BE525102A - - Google Patents
Info
- Publication number
- BE525102A BE525102A BE525102DA BE525102A BE 525102 A BE525102 A BE 525102A BE 525102D A BE525102D A BE 525102DA BE 525102 A BE525102 A BE 525102A
- Authority
- BE
- Belgium
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/02—Refining by liquating, filtering, centrifuging, distilling, or supersonic wave action including acoustic waves
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
- C30B11/10—Solid or liquid components, e.g. Verneuil method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/20—Heating of the molten zone by induction, e.g. hot wire technique
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/22—Furnaces without an endless core
- H05B6/30—Arrangements for remelting or zone melting
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Acoustics & Sound (AREA)
- General Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US333693XA | 1952-12-17 | 1952-12-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE525102A true BE525102A (ja) | 1900-01-01 |
Family
ID=21870028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE525102D BE525102A (ja) | 1952-12-17 |
Country Status (6)
Country | Link |
---|---|
BE (1) | BE525102A (ja) |
CH (1) | CH333693A (ja) |
DE (1) | DE1014332B (ja) |
FR (1) | FR1087946A (ja) |
GB (1) | GB774270A (ja) |
NL (1) | NL89230C (ja) |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1063870B (de) * | 1956-06-28 | 1959-08-20 | Gustav Weissenberg | Verfahren und Vorrichtung zum tiegellosen Zuechten von Einkristallen aus hochreinem Silicium oder Germanium |
US2964396A (en) * | 1954-05-24 | 1960-12-13 | Siemens Ag | Producing semiconductor substances of highest purity |
DE1102117B (de) * | 1954-05-18 | 1961-03-16 | Siemens Ag | Verfahren zum Herstellen von reinstem Silicium |
DE1136308B (de) * | 1956-10-17 | 1962-09-13 | Siemens Ag | Verfahren zum Herstellen von Kristallstaeben aus hochreinen halbleitenden Stoffen |
DE1141255B (de) * | 1958-03-05 | 1962-12-20 | Siemens Ag | Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe |
DE1151782B (de) * | 1954-06-13 | 1963-07-25 | Siemens Ag | Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe |
DE1169683B (de) * | 1957-05-31 | 1964-05-06 | Siemens Ag | Verfahren zum tiegellosen Zonenschmelzen eines Halbleiterstabes |
DE1179382B (de) * | 1954-06-30 | 1964-10-08 | Siemens Ag | Verfahren zum Herstellen eines extrem reinen, stabfoermigen Halbleiterkristalls fuer die Fertigung von elektrischen Halbleiterbauelementen, wie Richtleiter, Transistoren usw. |
DE1181668B (de) * | 1956-10-17 | 1964-11-19 | Siemens Ag | Verfahren zum Herstellen von hochreinen, stabfoermigen Halbleiterkristallen durch Abscheiden des Halbleiters aus einer gasfoermigen Verbindung des Halbleiters durch eineelektrische Gasentladung |
DE1196046B (de) * | 1955-03-28 | 1965-07-01 | Siemens Ag | Verfahren zum Herstellen eines hochreinen, kristallinen Stabes aus einem leitenden oder halbleitenden Element |
DE1201073B (de) * | 1954-07-30 | 1965-09-16 | Siemens Ag | Verfahren zum Herstellen einer halbleitenden Legierung |
DE1207922B (de) * | 1957-04-30 | 1965-12-30 | Standard Elektrik Lorenz Ag | Verfahren zum Herstellen von hochreinen Halbleitersubstanzen, insbesondere von Silizium |
US3232745A (en) * | 1960-12-05 | 1966-02-01 | Siemens Ag | Producing rod-shaped semiconductor crystals |
DE1216257B (de) * | 1960-08-18 | 1966-05-12 | Kempten Elektroschmelz Gmbh | Verfahren zur Herstellung von Einkristallen |
