BE525102A - - Google Patents

Info

Publication number
BE525102A
BE525102A BE525102DA BE525102A BE 525102 A BE525102 A BE 525102A BE 525102D A BE525102D A BE 525102DA BE 525102 A BE525102 A BE 525102A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE525102A publication Critical patent/BE525102A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00Boron; Compounds thereof
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/02Refining by liquating, filtering, centrifuging, distilling, or supersonic wave action including acoustic waves
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/10Solid or liquid components, e.g. Verneuil method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/16Heating of the molten zone
    • C30B13/20Heating of the molten zone by induction, e.g. hot wire technique
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/02Induction heating
    • H05B6/22Furnaces without an endless core
    • H05B6/30Arrangements for remelting or zone melting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Acoustics & Sound (AREA)
  • General Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Silicon Compounds (AREA)
BE525102D 1952-12-17 BE525102A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US333693XA 1952-12-17 1952-12-17

Publications (1)

Publication Number Publication Date
BE525102A true BE525102A (ja) 1900-01-01

Family

ID=21870028

Family Applications (1)

Application Number Title Priority Date Filing Date
BE525102D BE525102A (ja) 1952-12-17

Country Status (6)

Country Link
BE (1) BE525102A (ja)
CH (1) CH333693A (ja)
DE (1) DE1014332B (ja)
FR (1) FR1087946A (ja)
GB (1) GB774270A (ja)
NL (1) NL89230C (ja)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1063870B (de) * 1956-06-28 1959-08-20 Gustav Weissenberg Verfahren und Vorrichtung zum tiegellosen Zuechten von Einkristallen aus hochreinem Silicium oder Germanium
US2964396A (en) * 1954-05-24 1960-12-13 Siemens Ag Producing semiconductor substances of highest purity
DE1102117B (de) * 1954-05-18 1961-03-16 Siemens Ag Verfahren zum Herstellen von reinstem Silicium
DE1136308B (de) * 1956-10-17 1962-09-13 Siemens Ag Verfahren zum Herstellen von Kristallstaeben aus hochreinen halbleitenden Stoffen
DE1141255B (de) * 1958-03-05 1962-12-20 Siemens Ag Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe
DE1151782B (de) * 1954-06-13 1963-07-25 Siemens Ag Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe
DE1169683B (de) * 1957-05-31 1964-05-06 Siemens Ag Verfahren zum tiegellosen Zonenschmelzen eines Halbleiterstabes
DE1179382B (de) * 1954-06-30 1964-10-08 Siemens Ag Verfahren zum Herstellen eines extrem reinen, stabfoermigen Halbleiterkristalls fuer die Fertigung von elektrischen Halbleiterbauelementen, wie Richtleiter, Transistoren usw.
DE1181668B (de) * 1956-10-17 1964-11-19 Siemens Ag Verfahren zum Herstellen von hochreinen, stabfoermigen Halbleiterkristallen durch Abscheiden des Halbleiters aus einer gasfoermigen Verbindung des Halbleiters durch eineelektrische Gasentladung
DE1196046B (de) * 1955-03-28 1965-07-01 Siemens Ag Verfahren zum Herstellen eines hochreinen, kristallinen Stabes aus einem leitenden oder halbleitenden Element
DE1201073B (de) * 1954-07-30 1965-09-16 Siemens Ag Verfahren zum Herstellen einer halbleitenden Legierung
DE1207922B (de) * 1957-04-30 1965-12-30 Standard Elektrik Lorenz Ag Verfahren zum Herstellen von hochreinen Halbleitersubstanzen, insbesondere von Silizium
US3232745A (en) * 1960-12-05 1966-02-01 Siemens Ag Producing rod-shaped semiconductor crystals
DE1216257B (de) * 1960-08-18 1966-05-12 Kempten Elektroschmelz Gmbh Verfahren zur Herstellung von Einkristallen
DE977418C (de) * 1955-01-14 1966-05-18 Siemens Ag Verfahren und Vorrichtung zum Herstellen eines Stabes aus hochreinem Silicium
DE1253235B (de) * 1954-05-25 1967-11-02 Siemens Ag Verfahren zum Herstellen stabfoermiger Halbleiterkristalle

