AU2005336130B2 - Method, system, and apparatus for gating configurations and improved contacts in nanowire-based electronic devices - Google Patents
Method, system, and apparatus for gating configurations and improved contacts in nanowire-based electronic devices Download PDFInfo
- Publication number
- AU2005336130B2 AU2005336130B2 AU2005336130A AU2005336130A AU2005336130B2 AU 2005336130 B2 AU2005336130 B2 AU 2005336130B2 AU 2005336130 A AU2005336130 A AU 2005336130A AU 2005336130 A AU2005336130 A AU 2005336130A AU 2005336130 B2 AU2005336130 B2 AU 2005336130B2
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- Australia
- Prior art keywords
- nanowire
- contact
- electronic device
- gate
- core
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/117—Shapes of semiconductor bodies
- H10D62/118—Nanostructure semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/36—Unipolar devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/43—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 1D charge carrier gas channels, e.g. quantum wire FETs or transistors having 1D quantum-confined channels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/62—Fin field-effect transistors [FinFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
- H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
- H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
- H10D30/6733—Multi-gate TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
- H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
- H10D30/6735—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes having gates fully surrounding the channels, e.g. gate-all-around
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/675—Group III-V materials, Group II-VI materials, Group IV-VI materials, selenium or tellurium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/117—Shapes of semiconductor bodies
- H10D62/118—Nanostructure semiconductor bodies
- H10D62/119—Nanowire, nanosheet or nanotube semiconductor bodies
- H10D62/121—Nanowire, nanosheet or nanotube semiconductor bodies oriented parallel to substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/762—Nanowire or quantum wire, i.e. axially elongated structure having two dimensions of 100 nm or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/936—Specified use of nanostructure for electronic or optoelectronic application in a transistor or 3-terminal device
- Y10S977/938—Field effect transistors, FETS, with nanowire- or nanotube-channel region
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thin Film Transistor (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US61876204P | 2004-10-15 | 2004-10-15 | |
| US60/618,762 | 2004-10-15 | ||
| PCT/US2005/037237 WO2007030126A2 (en) | 2004-10-15 | 2005-10-14 | Method, system, and apparatus for gating configurations and improved contacts in nanowire-based electronic devices |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU2005336130A1 AU2005336130A1 (en) | 2007-03-15 |
| AU2005336130B2 true AU2005336130B2 (en) | 2011-02-24 |
Family
ID=37836293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2005336130A Ceased AU2005336130B2 (en) | 2004-10-15 | 2005-10-14 | Method, system, and apparatus for gating configurations and improved contacts in nanowire-based electronic devices |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US7473943B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1810340A2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2008517468A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20070063597A (cg-RX-API-DMAC7.html) |
| CN (1) | CN101401210B (cg-RX-API-DMAC7.html) |
| AU (1) | AU2005336130B2 (cg-RX-API-DMAC7.html) |
| CA (1) | CA2589432C (cg-RX-API-DMAC7.html) |
| WO (1) | WO2007030126A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7454295B2 (en) | 1998-12-17 | 2008-11-18 | The Watereye Corporation | Anti-terrorism water quality monitoring system |