DE977418C (de) * | 1955-01-14 | 1966-05-18 | Siemens Ag | Verfahren und Vorrichtung zum Herstellen eines Stabes aus hochreinem Silicium |
DE1253235B (de) * | 1954-05-25 | 1967-11-02 | Siemens Ag | Verfahren zum Herstellen stabfoermiger Halbleiterkristalle |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1061527B (de) * | 1953-02-14 | 1959-07-16 | Siemens Ag | Verfahren zum zonenweisen Umschmelzen von Staeben und anderen langgestreckten Werkstuecken |
AT207857B (de) * | 1955-01-14 | Degussa | Verfahren zur Herstellung von Blausäure durch Umsetzung von Kohlenwasserstoffen mit Ammoniak im Katalysatorbett | |
US2835614A (en) * | 1955-11-30 | 1958-05-20 | Raulaud Corp | Method of manufacturing crystalline material |
NL104388C (ja) * | 1956-11-28 | |||
DE1076623B (de) * | 1957-11-15 | 1960-03-03 | Siemens Ag | Vorrichtung zum tiegelfreien Zonenziehen von stabfoermigem Halbleitermaterial |
DE1092576B (de) * | 1957-11-15 | 1960-11-10 | Siemens Ag | Stromzufuehrung fuer die bewegliche Heizspule einer tiegelfreien Zonenziehvorrichtung im Innern eines Gefaesses |
NL234451A (ja) * | 1957-12-27 | |||
NL235481A (ja) * | 1958-02-19 | |||
NL237618A (ja) * | 1958-04-03 | |||
NL240421A (ja) * | 1958-07-30 | |||
US3093456A (en) * | 1958-09-02 | 1963-06-11 | Texas Instruments Inc | Method for recovery and reuse of quartz containers |
DE1216040B (de) * | 1958-09-12 | 1966-05-05 | Eternit Sa | Muffensteckverbindung fuer glatte Einsteckrohre |
US3053639A (en) * | 1959-02-11 | 1962-09-11 | Union Carbide Corp | Method and apparatus for growing crystals |
NL250835A (ja) * | 1959-04-30 | |||
CH354429A (fr) * | 1959-06-05 | 1961-05-31 | Ind De Pierres Scient Hrand Dj | Procédé de fabrication d'un corps tubulaire en pierre synthétique, at installation pour la mise en oeuvre de ce procédé |
CH354427A (fr) * | 1959-06-05 | 1961-05-31 | Ind De Pierres Scient Hrand Dj | Procédé de fabrication d'un corps de révolution, notamment d'un disque en pierre synthétique et installation pour la mise en oeuvre de ce procédé |
US3086850A (en) * | 1959-06-17 | 1963-04-23 | Itt | Method and means for growing and treating crystals |
US3115469A (en) * | 1959-06-22 | 1963-12-24 | Monsanto Chemicals | Production of single crystals of ferrites |
DE1128412B (de) * | 1959-12-17 | 1962-04-26 | Metallgesellschaft Ag | Verfahren zur Herstellung von Reinstsilicium durch thermische Zersetzung von gasfoermigen Siliciumverbindungen |
NL258961A (ja) * | 1959-12-23 | |||
DE1114171B (de) * | 1959-12-31 | 1961-09-28 | Siemens Ag | Halterung fuer stabfoermiges Halbleitermaterial in Vorrichtungen zum tiegelfreien Zonenschmelzen |
NL124042C (ja) * | 1960-03-11 | |||
US3156533A (en) * | 1960-07-26 | 1964-11-10 | Imber Oscar | Crystal growth apparatus |
DE1227424B (de) * | 1961-03-01 | 1966-10-27 | Philips Nv | Verfahren und Vorrichtung zum Zonenschmelzen eines aus einer Metallverbindung bestehenden stabfoermigen Koerpers |
NL275885A (ja) * | 1961-03-14 | |||
FR1315934A (fr) * | 1961-12-15 | 1963-01-25 | Radiotechnique | Appareil horizontal pour la purification et le tirage de cristaux semi-conducteurs |
DE1182207B (de) * | 1962-07-20 | 1964-11-26 | Siemens Ag | Verfahren zum Herstellen eines versetzungsarmen Halbleitereinkristalls durch tiegelfreies Zonenschmelzen |
US3245761A (en) * | 1962-10-11 | 1966-04-12 | Norton Co | Apparatus for making magnesium oxide crystals |
US3314769A (en) * | 1963-05-08 | 1967-04-18 | Union Carbide Corp | Arc process and apparatus for growing crystals |
DE1284942B (de) * | 1964-06-30 | 1968-12-12 | Halbleiterwerk Frankfurt Oder | Vorrichtung zur thermischen Behandlung von Kristallen und Schmelzen, insbesondere aus Halbleitermaterial |
US4379733A (en) * | 1981-10-02 | 1983-04-12 | Hughes Aircraft Company | Bicameral mode crystal growth apparatus and process |
CN113337725A (zh) * | 2021-06-29 | 2021-09-03 | 红河学院 | 一种从冶炼渣中富集锗的方法 |
CN115198356B (zh) * | 2022-07-15 | 2023-07-21 | 郑州大学 | 一种特定取向的大规格金属单晶及其制备方法 |
-
0
- NL NL89230D patent/NL89230C/xx active
- BE BE525102D patent/BE525102A/xx unknown
-
1953
- 1953-09-04 FR FR1087946D patent/FR1087946A/fr not_active Expired
- 1953-09-22 DE DEW12172A patent/DE1014332B/de active Pending
- 1953-12-16 GB GB35016/53A patent/GB774270A/en not_active Expired
- 1953-12-17 CH CH333693D patent/CH333693A/fr unknown
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1102117B (de) * | 1954-05-18 | 1961-03-16 | Siemens Ag | Verfahren zum Herstellen von reinstem Silicium |
US2964396A (en) * | 1954-05-24 | 1960-12-13 | Siemens Ag | Producing semiconductor substances of highest purity |
DE1253235B (de) * | 1954-05-25 | 1967-11-02 | Siemens Ag | Verfahren zum Herstellen stabfoermiger Halbleiterkristalle |
DE1151782B (de) * | 1954-06-13 | 1963-07-25 | Siemens Ag | Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe |
DE976899C (de) * | 1954-06-13 | 1964-07-23 | Siemens Ag | Gasentladungsanlage zur Herstellung eines Stabes aus hochreinem Silicium |
DE1179382B (de) * | 1954-06-30 | 1964-10-08 | Siemens Ag | Verfahren zum Herstellen eines extrem reinen, stabfoermigen Halbleiterkristalls fuer die Fertigung von elektrischen Halbleiterbauelementen, wie Richtleiter, Transistoren usw. |
DE1201073B (de) * | 1954-07-30 | 1965-09-16 | Siemens Ag | Verfahren zum Herstellen einer halbleitenden Legierung |
DE977418C (de) * | 1955-01-14 | 1966-05-18 | Siemens Ag | Verfahren und Vorrichtung zum Herstellen eines Stabes aus hochreinem Silicium |
DE1196046B (de) * | 1955-03-28 | 1965-07-01 | Siemens Ag | Verfahren zum Herstellen eines hochreinen, kristallinen Stabes aus einem leitenden oder halbleitenden Element |
DE1063870B (de) * | 1956-06-28 | 1959-08-20 | Gustav Weissenberg | Verfahren und Vorrichtung zum tiegellosen Zuechten von Einkristallen aus hochreinem Silicium oder Germanium |
DE1136308B (de) * | 1956-10-17 | 1962-09-13 | Siemens Ag | Verfahren zum Herstellen von Kristallstaeben aus hochreinen halbleitenden Stoffen |
DE1181668B (de) * | 1956-10-17 | 1964-11-19 | Siemens Ag | Verfahren zum Herstellen von hochreinen, stabfoermigen Halbleiterkristallen durch Abscheiden des Halbleiters aus einer gasfoermigen Verbindung des Halbleiters durch eineelektrische Gasentladung |
DE1207922B (de) * | 1957-04-30 | 1965-12-30 | Standard Elektrik Lorenz Ag | Verfahren zum Herstellen von hochreinen Halbleitersubstanzen, insbesondere von Silizium |
DE1169683B (de) * | 1957-05-31 | 1964-05-06 | Siemens Ag | Verfahren zum tiegellosen Zonenschmelzen eines Halbleiterstabes |
DE1141255B (de) * | 1958-03-05 | 1962-12-20 | Siemens Ag | Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe |
DE1216257B (de) * | 1960-08-18 | 1966-05-12 | Kempten Elektroschmelz Gmbh | Verfahren zur Herstellung von Einkristallen |
US3232745A (en) * | 1960-12-05 | 1966-02-01 | Siemens Ag | Producing rod-shaped semiconductor crystals |
Also Published As
Publication number | Publication date |
---|---|
GB774270A (en) | 1957-05-08 |
DE1014332B (de) | 1957-08-22 |
CH333693A (fr) | 1958-10-31 |
NL89230C (ja) | 1900-01-01 |
FR1087946A (fr) | 1955-03-01 |