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1061527B (de) * 1953-02-14 1959-07-16 Siemens Ag Verfahren zum zonenweisen Umschmelzen von Staeben und anderen langgestreckten Werkstuecken
AT207857B (de) * 1955-01-14 Degussa Verfahren zur Herstellung von Blausäure durch Umsetzung von Kohlenwasserstoffen mit Ammoniak im Katalysatorbett
US2835614A (en) * 1955-11-30 1958-05-20 Raulaud Corp Method of manufacturing crystalline material
NL104388C (ja) * 1956-11-28
DE1076623B (de) * 1957-11-15 1960-03-03 Siemens Ag Vorrichtung zum tiegelfreien Zonenziehen von stabfoermigem Halbleitermaterial
DE1092576B (de) * 1957-11-15 1960-11-10 Siemens Ag Stromzufuehrung fuer die bewegliche Heizspule einer tiegelfreien Zonenziehvorrichtung im Innern eines Gefaesses
NL234451A (ja) * 1957-12-27
NL235481A (ja) * 1958-02-19
NL237618A (ja) * 1958-04-03
NL240421A (ja) * 1958-07-30
US3093456A (en) * 1958-09-02 1963-06-11 Texas Instruments Inc Method for recovery and reuse of quartz containers
DE1216040B (de) * 1958-09-12 1966-05-05 Eternit Sa Muffensteckverbindung fuer glatte Einsteckrohre
US3053639A (en) * 1959-02-11 1962-09-11 Union Carbide Corp Method and apparatus for growing crystals
NL250835A (ja) * 1959-04-30
CH354429A (fr) * 1959-06-05 1961-05-31 Ind De Pierres Scient Hrand Dj Procédé de fabrication d'un corps tubulaire en pierre synthétique, at installation pour la mise en oeuvre de ce procédé
CH354427A (fr) * 1959-06-05 1961-05-31 Ind De Pierres Scient Hrand Dj Procédé de fabrication d'un corps de révolution, notamment d'un disque en pierre synthétique et installation pour la mise en oeuvre de ce procédé
US3086850A (en) * 1959-06-17 1963-04-23 Itt Method and means for growing and treating crystals
US3115469A (en) * 1959-06-22 1963-12-24 Monsanto Chemicals Production of single crystals of ferrites
DE1128412B (de) * 1959-12-17 1962-04-26 Metallgesellschaft Ag Verfahren zur Herstellung von Reinstsilicium durch thermische Zersetzung von gasfoermigen Siliciumverbindungen
NL258961A (ja) * 1959-12-23
DE1114171B (de) * 1959-12-31 1961-09-28 Siemens Ag Halterung fuer stabfoermiges Halbleitermaterial in Vorrichtungen zum tiegelfreien Zonenschmelzen
NL124042C (ja) * 1960-03-11
US3156533A (en) * 1960-07-26 1964-11-10 Imber Oscar Crystal growth apparatus
DE1227424B (de) * 1961-03-01 1966-10-27 Philips Nv Verfahren und Vorrichtung zum Zonenschmelzen eines aus einer Metallverbindung bestehenden stabfoermigen Koerpers
NL275885A (ja) * 1961-03-14
FR1315934A (fr) * 1961-12-15 1963-01-25 Radiotechnique Appareil horizontal pour la purification et le tirage de cristaux semi-conducteurs
DE1182207B (de) * 1962-07-20 1964-11-26 Siemens Ag Verfahren zum Herstellen eines versetzungsarmen Halbleitereinkristalls durch tiegelfreies Zonenschmelzen
US3245761A (en) * 1962-10-11 1966-04-12 Norton Co Apparatus for making magnesium oxide crystals
US3314769A (en) * 1963-05-08 1967-04-18 Union Carbide Corp Arc process and apparatus for growing crystals
DE1284942B (de) * 1964-06-30 1968-12-12 Halbleiterwerk Frankfurt Oder Vorrichtung zur thermischen Behandlung von Kristallen und Schmelzen, insbesondere aus Halbleitermaterial
US4379733A (en) * 1981-10-02 1983-04-12 Hughes Aircraft Company Bicameral mode crystal growth apparatus and process
CN113337725A (zh) * 2021-06-29 2021-09-03 红河学院 一种从冶炼渣中富集锗的方法
CN115198356B (zh) * 2022-07-15 2023-07-21 郑州大学 一种特定取向的大规格金属单晶及其制备方法

