AU2003254170A1 - Model and parameter selection for optical metrology - Google Patents

Model and parameter selection for optical metrology

Info

Publication number
AU2003254170A1
AU2003254170A1 AU2003254170A AU2003254170A AU2003254170A1 AU 2003254170 A1 AU2003254170 A1 AU 2003254170A1 AU 2003254170 A AU2003254170 A AU 2003254170A AU 2003254170 A AU2003254170 A AU 2003254170A AU 2003254170 A1 AU2003254170 A1 AU 2003254170A1
Authority
AU
Australia
Prior art keywords
model
parameter selection
optical metrology
metrology
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003254170A
Other languages
English (en)
Other versions
AU2003254170A8 (en
Inventor
Junwei Bao
Srinivas Doddi
Emmanuel Drege
Nickhil Jakatdar
Xinhui Niu
Vi Voung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TEL Timbre Technologies Inc
Original Assignee
TEL Timbre Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TEL Timbre Technologies Inc filed Critical TEL Timbre Technologies Inc
Publication of AU2003254170A1 publication Critical patent/AU2003254170A1/en
Publication of AU2003254170A8 publication Critical patent/AU2003254170A8/xx
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
AU2003254170A 2002-07-25 2003-07-25 Model and parameter selection for optical metrology Abandoned AU2003254170A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/206,491 2002-07-25
US10/206,491 US7330279B2 (en) 2002-07-25 2002-07-25 Model and parameter selection for optical metrology
PCT/US2003/023281 WO2004013723A2 (en) 2002-07-25 2003-07-25 Model and parameter selection for optical metrology

Publications (2)

Publication Number Publication Date
AU2003254170A1 true AU2003254170A1 (en) 2004-02-23
AU2003254170A8 AU2003254170A8 (en) 2004-02-23

Family

ID=30770300

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003254170A Abandoned AU2003254170A1 (en) 2002-07-25 2003-07-25 Model and parameter selection for optical metrology

Country Status (8)

Country Link
US (2) US7330279B2 (enExample)
JP (2) JP2005534192A (enExample)
KR (1) KR101281212B1 (enExample)
CN (1) CN1310011C (enExample)
AU (1) AU2003254170A1 (enExample)
DE (1) DE10392975T5 (enExample)
TW (1) TWI238884B (enExample)
WO (1) WO2004013723A2 (enExample)

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US7505153B2 (en) 2009-03-17
TW200407527A (en) 2004-05-16
CN1672012A (zh) 2005-09-21
US20080151269A1 (en) 2008-06-26
US20040017574A1 (en) 2004-01-29
WO2004013723A2 (en) 2004-02-12
CN1310011C (zh) 2007-04-11
KR101281212B1 (ko) 2013-07-02
DE10392975T5 (de) 2006-01-19
US7330279B2 (en) 2008-02-12
JP2012027032A (ja) 2012-02-09
JP5307862B2 (ja) 2013-10-02
WO2004013723A3 (en) 2004-04-29
TWI238884B (en) 2005-09-01
KR20050021549A (ko) 2005-03-07
AU2003254170A8 (en) 2004-02-23
JP2005534192A (ja) 2005-11-10

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