BE871109A - Disposition de lentilles en optique electronique pour focalisation variable d'un faisceau d'electrons - Google Patents

Disposition de lentilles en optique electronique pour focalisation variable d'un faisceau d'electrons

Info

Publication number
BE871109A
BE871109A BE78190995A BE190995A BE871109A BE 871109 A BE871109 A BE 871109A BE 78190995 A BE78190995 A BE 78190995A BE 190995 A BE190995 A BE 190995A BE 871109 A BE871109 A BE 871109A
Authority
BE
Belgium
Prior art keywords
arrangement
electron beam
optical lenses
electronic optical
variable focusing
Prior art date
Application number
BE78190995A
Other languages
English (en)
French (fr)
Original Assignee
Hell Rudolf Dr Ing Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hell Rudolf Dr Ing Gmbh filed Critical Hell Rudolf Dr Ing Gmbh
Publication of BE871109A publication Critical patent/BE871109A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/14—Arrangements for focusing or reflecting ray or beam
    • H01J3/20—Magnetic lenses
    • H01J3/22—Magnetic lenses using electromagnetic means only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
BE78190995A 1977-11-25 1978-10-09 Disposition de lentilles en optique electronique pour focalisation variable d'un faisceau d'electrons BE871109A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2752598A DE2752598C3 (de) 1977-11-25 1977-11-25 Verfahren zum Betrieb einer elektromagnetischen fokussierenden elektronen-optischen Linsenanordnung und Linsenanordnung hierfür

Publications (1)

Publication Number Publication Date
BE871109A true BE871109A (fr) 1979-02-01

Family

ID=6024590

Family Applications (1)

Application Number Title Priority Date Filing Date
BE78190995A BE871109A (fr) 1977-11-25 1978-10-09 Disposition de lentilles en optique electronique pour focalisation variable d'un faisceau d'electrons

Country Status (9)

Country Link
US (1) US4245159A (xx)
JP (1) JPS5476058A (xx)
BE (1) BE871109A (xx)
CA (1) CA1100564A (xx)
CH (1) CH635464A5 (xx)
DE (1) DE2752598C3 (xx)
FR (1) FR2410356A1 (xx)
GB (1) GB2012476B (xx)
NL (1) NL182996C (xx)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5512576U (xx) * 1978-07-12 1980-01-26
DE2947444C2 (de) * 1979-11-24 1983-12-08 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Elektronenstrahl-Gravierverfahren
DE3037230C2 (de) * 1980-10-02 1988-06-16 Institut für Kerntechnik und Energiewandlung e.V., 7000 Stuttgart Elektronenoptik für eine Elektronenstrahlschweißmaschine
JPS5780646A (en) * 1980-11-06 1982-05-20 Jeol Ltd Electron lens
WO1982001787A1 (en) * 1980-11-22 1982-05-27 Grieger Dieter Method for engraving by means of an electron beam
ATE24985T1 (de) * 1981-10-10 1987-01-15 Hell Rudolf Dr Ing Gmbh Elektronenstrahl-gravierverfahren und einrichtung zu seiner durchfuehrung.
US4395691A (en) * 1982-03-04 1983-07-26 Hughes Aircraft Company Beam deflection system
EP0255542A1 (en) * 1986-02-03 1988-02-10 CREWE, Albert V. Electron beam memory system with ultra-compact, high current density electron gun
US4764818A (en) * 1986-02-03 1988-08-16 Electron Beam Memories Electron beam memory system with improved high rate digital beam pulsing system
NL8601511A (nl) * 1986-06-11 1988-01-04 Philips Nv Kathodestraalbuis met magnetische focusseerlens.
NL8601512A (nl) * 1986-06-11 1988-01-04 Philips Nv Kathodestraalbuis met magnetische focusseerlens.
US4760567A (en) * 1986-08-11 1988-07-26 Electron Beam Memories Electron beam memory system with ultra-compact, high current density electron gun
JPS6369463U (xx) * 1986-10-24 1988-05-10
FR2644930B1 (fr) * 1989-03-21 1996-04-26 Cameca Lentille electromagnetique composite a focale variable
FR2683386B1 (fr) * 1991-11-05 1993-12-31 Thomson Tubes Displays Sa Dispositif de focalisation magnetique pour tube a rayons cathodiques.
US5489826A (en) * 1994-08-08 1996-02-06 Thomson Consumer Electronics, Inc. Focus coil current generator for a cathode ray tube
JPH08138602A (ja) * 1994-11-08 1996-05-31 Hitachi Ltd 電子線装置
US6180947B1 (en) * 1998-08-07 2001-01-30 Nikon Corporation Multi-element deflection aberration correction for electron beam lithography
US6201251B1 (en) 1998-08-28 2001-03-13 Nikon Corporation Compensation of space charge in a particle beam system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB515947A (en) * 1938-06-14 1939-12-19 Baird Television Ltd Improvements in or relating to cathode ray tube arrangements
US2664521A (en) * 1951-11-07 1953-12-29 Motorola Inc Deflection circuits
BE563662A (xx) * 1957-01-03
NL268860A (xx) * 1959-04-17
NL285301A (xx) * 1961-11-15
NL145716B (nl) * 1964-06-06 1975-04-15 Philips Nv Elektronenstraalapparaat.
JPS5136196B2 (xx) * 1972-05-22 1976-10-07
DE2458370C2 (de) * 1974-12-10 1984-05-10 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Energiestrahl-Gravierverfahren und Einrichtung zu seiner Durchführung
DE2627176B2 (de) * 1976-06-15 1978-09-14 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektronenstrahloptisches Projektionsgerät mit einer langbrennweitigen magnetischen Linse

Also Published As

Publication number Publication date
CH635464A5 (de) 1983-03-31
NL182996C (nl) 1988-06-16
GB2012476A (en) 1979-07-25
US4245159A (en) 1981-01-13
GB2012476B (en) 1982-05-19
DE2752598B2 (de) 1981-01-29
FR2410356B1 (xx) 1984-03-30
DE2752598A1 (de) 1979-05-31
NL182996B (nl) 1988-01-18
FR2410356A1 (fr) 1979-06-22
NL7811418A (nl) 1979-05-29
CA1100564A (en) 1981-05-05
JPS6124782B2 (xx) 1986-06-12
JPS5476058A (en) 1979-06-18
DE2752598C3 (de) 1981-10-15

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: DR. ING. RUDOLF HELL G.M.B.H.

Effective date: 19871031