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1102117B (de) * 1954-05-18 1961-03-16 Siemens Ag Verfahren zum Herstellen von reinstem Silicium
US2964396A (en) * 1954-05-24 1960-12-13 Siemens Ag Producing semiconductor substances of highest purity
DE1253235B (de) * 1954-05-25 1967-11-02 Siemens Ag Verfahren zum Herstellen stabfoermiger Halbleiterkristalle
DE1151782B (de) * 1954-06-13 1963-07-25 Siemens Ag Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe
DE976899C (de) * 1954-06-13 1964-07-23 Siemens Ag Gasentladungsanlage zur Herstellung eines Stabes aus hochreinem Silicium
DE1179382B (de) * 1954-06-30 1964-10-08 Siemens Ag Verfahren zum Herstellen eines extrem reinen, stabfoermigen Halbleiterkristalls fuer die Fertigung von elektrischen Halbleiterbauelementen, wie Richtleiter, Transistoren usw.
DE1201073B (de) * 1954-07-30 1965-09-16 Siemens Ag Verfahren zum Herstellen einer halbleitenden Legierung
DE977418C (de) * 1955-01-14 1966-05-18 Siemens Ag Verfahren und Vorrichtung zum Herstellen eines Stabes aus hochreinem Silicium
DE1196046B (de) * 1955-03-28 1965-07-01 Siemens Ag Verfahren zum Herstellen eines hochreinen, kristallinen Stabes aus einem leitenden oder halbleitenden Element
DE1063870B (de) * 1956-06-28 1959-08-20 Gustav Weissenberg Verfahren und Vorrichtung zum tiegellosen Zuechten von Einkristallen aus hochreinem Silicium oder Germanium
DE1136308B (de) * 1956-10-17 1962-09-13 Siemens Ag Verfahren zum Herstellen von Kristallstaeben aus hochreinen halbleitenden Stoffen
DE1181668B (de) * 1956-10-17 1964-11-19 Siemens Ag Verfahren zum Herstellen von hochreinen, stabfoermigen Halbleiterkristallen durch Abscheiden des Halbleiters aus einer gasfoermigen Verbindung des Halbleiters durch eineelektrische Gasentladung
DE1207922B (de) * 1957-04-30 1965-12-30 Standard Elektrik Lorenz Ag Verfahren zum Herstellen von hochreinen Halbleitersubstanzen, insbesondere von Silizium
DE1169683B (de) * 1957-05-31 1964-05-06 Siemens Ag Verfahren zum tiegellosen Zonenschmelzen eines Halbleiterstabes
DE1141255B (de) * 1958-03-05 1962-12-20 Siemens Ag Verfahren zum Herstellen hochgereinigter einkristalliner Halbleiterstaebe
DE1216257B (de) * 1960-08-18 1966-05-12 Kempten Elektroschmelz Gmbh Verfahren zur Herstellung von Einkristallen
US3232745A (en) * 1960-12-05 1966-02-01 Siemens Ag Producing rod-shaped semiconductor crystals

Also Published As

Publication number Publication date
GB774270A (en) 1957-05-08
DE1014332B (de) 1957-08-22
CH333693A (fr) 1958-10-31
NL89230C (ja) 1900-01-01
FR1087946A (fr) 1955-03-01

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