| US9056783B2 (en) * | 1998-12-17 | 2015-06-16 | Hach Company | System for monitoring discharges into a waste water collection system |
| US8958917B2 (en) * | 1998-12-17 | 2015-02-17 | Hach Company | Method and system for remote monitoring of fluid quality and treatment |
| US20110125412A1 (en) * | 1998-12-17 | 2011-05-26 | Hach Company | Remote monitoring of carbon nanotube sensor |
| US8920619B2 (en) | 2003-03-19 | 2014-12-30 | Hach Company | Carbon nanotube sensor |
| US7473943B2 (en) * | 2004-10-15 | 2009-01-06 | Nanosys, Inc. | Gate configuration for nanowire electronic devices |
| US8883568B2 (en) * | 2008-06-10 | 2014-11-11 | Brown University Research Foundation | Method providing radial addressing of nanowires |
| US8072005B2 (en) * | 2005-02-04 | 2011-12-06 | Brown University Research Foundation | Apparatus, method and computer program product providing radial addressing of nanowires |
| KR101100887B1 (ko) * | 2005-03-17 | 2012-01-02 | 삼성전자주식회사 | 박막 트랜지스터, 박막 트랜지스터 표시판 및 그 제조 방법 |
| US20060231237A1 (en) * | 2005-03-21 | 2006-10-19 | Carlos Dangelo | Apparatus and method for cooling ICs using nano-rod based chip-level heat sinks |
| CA2603352C (en) * | 2005-04-06 | 2013-10-01 | Jene Golovchenko | Molecular characterization with carbon nanotube control |
| US7649665B2 (en) * | 2005-08-24 | 2010-01-19 | The Trustees Of Boston College | Apparatus and methods for optical switching using nanoscale optics |
| US7906803B2 (en) * | 2005-12-06 | 2011-03-15 | Canon Kabushiki Kaisha | Nano-wire capacitor and circuit device therewith |
| US8119032B2 (en) | 2006-02-07 | 2012-02-21 | President And Fellows Of Harvard College | Gas-phase functionalization of surfaces including carbon-based surfaces |
| EP1999067B1 (en) * | 2006-02-07 | 2014-04-09 | President and Fellows of Harvard College | Gas-phase functionalization of carbon nanotubes |
| WO2008018726A1 (en) * | 2006-08-07 | 2008-02-14 | Seoul National University Industry Foundation | Nanostructure sensors |
| US7667260B2 (en) * | 2006-08-09 | 2010-02-23 | Micron Technology, Inc. | Nanoscale floating gate and methods of formation |
| US7999251B2 (en) * | 2006-09-11 | 2011-08-16 | International Business Machines Corporation | Nanowire MOSFET with doped epitaxial contacts for source and drain |
| US7858918B2 (en) * | 2007-02-05 | 2010-12-28 | Ludwig Lester F | Molecular transistor circuits compatible with carbon nanotube sensors and transducers |
| US7838809B2 (en) * | 2007-02-17 | 2010-11-23 | Ludwig Lester F | Nanoelectronic differential amplifiers and related circuits having carbon nanotubes, graphene nanoribbons, or other related materials |
| US7923310B2 (en) * | 2007-07-17 | 2011-04-12 | Sharp Laboratories Of America, Inc. | Core-shell-shell nanowire transistor and fabrication method |
| US20110275544A1 (en) * | 2007-10-01 | 2011-11-10 | University Of Southern California | Microfluidic integration with nanosensor platform |
| US8188513B2 (en) * | 2007-10-04 | 2012-05-29 | Stc.Unm | Nanowire and larger GaN based HEMTS |
| US20100204062A1 (en) * | 2008-11-07 | 2010-08-12 | University Of Southern California | Calibration methods for multiplexed sensor arrays |
| WO2010071658A1 (en) * | 2008-12-19 | 2010-06-24 | Hewlett-Packard Development Company, Hewlett-Packard Development Company, L.P. | Photovoltaic structure and method of fabrication employing nanowire on stub |
| FR2942660B1 (fr) * | 2009-02-27 | 2011-04-01 | Commissariat Energie Atomique | Dispositif capteur a base de nanofils |
| EP2409327A1 (de) * | 2009-03-20 | 2012-01-25 | Microgan Gmbh | Vertikal kontaktiertes elektronisches bauelement sowie verfahren zur herstellung eines solchen |
| WO2010115143A1 (en) * | 2009-04-03 | 2010-10-07 | University Of Southern California | Surface modification of nanosensor platforms to increase sensitivity and reproducibility |
| US8368125B2 (en) * | 2009-07-20 | 2013-02-05 | International Business Machines Corporation | Multiple orientation nanowires with gate stack stressors |
