AU5210300A - Device for treating silicon wafers - Google Patents

Device for treating silicon wafers

Info

Publication number
AU5210300A
AU5210300A AU52103/00A AU5210300A AU5210300A AU 5210300 A AU5210300 A AU 5210300A AU 52103/00 A AU52103/00 A AU 52103/00A AU 5210300 A AU5210300 A AU 5210300A AU 5210300 A AU5210300 A AU 5210300A
Authority
AU
Australia
Prior art keywords
bearing member
silicon wafers
bearing
joined
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU52103/00A
Other languages
English (en)
Inventor
Jurgen Seeberger
Frank Werfel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gebr DECKER & Co KG GmbH
Original Assignee
Decker & Co KG Geb GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19959299A external-priority patent/DE19959299A1/de
Application filed by Decker & Co KG Geb GmbH filed Critical Decker & Co KG Geb GmbH
Publication of AU5210300A publication Critical patent/AU5210300A/en
Abandoned legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/0408—Passive magnetic bearings
    • F16C32/0436—Passive magnetic bearings with a conductor on one part movable with respect to a magnetic field, e.g. a body of copper on one part and a permanent magnet on the other part
    • F16C32/0438—Passive magnetic bearings with a conductor on one part movable with respect to a magnetic field, e.g. a body of copper on one part and a permanent magnet on the other part with a superconducting body, e.g. a body made of high temperature superconducting material such as YBaCuO
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C37/00—Cooling of bearings
    • F16C37/005—Cooling of bearings of magnetic bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2300/00—Application independent of particular apparatuses
    • F16C2300/30—Application independent of particular apparatuses related to direction with respect to gravity
    • F16C2300/32—Horizontal, e.g. bearings for supporting a horizontal shaft

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Chemically Coating (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AU52103/00A 1999-04-27 2000-04-13 Device for treating silicon wafers Abandoned AU5210300A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE19918922 1999-04-27
DE19918922 1999-04-27
DE19959299A DE19959299A1 (de) 1999-04-27 1999-12-09 Behandlungsvorrichtung für Silizium-Scheiben
DE19959299 1999-12-09
PCT/EP2000/003351 WO2000065637A2 (de) 1999-04-27 2000-04-13 Behandlungsvorrichtung für silizium-scheiben

Publications (1)

Publication Number Publication Date
AU5210300A true AU5210300A (en) 2000-11-10

Family

ID=26053088

Family Applications (1)

Application Number Title Priority Date Filing Date
AU52103/00A Abandoned AU5210300A (en) 1999-04-27 2000-04-13 Device for treating silicon wafers

Country Status (7)

Country Link
US (1) US7048824B1 (enExample)
EP (1) EP1173883B1 (enExample)
JP (1) JP2004507068A (enExample)
CN (1) CN1349655A (enExample)
AT (1) ATE251340T1 (enExample)
AU (1) AU5210300A (enExample)
WO (1) WO2000065637A2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3808709B2 (ja) * 2000-07-19 2006-08-16 大日本スクリーン製造株式会社 基板処理装置
JP4026750B2 (ja) * 2002-04-24 2007-12-26 東京エレクトロン株式会社 基板処理装置
JP4486649B2 (ja) * 2004-10-28 2010-06-23 東京エレクトロン株式会社 液処理装置
US8471254B2 (en) * 2005-12-27 2013-06-25 Hana Microdisplay Technologies, Inc. Liquid crystal cells with uniform cell gap and methods of manufacture
US8037761B2 (en) * 2006-03-03 2011-10-18 Niigata University Quantitative evaluation device and method of atomic vacancy existing in silicon wafer
JP5276347B2 (ja) * 2007-07-03 2013-08-28 国立大学法人 新潟大学 シリコンウェーハ中に存在する原子空孔の定量評価装置、その方法、シリコンウェーハの製造方法、及び薄膜振動子
CN101217108B (zh) * 2008-01-02 2010-06-09 株洲南车时代电气股份有限公司 一种芯片台面腐蚀装置
US20100038498A1 (en) * 2008-08-18 2010-02-18 Skedco, Inc. Configurable anchor point and modular kit for an anchor point
US20120098371A1 (en) * 2010-10-22 2012-04-26 Spinlectrix Inc. Stabilization of rotating machinery
JP5715444B2 (ja) * 2011-02-28 2015-05-07 東京エレクトロン株式会社 載置装置
DE102019135182A1 (de) * 2019-12-19 2021-06-24 Oerlikon Surface Solutions Ag, Pfäffikon Haltevorrichtung zum Halten eines Substrats
DE102023131367A1 (de) * 2023-11-10 2025-05-15 Gebr. Schmid Gmbh Vorrichtung, Verfahren und Anlage zur Leiterplattenherstellung

