BE854816A - Procede de depot dans une decharge luminescente sur un substrat et de dacapage ionique de celui-ci et dispositif de mise en oeuvre - Google Patents

Procede de depot dans une decharge luminescente sur un substrat et de dacapage ionique de celui-ci et dispositif de mise en oeuvre

Info

Publication number
BE854816A
BE854816A BE177725A BE177725A BE854816A BE 854816 A BE854816 A BE 854816A BE 177725 A BE177725 A BE 177725A BE 177725 A BE177725 A BE 177725A BE 854816 A BE854816 A BE 854816A
Authority
BE
Belgium
Prior art keywords
substrate
scrapping
ionic
deposit process
implementation device
Prior art date
Application number
BE177725A
Other languages
English (en)
French (fr)
Inventor
B Zega
Original Assignee
Battelle Memorial Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Battelle Memorial Institute filed Critical Battelle Memorial Institute
Publication of BE854816A publication Critical patent/BE854816A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
BE177725A 1976-05-19 1977-05-18 Procede de depot dans une decharge luminescente sur un substrat et de dacapage ionique de celui-ci et dispositif de mise en oeuvre BE854816A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH623776A CH611938A5 (de) 1976-05-19 1976-05-19

Publications (1)

Publication Number Publication Date
BE854816A true BE854816A (fr) 1977-11-18

Family

ID=4306421

Family Applications (1)

Application Number Title Priority Date Filing Date
BE177725A BE854816A (fr) 1976-05-19 1977-05-18 Procede de depot dans une decharge luminescente sur un substrat et de dacapage ionique de celui-ci et dispositif de mise en oeuvre

Country Status (11)

Country Link
US (1) US4116791A (de)
JP (1) JPS608303B2 (de)
AT (1) AT354214B (de)
BE (1) BE854816A (de)
CH (1) CH611938A5 (de)
DE (1) DE2722708A1 (de)
FR (1) FR2352393A1 (de)
GB (1) GB1548061A (de)
IT (1) IT1085894B (de)
NL (1) NL7705483A (de)
SE (1) SE7705766L (de)

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CN100483643C (zh) * 2006-07-13 2009-04-29 中芯国际集成电路制造(上海)有限公司 一种制作低介电常数层的新方法及其应用
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KR101975741B1 (ko) * 2009-11-13 2019-05-09 가부시키가이샤 한도오따이 에네루기 켄큐쇼 타깃 재료의 포장 방법 및 타깃의 장착 방법
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Also Published As

Publication number Publication date
IT1085894B (it) 1985-05-28
FR2352393A1 (fr) 1977-12-16
GB1548061A (en) 1979-07-04
DE2722708A1 (de) 1977-12-08
CH611938A5 (de) 1979-06-29
FR2352393B1 (de) 1983-02-11
ATA352977A (de) 1979-05-15
SE7705766L (sv) 1977-11-20
JPS608303B2 (ja) 1985-03-01
AT354214B (de) 1979-12-27
NL7705483A (nl) 1977-11-22
JPS5310384A (en) 1978-01-30
US4116791A (en) 1978-09-26

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