GB1544787A - Masks for x-ray lithography - Google Patents

Masks for x-ray lithography

Info

Publication number
GB1544787A
GB1544787A GB1836377A GB1836377A GB1544787A GB 1544787 A GB1544787 A GB 1544787A GB 1836377 A GB1836377 A GB 1836377A GB 1836377 A GB1836377 A GB 1836377A GB 1544787 A GB1544787 A GB 1544787A
Authority
GB
United Kingdom
Prior art keywords
masks
ray lithography
lithography
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1836377A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of GB1544787A publication Critical patent/GB1544787A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physical Vapour Deposition (AREA)
GB1836377A 1976-06-15 1977-05-02 Masks for x-ray lithography Expired GB1544787A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762626851 DE2626851C3 (de) 1976-06-15 1976-06-15 Verfahren zur Herstellung von Masken für die Röntgenlithographie

Publications (1)

Publication Number Publication Date
GB1544787A true GB1544787A (en) 1979-04-25

Family

ID=5980611

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1836377A Expired GB1544787A (en) 1976-06-15 1977-05-02 Masks for x-ray lithography

Country Status (7)

Country Link
JP (1) JPS52153673A (enExample)
BE (1) BE855701A (enExample)
DE (1) DE2626851C3 (enExample)
FR (1) FR2355314A1 (enExample)
GB (1) GB1544787A (enExample)
IT (1) IT1083777B (enExample)
NL (1) NL186201C (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3150056A1 (de) * 1980-12-17 1982-07-15 Westinghouse Electric Corp., 15222 Pittsburgh, Pa. "maske zur verwendung bei lithopraphischen verfahren"
GB2121980A (en) * 1982-06-10 1984-01-04 Standard Telephones Cables Ltd X-ray masks
GB2148540A (en) * 1983-09-26 1985-05-30 Canon Kk Lithographic mask

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171489A (en) * 1978-09-13 1979-10-16 Bell Telephone Laboratories, Incorporated Radiation mask structure
DE3338717A1 (de) * 1983-10-25 1985-05-02 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung einer roentgenmaske mit metalltraegerfolie
JPS6169133A (ja) * 1985-05-07 1986-04-09 Chiyou Lsi Gijutsu Kenkyu Kumiai 軟ｘ線露光方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1948141A1 (de) * 1968-09-23 1970-04-23 Polaroid Corp Optisches Element mit Antireflexueberzug

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3150056A1 (de) * 1980-12-17 1982-07-15 Westinghouse Electric Corp., 15222 Pittsburgh, Pa. "maske zur verwendung bei lithopraphischen verfahren"
GB2121980A (en) * 1982-06-10 1984-01-04 Standard Telephones Cables Ltd X-ray masks
GB2148540A (en) * 1983-09-26 1985-05-30 Canon Kk Lithographic mask

Also Published As

Publication number Publication date
DE2626851A1 (de) 1977-12-22
DE2626851C3 (de) 1982-03-18
FR2355314A1 (fr) 1978-01-13
NL7706552A (nl) 1977-12-19
BE855701A (fr) 1977-10-03
JPS52153673A (en) 1977-12-20
NL186201C (nl) 1990-10-01
DE2626851B2 (de) 1981-07-02
IT1083777B (it) 1985-05-25
FR2355314B1 (enExample) 1981-08-14

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee