AU2003293441A1 - Positive imageable thick film compositions - Google Patents

Positive imageable thick film compositions

Info

Publication number
AU2003293441A1
AU2003293441A1 AU2003293441A AU2003293441A AU2003293441A1 AU 2003293441 A1 AU2003293441 A1 AU 2003293441A1 AU 2003293441 A AU2003293441 A AU 2003293441A AU 2003293441 A AU2003293441 A AU 2003293441A AU 2003293441 A1 AU2003293441 A1 AU 2003293441A1
Authority
AU
Australia
Prior art keywords
thick film
film compositions
positive imageable
imageable thick
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003293441A
Other languages
English (en)
Other versions
AU2003293441A8 (en
Inventor
Lap-Tak Andrew Cheng
Young H. Kim
David Herbert Roach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of AU2003293441A1 publication Critical patent/AU2003293441A1/en
Publication of AU2003293441A8 publication Critical patent/AU2003293441A8/xx
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
AU2003293441A 2002-12-06 2003-12-05 Positive imageable thick film compositions Abandoned AU2003293441A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US43139202P 2002-12-06 2002-12-06
US60/431,392 2002-12-06
PCT/US2003/038810 WO2004053593A2 (en) 2002-12-06 2003-12-05 Positive imageable thick film compositions

Publications (2)

Publication Number Publication Date
AU2003293441A1 true AU2003293441A1 (en) 2004-06-30
AU2003293441A8 AU2003293441A8 (en) 2004-06-30

Family

ID=32507722

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003293441A Abandoned AU2003293441A1 (en) 2002-12-06 2003-12-05 Positive imageable thick film compositions

Country Status (7)

Country Link
US (2) US20040170925A1 (enExample)
EP (1) EP1567917A2 (enExample)
JP (1) JP2006510046A (enExample)
KR (1) KR20050084150A (enExample)
CN (1) CN1742233A (enExample)
AU (1) AU2003293441A1 (enExample)
WO (1) WO2004053593A2 (enExample)

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AU2003287660A1 (en) * 2002-11-15 2004-06-15 E.I. Du Pont De Nemours And Company Process for using protective layers in the fabrication of electronic devices
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JP4211782B2 (ja) * 2003-11-25 2009-01-21 株式会社村田製作所 厚膜パターンの形成方法、電子部品の製造方法
US7402373B2 (en) * 2004-02-05 2008-07-22 E.I. Du Pont De Nemours And Company UV radiation blocking protective layers compatible with thick film pastes
KR101042667B1 (ko) * 2004-07-05 2011-06-20 주식회사 동진쎄미켐 포토레지스트 조성물
KR20060090520A (ko) * 2005-02-07 2006-08-11 삼성전자주식회사 감광성 수지 및 상기 감광성 수지로 이루어진 패턴을포함하는 박막 표시판 및 그 제조 방법
US7247419B2 (en) 2005-04-11 2007-07-24 Az Electronic Materials Usa Corp. Nanocomposite photosensitive composition and use thereof
US7524606B2 (en) 2005-04-11 2009-04-28 Az Electronic Materials Usa Corp. Nanocomposite photoresist composition for imaging thick films
JP4861767B2 (ja) 2005-07-26 2012-01-25 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
KR101166016B1 (ko) * 2006-04-26 2012-07-19 삼성에스디아이 주식회사 전자 방출원 형성용 조성물, 이로부터 제조된 전자 방출원및 상기 전자 방출원을 구비한 전자 방출 소자
JP4751773B2 (ja) * 2006-06-09 2011-08-17 太陽ホールディングス株式会社 光硬化性組成物及びそれを用いて形成した焼成物パターン
WO2008065827A1 (fr) * 2006-11-28 2008-06-05 Tokyo Ohka Kogyo Co., Ltd. Composition de résine photosensible de type positif chimiquement amplifié pour film épais, film sec chimiquement amplifié pour film épais, et procédé de fabrication d'un motif de résine photosensible sur film épais
KR101034346B1 (ko) * 2006-12-22 2011-05-16 주식회사 엘지화학 탄소 나노 튜브를 통한 내열성 개선의 감광성 수지 조성물
US8310069B2 (en) * 2007-10-05 2012-11-13 Texas Instruements Incorporated Semiconductor package having marking layer
CN101861282A (zh) * 2007-11-15 2010-10-13 纳幕尔杜邦公司 碳纳米管的保护
US20110012035A1 (en) * 2009-07-15 2011-01-20 Texas Instruments Incorporated Method for Precision Symbolization Using Digital Micromirror Device Technology
US20130189524A1 (en) * 2012-01-19 2013-07-25 Brewer Science Inc. Viscous fugitive polymer-based carbon nanotube coatings
TWI585522B (zh) * 2012-08-31 2017-06-01 富士軟片股份有限公司 感光性樹脂組成物、硬化物及其製造方法、樹脂圖案的製造方法、硬化膜、液晶顯示裝置、有機ｅｌ顯示裝置、以及觸控面板顯示裝置
TW201421154A (zh) * 2012-10-26 2014-06-01 Fujifilm Corp 感光性樹脂組成物、硬化物及其製造方法、樹脂圖案製造方法、硬化膜、有機ｅｌ顯示裝置、液晶顯示裝置以及觸控面板顯示裝置
WO2014150577A1 (en) 2013-03-15 2014-09-25 Sinovia Technologies Photoactive transparent conductive films, method of making them and touch sensitive device comprising said films
JP6564196B2 (ja) * 2014-03-20 2019-08-21 東京応化工業株式会社 厚膜用化学増幅型ポジ型感光性樹脂組成物
US10647028B2 (en) 2017-05-17 2020-05-12 Formlabs, Inc. Techniques for casting from additively fabricated molds and related systems and methods

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Also Published As

Publication number Publication date
KR20050084150A (ko) 2005-08-26
WO2004053593A2 (en) 2004-06-24
WO2004053593A3 (en) 2004-10-28
US20040170925A1 (en) 2004-09-02
EP1567917A2 (en) 2005-08-31
AU2003293441A8 (en) 2004-06-30
JP2006510046A (ja) 2006-03-23
US20080166666A1 (en) 2008-07-10
CN1742233A (zh) 2006-03-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase