BE876629A - Procede de depot de materiau vitreux sous plasma a haute frequance - Google Patents

Procede de depot de materiau vitreux sous plasma a haute frequance

Info

Publication number
BE876629A
BE876629A BE2/57830A BE2057830A BE876629A BE 876629 A BE876629 A BE 876629A BE 2/57830 A BE2/57830 A BE 2/57830A BE 2057830 A BE2057830 A BE 2057830A BE 876629 A BE876629 A BE 876629A
Authority
BE
Belgium
Prior art keywords
high frequency
frequency plasma
deposit process
vitreous deposit
vitreous
Prior art date
Application number
BE2/57830A
Other languages
English (en)
Inventor
H F Sterling
M P Brake
Original Assignee
Int Standard Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Int Standard Electric Corp filed Critical Int Standard Electric Corp
Publication of BE876629A publication Critical patent/BE876629A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815—Reactant deposition burners or deposition heating means
    • C03B37/01823—Plasma deposition burners or heating means
    • C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
BE2/57830A 1978-05-30 1979-05-30 Procede de depot de materiau vitreux sous plasma a haute frequance BE876629A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB24187/78A GB1603949A (en) 1978-05-30 1978-05-30 Plasma deposit

Publications (1)

Publication Number Publication Date
BE876629A true BE876629A (fr) 1979-11-30

Family

ID=10207778

Family Applications (1)

Application Number Title Priority Date Filing Date
BE2/57830A BE876629A (fr) 1978-05-30 1979-05-30 Procede de depot de materiau vitreux sous plasma a haute frequance

Country Status (10)

Country Link
US (1) US4349373A (fr)
EP (1) EP0005963B1 (fr)
JP (1) JPS54156828A (fr)
AR (1) AR222334A1 (fr)
AU (1) AU526306B2 (fr)
BE (1) BE876629A (fr)
DE (1) DE2965131D1 (fr)
ES (1) ES481010A1 (fr)
FR (1) FR2427310B1 (fr)
GB (1) GB1603949A (fr)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3010314C2 (de) * 1980-03-18 1982-01-07 Beerwald, Hans, Dr.Rer.Nat., 5370 Kall Verfahren zur innenbeschichtung von elektrisch nicht leitfähigen Rohren mittels Gasentladungen
US4280829A (en) * 1980-05-12 1981-07-28 Corning Glass Works Apparatus for controlling internal pressure of a bait tube
NL8102149A (nl) * 1981-05-01 1982-12-01 Philips Nv Werkwijze en inrichting voor de inwendige bedekking van een buis door reactieve afscheiding uit een gasmengsel onder invloed van een plasma.
DE3204846A1 (de) * 1982-02-11 1983-08-18 Schott Glaswerke, 6500 Mainz Plasmaverfahren zur innenbeschichtung von glasrohren
DE3206175A1 (de) * 1982-02-20 1983-08-25 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung einer vorform, aus der optische fasern ziehbar sind
DE3206177A1 (de) * 1982-02-20 1983-08-25 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung einer vorform, aus der optische fasern ziehbar sind
IT1155119B (it) * 1982-03-05 1987-01-21 Cselt Centro Studi Lab Telecom Procedimento e dispositivo per la produzione di preforme per fibre ottiche
US4440556A (en) * 1982-06-23 1984-04-03 International Telephone And Telegraph Corporation Optical fiber drawing using plasma torch
NL8302127A (nl) * 1983-06-15 1985-01-02 Philips Nv Werkwijze en inrichting voor de vervaardiging van optische vezels.
DE3330910A1 (de) * 1983-08-27 1985-03-07 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zum herstellen eines reaktionsgefaesses fuer kristallzuchtzwecke
US4718929A (en) * 1983-10-21 1988-01-12 Corning Glass Works Vapor phase method for making metal halide glasses
US4557742A (en) * 1984-07-02 1985-12-10 Polaroid Corporation Polarized optical fiber and method of forming same
GB2162168B (en) * 1984-07-25 1988-06-29 Stc Plc Optical fibre manufacture
US4597787A (en) * 1984-11-13 1986-07-01 Ispra Fibroptics Industries Herzlia Ltd. Manufacture of optical fibre preforms
FR2584101B1 (fr) * 1985-06-26 1987-08-07 Comp Generale Electricite Dispositif pour fabriquer un composant optique a gradient d'indice de refraction
US5188648A (en) * 1985-07-20 1993-02-23 U.S. Philips Corp. Method of manufacturing optical fibres
JPH01183432A (ja) * 1988-01-18 1989-07-21 Sumitomo Electric Ind Ltd 石英ガラス管の加熱方法
DE3830089A1 (de) * 1988-09-03 1990-03-15 Schott Glaswerke Verfahren zur herstellung von planaren, mit dielektrischen schichtsystemen versehenen glassubstraten
DE3830364C1 (fr) * 1988-09-07 1990-01-18 Schott Glaswerke, 6500 Mainz, De
DE19959845B4 (de) * 1998-12-10 2012-11-29 Stefan Laure Plasmagenerator
JP2004535595A (ja) * 2001-04-12 2004-11-25 オムニガイド コミュニケーションズ インコーポレイテッド 高屈折率コントラストの光導波路および用途
ES2208530T3 (es) * 2001-04-27 2004-06-16 European Community Metodo y aparato para el tratamiento secuencial por plasma.
CA2504951A1 (fr) * 2002-11-22 2004-06-10 Omniguide Communications Inc. Guide d'ondes dielectrique et son procede de production
US7793612B2 (en) 2003-08-01 2010-09-14 Silica Tech, Llc Ring plasma jet method and apparatus for making an optical fiber preform
US20050022561A1 (en) * 2003-08-01 2005-02-03 Guskov Michael I. Ring plasma jet method and apparatus for making an optical fiber preform
KR20060098740A (ko) * 2005-03-07 2006-09-19 삼성전자주식회사 플라즈마 장치와 그를 이용한 광섬유 모재 제작 장치
US8252387B2 (en) * 2007-12-10 2012-08-28 Ofs Fitel, Llc Method of fabricating optical fiber using an isothermal, low pressure plasma deposition technique
US9002162B2 (en) * 2013-03-15 2015-04-07 Ofs Fitel, Llc Large core multimode optical fibers
NL2011077C2 (en) * 2013-07-01 2015-01-05 Draka Comteq Bv A method for manufacturing a precursor for a primary preform for optical fibres by means of an internal plasma chemical vapour deposition (pcvd) process.
US11554978B2 (en) * 2013-11-27 2023-01-17 Corning Incorporated Method for reducing processing time for optical fiber preforms
US20160023939A1 (en) * 2014-07-24 2016-01-28 Ofs Fitel, Llc Isothermal plasma cvd system for reduced taper in optical fiber preforms
WO2016100255A1 (fr) 2014-12-16 2016-06-23 Corning Incorporated Procédé de fabrication d'une préforme de fibre optique et manche destiné à être utilisé dans la fabrication de préforme de fibre optique

