AU2003207794A1 - Corona-generated chemical vapor deposition on a substrate - Google Patents

Corona-generated chemical vapor deposition on a substrate

Info

Publication number
AU2003207794A1
AU2003207794A1 AU2003207794A AU2003207794A AU2003207794A1 AU 2003207794 A1 AU2003207794 A1 AU 2003207794A1 AU 2003207794 A AU2003207794 A AU 2003207794A AU 2003207794 A AU2003207794 A AU 2003207794A AU 2003207794 A1 AU2003207794 A1 AU 2003207794A1
Authority
AU
Australia
Prior art keywords
substrate
corona discharge
corona
vapor deposition
chemical vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003207794A
Other languages
English (en)
Inventor
Dmitry P. Dinega
Richard T. Fox
Aaron M. Gabelnick
Ing-Feng Hu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Global Technologies LLC
Original Assignee
Dow Global Technologies LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Global Technologies LLC filed Critical Dow Global Technologies LLC
Publication of AU2003207794A1 publication Critical patent/AU2003207794A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Organic Insulating Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polymerisation Methods In General (AREA)
AU2003207794A 2002-02-05 2003-02-03 Corona-generated chemical vapor deposition on a substrate Abandoned AU2003207794A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US35490502P 2002-02-05 2002-02-05
US60/354,905 2002-02-05
US40864002P 2002-09-06 2002-09-06
US60/408,640 2002-09-06
PCT/US2003/003057 WO2003066932A1 (en) 2002-02-05 2003-02-03 Corona-generated chemical vapor deposition on a substrate

Publications (1)

Publication Number Publication Date
AU2003207794A1 true AU2003207794A1 (en) 2003-09-02

Family

ID=27737478

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003207794A Abandoned AU2003207794A1 (en) 2002-02-05 2003-02-03 Corona-generated chemical vapor deposition on a substrate

Country Status (8)

Country Link
US (1) US6815014B2 (https=)
EP (1) EP1472387B1 (https=)
JP (1) JP4494792B2 (https=)
CN (1) CN100432289C (https=)
AT (1) ATE402277T1 (https=)
AU (1) AU2003207794A1 (https=)
DE (1) DE60322347D1 (https=)
WO (1) WO2003066932A1 (https=)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8586149B2 (en) 2003-06-18 2013-11-19 Ford Global Technologies, Llc Environmentally friendly reactive fixture to allow localized surface engineering for improved adhesion to coated and non-coated substrates
BRPI0413769A (pt) * 2003-09-09 2006-10-31 Dow Global Technologies Inc processo para depositar um revestimento em pelìcula sobre a superfìcie exposta de um substrato
DE102004029466A1 (de) * 2004-06-18 2006-01-05 Leybold Optics Gmbh Medieninjektor
CN101031669A (zh) * 2004-09-27 2007-09-05 陶氏环球技术公司 由等离子体增强的化学气相沉积的多层涂层
WO2006049865A1 (en) * 2004-10-29 2006-05-11 Dow Global Technologies Inc. Improved deposition rate plasma enhanced chemical vapor process
CA2582286A1 (en) * 2004-10-29 2006-05-11 Dow Global Technologies Inc. Abrasion resistant coatings by plasma enhanced chemical vapor deposition
CA2622429A1 (en) * 2005-09-20 2007-03-29 Dow Global Technologies Inc. Process for plasma assisted coating a nanocomposite object
US7517561B2 (en) 2005-09-21 2009-04-14 Ford Global Technologies, Llc Method of coating a substrate for adhesive bonding
TWI275658B (en) * 2006-09-13 2007-03-11 Ind Tech Res Inst Method of improving surface frame resistance of a substrate
TW200814170A (en) * 2006-09-13 2008-03-16 Ind Tech Res Inst Method of adjusting surface characteristic of a substrate
EP2183407A1 (en) * 2007-07-30 2010-05-12 Dow Global Technologies Inc. Atmospheric pressure plasma enhanced chemical vapor deposition process
KR100962044B1 (ko) * 2007-12-06 2010-06-08 성균관대학교산학협력단 저유전 플라즈마 중합체 박막 및 그 제조 방법
WO2010092384A1 (en) * 2009-02-12 2010-08-19 Fujifilm Manufacturing Europe Bv Two layer barrier on polymeric substrate
PT2251454E (pt) 2009-05-13 2014-10-01 Sio2 Medical Products Inc Revestimento e inspeção de vaso
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
DE102009030303A1 (de) * 2009-06-24 2010-12-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung von Antireflexschicht-bildenden Beschichtungen sowie Antireflexbeschichtungen
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
WO2011136812A1 (en) 2010-04-30 2011-11-03 Hewlett-Packard Development Company, L.P. Printing system
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
EP2589366A1 (de) * 2011-11-07 2013-05-08 IDT Biologika GmbH Biologisch abbaubare Folienverpackung für orale Biologika
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
CA2855353C (en) 2011-11-11 2021-01-19 Sio2 Medical Products, Inc. Passivation, ph protective or lubricity coating for pharmaceutical package, coating process and apparatus
US8945418B2 (en) * 2011-11-16 2015-02-03 The United States Of America, As Represented By The Secretary Of The Navy Melt stabilization and vapor-phase synthesis of cesium germanium halides
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
CN105392916B (zh) 2013-03-11 2019-03-08 Sio2医药产品公司 涂布包装材料
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
EP2896502B1 (en) * 2014-01-16 2017-03-08 ThyssenKrupp Steel Europe AG Composite sheet and method of manufacturing
WO2015148471A1 (en) 2014-03-28 2015-10-01 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
KR102786617B1 (ko) 2015-08-18 2025-03-26 에스아이오2 메디컬 프로덕츠, 엘엘씨 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
DE102019124489B3 (de) * 2019-09-12 2020-11-12 VON ARDENNE Asset GmbH & Co. KG Vakuumanordnungen, Verfahren und Verwendung einer Elektrode im Vakuum
EP4297619B1 (en) * 2021-03-04 2026-04-29 Yeti Coolers, LLC Surface coating of drinkware