| WO2011010542A1 (en) * | 2009-07-23 | 2011-01-27 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| US8455334B2 (en) * | 2009-12-04 | 2013-06-04 | International Business Machines Corporation | Planar and nanowire field effect transistors |
| US8143113B2 (en) | 2009-12-04 | 2012-03-27 | International Business Machines Corporation | Omega shaped nanowire tunnel field effect transistors fabrication |
| US8173993B2 (en) * | 2009-12-04 | 2012-05-08 | International Business Machines Corporation | Gate-all-around nanowire tunnel field effect transistors |
| US8384065B2 (en) * | 2009-12-04 | 2013-02-26 | International Business Machines Corporation | Gate-all-around nanowire field effect transistors |
| US8129247B2 (en) | 2009-12-04 | 2012-03-06 | International Business Machines Corporation | Omega shaped nanowire field effect transistors |
| US8368123B2 (en) * | 2009-12-23 | 2013-02-05 | Nokia Corporation | Apparatus for sensing an event |
| US8722492B2 (en) | 2010-01-08 | 2014-05-13 | International Business Machines Corporation | Nanowire pin tunnel field effect devices |
| US8324940B2 (en) | 2010-04-13 | 2012-12-04 | International Business Machines Corporation | Nanowire circuits in matched devices |
| US8361907B2 (en) | 2010-05-10 | 2013-01-29 | International Business Machines Corporation | Directionally etched nanowire field effect transistors |
| US8324030B2 (en) | 2010-05-12 | 2012-12-04 | International Business Machines Corporation | Nanowire tunnel field effect transistors |
| US8394710B2 (en) * | 2010-06-21 | 2013-03-12 | International Business Machines Corporation | Semiconductor devices fabricated by doped material layer as dopant source |
| US8680510B2 (en) * | 2010-06-28 | 2014-03-25 | International Business Machines Corporation | Method of forming compound semiconductor |
| US8298881B2 (en) * | 2010-06-28 | 2012-10-30 | International Business Machines Corporation | Nanowire FET with trapezoid gate structure |
| US8835231B2 (en) | 2010-08-16 | 2014-09-16 | International Business Machines Corporation | Methods of forming contacts for nanowire field effect transistors |
| US8536563B2 (en) | 2010-09-17 | 2013-09-17 | International Business Machines Corporation | Nanowire field effect transistors |
| TWI565063B (zh) * | 2010-10-01 | 2017-01-01 | 應用材料股份有限公司 | 用在薄膜電晶體應用中的砷化鎵類的材料 |
| US9040364B2 (en) * | 2012-10-30 | 2015-05-26 | International Business Machines Corporation | Carbon nanotube devices with unzipped low-resistance contacts |
| US20150243837A1 (en) * | 2013-03-15 | 2015-08-27 | Moonsub Shim | Multi-heterojunction nanoparticles, methods of manufacture thereof and articles comprising the same |
| CN104979403A (zh) * | 2015-05-20 | 2015-10-14 | 北京大学 | 导电沟道全包裹纳米线平面环栅场效应器件及其制备方法 |
| US10396300B2 (en) * | 2015-12-03 | 2019-08-27 | International Business Machines Corporation | Carbon nanotube device with N-type end-bonded metal contacts |
| CN108091569A (zh) * | 2016-11-23 | 2018-05-29 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件及其制造方法和电子装置 |
| US10985164B1 (en) * | 2019-09-27 | 2021-04-20 | Nanya Technology Corporation | Semiconductor device with nanowire contact and method for fabricating the same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040036128A1 (en) * | 2002-08-23 | 2004-02-26 | Yuegang Zhang | Multi-gate carbon nano-tube transistors |
| US20040192072A1 (en) * | 2003-03-24 | 2004-09-30 | Snow Eric S. | Interconnected networks of single-walled carbon nanotubes |
Family Cites Families (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5962863A (en) | 1993-09-09 | 1999-10-05 | The United States Of America As Represented By The Secretary Of The Navy | Laterally disposed nanostructures of silicon on an insulating substrate |
| JP3460863B2 (ja) * | 1993-09-17 | 2003-10-27 | 三菱電機株式会社 | 半導体装置の製造方法 |
