic photoinitiators
US9988539B2 (en) * 2015-11-12 2018-06-05 Ricoh Company, Ltd. Active-energy-ray-curable composition, active-energy-ray-curable ink, composition stored container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured material, and structure
LT3263666T (lt) * 2016-06-27 2018-09-25 Evonik Degussa Gmbh Pralaidumą slopinanti atskyrimo danga
CN110049876B (zh) * 2016-12-09 2021-06-15 锡克拜控股有限公司 低能量固化性平版印刷墨兼凸版印刷墨及印刷方法
HUE053316T2 (hu) * 2016-12-09 2021-06-28 Sicpa Holding Sa Alacsony energiával kikeményedõ ofszet és magasnyomású nyomdafestékek és nyomtatási folyamat
CN108101763A (zh) * 2017-12-23 2018-06-01 怀化金鑫新材料有限公司 光引发剂双[4’-(2,2-二烷氧基乙酰)苯基]甲烷及其合成方法
CN108047359A (zh) * 2017-12-23 2018-05-18 怀化金鑫新材料有限公司 光引发剂4,4’-二(2,2-二烷氧基乙酰)联苯及其合成方法
JP2020019840A (ja) * 2018-07-30 2020-02-06 株式会社リコー 組成物、硬化物、収容容器、像形成装置、及び像形成方法
CN111138260B (zh) * 2019-12-31 2022-10-14 天津久日新材料股份有限公司 一种α-羟基酮双官能团光引发剂的制备方法
CN116376352B (zh) * 2023-04-28 2023-10-24 常州市正文印刷有限公司 一种uv油墨及其印刷工艺

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TWI312786B (en) 2001-11-08 2009-08-01 Ciba Sc Holding Ag Novel difunctional photoinitiators

Also Published As

Publication number Publication date
CA2486784A1 (en) 2004-01-29
EP1523506A1 (en) 2005-04-20
WO2004009651A1 (en) 2004-01-29
TW200403260A (en) 2004-03-01
US20050239971A1 (en) 2005-10-27
KR20050029228A (ko) 2005-03-24
MXPA04012672A (es) 2005-03-23
JP4461013B2 (ja) 2010-05-12
US7723397B2 (en) 2010-05-25
CN1668648A (zh) 2005-09-14
CN100523007C (zh) 2009-08-05
JP2005533156A (ja) 2005-11-04
NZ537094A (en) 2006-09-29
AU2003246675A1 (en) 2004-02-09
TWI308154B (en) 2009-04-01
EP1523506B1 (en) 2012-09-12
ES2394202T3 (es) 2013-01-23

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]