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH469404A (fr) * 1968-01-26 1969-02-28 Ebauches Sa Diviseur de fréquence
US4300581A (en) * 1980-03-06 1981-11-17 Thompson Raymon F Centrifugal wafer processor
EP0238908A1 (de) * 1986-03-19 1987-09-30 Siemens Aktiengesellschaft Kryosorptionspumpe für ein thermisches Isoliervakuum im Läufer einer elektrischen Maschine mit supraleitender Erregerwicklung
DE3808331A1 (de) * 1988-03-12 1989-09-28 Kernforschungsanlage Juelich Magnetische lagerung mit permanentmagneten zur aufnahme der radialen lagerkraefte
JPH0558777A (ja) * 1991-08-27 1993-03-09 Canon Inc 薄膜形成装置
JPH05238683A (ja) * 1992-02-28 1993-09-17 Ebara Corp 磁気浮上エレベータ
US5398481A (en) 1992-05-19 1995-03-21 Ebara Corporation Vacuum processing system
JPH0758036A (ja) * 1993-08-16 1995-03-03 Ebara Corp 薄膜形成装置
JP3961032B2 (ja) * 1993-12-13 2007-08-15 シーメンス アクチエンゲゼルシヤフト 回転子軸の磁気軸受装置
WO1995020264A1 (en) * 1994-01-25 1995-07-27 Kanagawa Academy Of Science And Technology Magnetic levitation device
JPH081475A (ja) * 1994-06-22 1996-01-09 Nippon Seiko Kk ターンテーブル装置
US5554583A (en) * 1994-09-08 1996-09-10 Hull; John R. Permanent magnet design for high-speed superconducting bearings
DE19503695C2 (de) * 1995-02-04 1997-02-27 Roland Man Druckmasch Absicherung für eine Druckmaschine
US5747426A (en) * 1995-06-07 1998-05-05 Commonwealth Research Corporation High performance magnetic bearing systems using high temperature superconductors
TW331652B (en) * 1995-06-16 1998-05-11 Ebara Corp Thin film vapor deposition apparatus
WO1997003225A1 (en) * 1995-07-10 1997-01-30 Cvc Products, Inc. Programmable ultraclean electromagnetic substrate rotation apparatus and method for microelectronics manufacturing equipment
JP3672416B2 (ja) * 1997-06-27 2005-07-20 株式会社荏原製作所 スピン処理装置
JP3847935B2 (ja) * 1998-01-09 2006-11-22 キヤノン株式会社 多孔質領域の除去方法及び半導体基体の製造方法
DE19847347C2 (de) * 1998-10-14 2001-03-29 Ldt Gmbh & Co Magnetlager
TW466576B (en) * 1999-06-15 2001-12-01 Ebara Corp Substrate processing apparatus

Also Published As

Publication number Publication date
ATE251340T1 (de) 2003-10-15
WO2000065637A2 (de) 2000-11-02
EP1173883A2 (de) 2002-01-23
CN1349655A (zh) 2002-05-15
WO2000065637A3 (de) 2001-04-12
EP1173883B1 (de) 2003-10-01
JP2004507068A (ja) 2004-03-04
US7048824B1 (en) 2006-05-23

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase