BE855701A - Procede pour realiser des masques pour la lithographie aux rayons x - Google Patents

Procede pour realiser des masques pour la lithographie aux rayons x

Info

Publication number
BE855701A
BE855701A BE178453A BE178453A BE855701A BE 855701 A BE855701 A BE 855701A BE 178453 A BE178453 A BE 178453A BE 178453 A BE178453 A BE 178453A BE 855701 A BE855701 A BE 855701A
Authority
BE
Belgium
Prior art keywords
ray lithography
making masks
masks
making
lithography
Prior art date
Application number
BE178453A
Other languages
English (en)
French (fr)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of BE855701A publication Critical patent/BE855701A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physical Vapour Deposition (AREA)
BE178453A 1976-06-15 1977-06-15 Procede pour realiser des masques pour la lithographie aux rayons x BE855701A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762626851 DE2626851C3 (de) 1976-06-15 1976-06-15 Verfahren zur Herstellung von Masken für die Röntgenlithographie

Publications (1)

Publication Number Publication Date
BE855701A true BE855701A (fr) 1977-10-03

Family

ID=5980611

Family Applications (1)

Application Number Title Priority Date Filing Date
BE178453A BE855701A (fr) 1976-06-15 1977-06-15 Procede pour realiser des masques pour la lithographie aux rayons x

Country Status (7)

Country Link
JP (1) JPS52153673A (enExample)
BE (1) BE855701A (enExample)
DE (1) DE2626851C3 (enExample)
FR (1) FR2355314A1 (enExample)
GB (1) GB1544787A (enExample)
IT (1) IT1083777B (enExample)
NL (1) NL186201C (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171489A (en) * 1978-09-13 1979-10-16 Bell Telephone Laboratories, Incorporated Radiation mask structure
GB2089524B (en) * 1980-12-17 1984-12-05 Westinghouse Electric Corp High resolution lithographic process
GB2121980B (en) * 1982-06-10 1986-02-05 Standard Telephones Cables Ltd X ray masks
DE3435178A1 (de) * 1983-09-26 1985-04-04 Canon K.K., Tokio/Tokyo Gegenstand mit maskenstruktur fuer die lithografie
DE3338717A1 (de) * 1983-10-25 1985-05-02 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung einer roentgenmaske mit metalltraegerfolie
JPS6169133A (ja) * 1985-05-07 1986-04-09 Chiyou Lsi Gijutsu Kenkyu Kumiai 軟ｘ線露光方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1948141A1 (de) * 1968-09-23 1970-04-23 Polaroid Corp Optisches Element mit Antireflexueberzug

Also Published As

Publication number Publication date
DE2626851A1 (de) 1977-12-22
DE2626851C3 (de) 1982-03-18
FR2355314A1 (fr) 1978-01-13
NL7706552A (nl) 1977-12-19
JPS52153673A (en) 1977-12-20
NL186201C (nl) 1990-10-01
GB1544787A (en) 1979-04-25
DE2626851B2 (de) 1981-07-02
IT1083777B (it) 1985-05-25
FR2355314B1 (enExample) 1981-08-14

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: SIEMENS A.G.

Effective date: 19910630