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1104935A (en) * 1964-05-08 1968-03-06 Standard Telephones Cables Ltd Improvements in or relating to a method of forming a layer of an inorganic compound
US3655438A (en) * 1969-10-20 1972-04-11 Int Standard Electric Corp Method of forming silicon oxide coatings in an electric discharge
GB1427327A (en) * 1972-06-08 1976-03-10 Standard Telephones Cables Ltd Glass optical fibres
US4145456A (en) * 1974-09-14 1979-03-20 Dieter Kuppers Method of producing internally coated glass tubes for the drawing of fibre optic light conductors
DE2444100C3 (de) * 1974-09-14 1979-04-12 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur Herstellung von innenbeschichteten Glasrohren zum Ziehen von Lichtleitfasern
GB1578826A (en) * 1976-03-25 1980-11-12 Western Electric Co Methods for fabricating optical fibre preforms
DE2642949C3 (de) * 1976-09-24 1980-11-20 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur Herstellung von innenbeschichteten Glasrohren zum Ziehen von Lichtleitfasern
US4125389A (en) * 1977-02-10 1978-11-14 Northern Telecom Limited Method for manufacturing an optical fibre with plasma activated deposition in a tube
CA1080562A (fr) * 1977-02-10 1980-07-01 Frederick D. King Methode et appareil de fabrication de fibres optiques par depot active par plasma dans un tube
US4262035A (en) * 1980-03-07 1981-04-14 Bell Telephone Laboratories, Incorporated Modified chemical vapor deposition of an optical fiber using an rf plasma

Also Published As

Publication number Publication date
EP0005963A1 (fr) 1979-12-12
AR222334A1 (es) 1981-05-15
US4349373A (en) 1982-09-14
JPS54156828A (en) 1979-12-11
DE2965131D1 (en) 1983-05-11
AU4732079A (en) 1979-12-06
EP0005963B1 (fr) 1983-04-06
FR2427310A1 (fr) 1979-12-28
ES481010A1 (es) 1980-02-01
GB1603949A (en) 1981-12-02
AU526306B2 (en) 1983-01-06
FR2427310B1 (fr) 1985-06-28

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: INTERNATIONAL STANDARD ELECTRIC CORP.

Effective date: 19860531