| EP0661733A2 (en) | 1993-12-21 | 1995-07-05 | International Business Machines Corporation | One dimensional silicon quantum wire devices and the method of manufacture thereof |
| US5920078A (en) | 1996-06-20 | 1999-07-06 | Frey; Jeffrey | Optoelectronic device using indirect-bandgap semiconductor material |
| ATE256092T1 (de) * | 1996-07-31 | 2003-12-15 | Shionogi & Co | Neue p-terphenyl verbindungen |
| JPH1197691A (ja) * | 1997-09-18 | 1999-04-09 | Toshiba Corp | 薄膜トランジスタおよび接合構造 |
| KR100277881B1 (ko) | 1998-06-16 | 2001-02-01 | 김영환 | 트랜지스터 |
| US6256767B1 (en) | 1999-03-29 | 2001-07-03 | Hewlett-Packard Company | Demultiplexer for a molecular wire crossbar network (MWCN DEMUX) |
| US6815218B1 (en) | 1999-06-09 | 2004-11-09 | Massachusetts Institute Of Technology | Methods for manufacturing bioelectronic devices |
| EP1194960B1 (en) | 1999-07-02 | 2010-09-15 | President and Fellows of Harvard College | Nanoscopic wire-based devices, arrays, and methods of their manufacture |
| US6438025B1 (en) | 1999-09-08 | 2002-08-20 | Sergei Skarupo | Magnetic memory device |
| ATE494261T1 (de) | 1999-10-27 | 2011-01-15 | Univ Rice William M | Makroskopische geordnete anordnung von kohlenstoffnanoröhren |
| RU2173003C2 (ru) | 1999-11-25 | 2001-08-27 | Септре Электроникс Лимитед | Способ образования кремниевой наноструктуры, решетки кремниевых квантовых проводков и основанных на них устройств |
| KR100360476B1 (ko) | 2000-06-27 | 2002-11-08 | 삼성전자 주식회사 | 탄소나노튜브를 이용한 나노 크기 수직 트랜지스터 및 그제조방법 |
| US6586785B2 (en) | 2000-06-29 | 2003-07-01 | California Institute Of Technology | Aerosol silicon nanoparticles for use in semiconductor device fabrication |
| WO2002003482A1 (de) | 2000-07-04 | 2002-01-10 | Infineon Technologies Ag | Feldeffekttransistor |
| US6447663B1 (en) | 2000-08-01 | 2002-09-10 | Ut-Battelle, Llc | Programmable nanometer-scale electrolytic metal deposition and depletion |
| US7301199B2 (en) | 2000-08-22 | 2007-11-27 | President And Fellows Of Harvard College | Nanoscale wires and related devices |
| EP1314189B1 (en) | 2000-08-22 | 2013-02-27 | President and Fellows of Harvard College | Electrical device comprising doped semiconductor nanowires and method for its production |
| JP3386789B2 (ja) | 2000-09-29 | 2003-03-17 | 富士通カンタムデバイス株式会社 | 半導体装置及びその製造方法 |
| DE10060120B4 (de) * | 2000-12-04 | 2005-12-22 | Gkn Driveline International Gmbh | Kugelgleichlaufgelenk als Gegenbahngelenk |
| WO2002048701A2 (en) | 2000-12-11 | 2002-06-20 | President And Fellows Of Harvard College | Nanosensors |
| US6423583B1 (en) | 2001-01-03 | 2002-07-23 | International Business Machines Corporation | Methodology for electrically induced selective breakdown of nanotubes |
| US6593065B2 (en) | 2001-03-12 | 2003-07-15 | California Institute Of Technology | Method of fabricating nanometer-scale flowchannels and trenches with self-aligned electrodes and the structures formed by the same |
| CN1306619C (zh) | 2001-03-30 | 2007-03-21 | 加利福尼亚大学董事会 | 纳米线以及由其制造的器件 |
| US7084507B2 (en) | 2001-05-02 | 2006-08-01 | Fujitsu Limited | Integrated circuit device and method of producing the same |
| US6787179B2 (en) * | 2001-06-29 | 2004-09-07 | Ethicon, Inc. | Sterilization of bioactive coatings |
| JP2003017508A (ja) | 2001-07-05 | 2003-01-17 | Nec Corp | 電界効果トランジスタ |
| US6896864B2 (en) | 2001-07-10 | 2005-05-24 | Battelle Memorial Institute | Spatial localization of dispersed single walled carbon nanotubes into useful structures |
| US6672925B2 (en) | 2001-08-17 | 2004-01-06 | Motorola, Inc. | Vacuum microelectronic device and method |
| NZ513637A (en) | 2001-08-20 | 2004-02-27 | Canterprise Ltd | Nanoscale electronic devices & fabrication methods |
| JP2005501404A (ja) | 2001-08-30 | 2005-01-13 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 磁気抵抗装置および電子装置 |
| JP2003108021A (ja) | 2001-09-28 | 2003-04-11 | Hitachi Ltd | 表示装置 |
| US7385262B2 (en) * | 2001-11-27 | 2008-06-10 | The Board Of Trustees Of The Leland Stanford Junior University | Band-structure modulation of nano-structures in an electric field |
| US20040005258A1 (en) | 2001-12-12 | 2004-01-08 | Fonash Stephen J. | Chemical reactor templates: sacrificial layer fabrication and template use |
| US7049625B2 (en) | 2002-03-18 | 2006-05-23 | Max-Planck-Gesellschaft Zur Fonderung Der Wissenschaften E.V. | Field effect transistor memory cell, memory device and method for manufacturing a field effect transistor memory cell |
| US6872645B2 (en) | 2002-04-02 | 2005-03-29 | Nanosys, Inc. | Methods of positioning and/or orienting nanostructures |
| US20030189202A1 (en) | 2002-04-05 | 2003-10-09 | Jun Li | Nanowire devices and methods of fabrication |
| US6760245B2 (en) | 2002-05-01 | 2004-07-06 | Hewlett-Packard Development Company, L.P. | Molecular wire crossbar flash memory |
| WO2004010552A1 (en) | 2002-07-19 | 2004-01-29 | President And Fellows Of Harvard College | Nanoscale coherent optical components |
| US7115916B2 (en) | 2002-09-26 | 2006-10-03 | International Business Machines Corporation | System and method for molecular optical emission |
| EP1563555A4 (en) * | 2002-09-30 | 2009-08-26 | Nanosys Inc | APPLICATION OF NANO-PREPARED LARGE-MIXED MACROELECTRONIC SUBSTRATES WITH NANO LINES AND NANO-LEADING COMPOSITIONS |
| US7067867B2 (en) * | 2002-09-30 | 2006-06-27 | Nanosys, Inc. | Large-area nonenabled macroelectronic substrates and uses therefor |
| US7135728B2 (en) * | 2002-09-30 | 2006-11-14 | Nanosys, Inc. | Large-area nanoenabled macroelectronic substrates and uses therefor |
| JP3790238B2 (ja) * | 2002-12-27 | 2006-06-28 | 株式会社東芝 | 半導体装置 |
| US6916195B2 (en) * | 2003-03-26 | 2005-07-12 | Intel Corporation | Land grid array socket loading device |
| US7323730B2 (en) * | 2004-07-21 | 2008-01-29 | Commissariat A L'energie Atomique | Optically-configurable nanotube or nanowire semiconductor device |
| US7473943B2 (en) * | 2004-10-15 | 2009-01-06 | Nanosys, Inc. | Gate configuration for nanowire electronic devices |
-
2005
- 2005-09-22 US US11/233,398 patent/US7473943B2/en not_active Expired - Fee Related
- 2005-10-14 WO PCT/US2005/037237 patent/WO2007030126A2/en not_active Ceased
- 2005-10-14 AU AU2005336130A patent/AU2005336130B2/en not_active Ceased
- 2005-10-14 CA CA2589432A patent/CA2589432C/en not_active Expired - Fee Related
- 2005-10-14 CN CN2005800431389A patent/CN101401210B/zh not_active Expired - Fee Related
- 2005-10-14 EP EP05858523A patent/EP1810340A2/en not_active Withdrawn
- 2005-10-14 KR KR1020077010927A patent/KR20070063597A/ko not_active Ceased
- 2005-10-14 JP JP2007536993A patent/JP2008517468A/ja active Pending
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2008
- 2008-10-02 US US12/244,573 patent/US7701014B2/en not_active Expired - Fee Related
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2010
- 2010-02-09 US US12/703,043 patent/US7871870B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040036128A1 (en) * | 2002-08-23 | 2004-02-26 | Yuegang Zhang | Multi-gate carbon nano-tube transistors |
| US20040192072A1 (en) * | 2003-03-24 | 2004-09-30 | Snow Eric S. | Interconnected networks of single-walled carbon nanotubes |
Non-Patent Citations (1)
| Title |
|---|
| MARTEL ET AL. * |
Also Published As
| Publication number | Publication date |
|---|---|
| US7871870B2 (en) | 2011-01-18 |
| US20090050974A1 (en) | 2009-02-26 |
| US20060081886A1 (en) | 2006-04-20 |
| CA2589432C (en) | 2014-08-05 |
| JP2008517468A (ja) | 2008-05-22 |
| AU2005336130A1 (en) | 2007-03-15 |
| WO2007030126A3 (en) | 2009-04-16 |
| WO2007030126A2 (en) | 2007-03-15 |
| CA2589432A1 (en) | 2007-03-15 |
| WO2007030126A9 (en) | 2007-05-18 |
| US20100144103A1 (en) | 2010-06-10 |
| EP1810340A2 (en) | 2007-07-25 |
| US7701014B2 (en) | 2010-04-20 |
| KR20070063597A (ko) | 2007-06-19 |
| CN101401210A (zh) | 2009-04-01 |
| US7473943B2 (en) | 2009-01-06 |
| CN101401210B (zh) | 2011-05-11 |
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