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US424103A (en) * 1890-03-25 Steam-generator
DE3705482A1 (de) * 1987-02-20 1988-09-01 Hoechst Ag Verfahren und anordnung zur oberflaechenvorbehandlung von kunststoff mittels einer elektrischen koronaentladung
GB8713986D0 (en) * 1987-06-16 1987-07-22 Shell Int Research Apparatus for plasma surface treating
NL8701530A (nl) * 1987-06-30 1989-01-16 Stichting Fund Ond Material Werkwijze voor het behandelen van oppervlakken van substraten met behulp van een plasma en reactor voor het uitvoeren van die werkwijze.
US4894352A (en) * 1988-10-26 1990-01-16 Texas Instruments Inc. Deposition of silicon-containing films using organosilicon compounds and nitrogen trifluoride
US5176938A (en) * 1988-11-23 1993-01-05 Plasmacarb Inc. Process for surface treatment of pulverulent material
US5194291A (en) * 1991-04-22 1993-03-16 General Atomics Corona discharge treatment
DE4225106C2 (de) 1992-07-30 1995-10-05 Heraeus Kulzer Gmbh Verfahren und Vorrichtung zur Herstellung eines Metall-Kunststoff-Verbundes
KR960000190B1 (ko) * 1992-11-09 1996-01-03 엘지전자주식회사 반도체 제조방법 및 그 장치
FR2704558B1 (fr) * 1993-04-29 1995-06-23 Air Liquide Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement.
US5456972A (en) * 1993-05-28 1995-10-10 The University Of Tennessee Research Corporation Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure
US6083355A (en) * 1997-07-14 2000-07-04 The University Of Tennessee Research Corporation Electrodes for plasma treater systems
CA2295729A1 (en) * 1997-07-14 1999-01-28 John Lynch Plasma treater systems and treatment methods
US6106659A (en) * 1997-07-14 2000-08-22 The University Of Tennessee Research Corporation Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials
US6082292A (en) * 1999-01-05 2000-07-04 Wisconsin Alumni Research Foundation Sealing roller system for surface treatment gas reactors
US6118218A (en) * 1999-02-01 2000-09-12 Sigma Technologies International, Inc. Steady-state glow-discharge plasma at atmospheric pressure
EP1198610A4 (en) * 1999-05-14 2004-04-07 Univ California LOW TEMPERATURE COMPATIBLE PLASMA FLOW DEVICE WITH LARGE PRESSURE RANGE

Also Published As

Publication number Publication date
US6815014B2 (en) 2004-11-09
EP1472387A1 (en) 2004-11-03
JP2005533174A (ja) 2005-11-04
JP4494792B2 (ja) 2010-06-30
DE60322347D1 (de) 2008-09-04
US20040091637A1 (en) 2004-05-13
CN100432289C (zh) 2008-11-12
WO2003066932A1 (en) 2003-08-14
EP1472387B1 (en) 2008-07-23
HK1072279A1 (en) 2005-08-19
CN1628187A (zh) 2005-06-15
ATE402277T1 (de) 2008-08-15

Similar Documents

Publication Publication Date Title
AU2003207794A1 (en) Corona-generated chemical vapor deposition on a substrate
DE602004018517D1 (de) Abscheideverfahren mit einem thermischen plasma das mit einer ersetzbaren platte expandiert wird
WO2005043623A3 (de) Verfahren zum ausbilden eines dielektrikums auf einer kupferhaltigen metallisierung und kondensatoranordnung
WO2004030020A3 (en) Upper electrode plate with deposition shield in a plasma processing system
MXPA06002679A (es) Deposicion de vapor quimico generado por descarga de brillo.
SG149680A1 (en) Film formation apparatus and film formation method and cleaning method
MX2011007156A (es) Sustrato hidrofobo comprendiendo una capa de cebador del tipo oxicarburo de silicio activado por plasma.
ATE256763T1 (de) Verfahren und vorrichtung zum beschichten mittels bogenentladung
WO2004059027A3 (en) Ionic plasma deposition of anti-microbial surfaces and the anti-microbial surfaces resulting therefrom
WO2010045153A3 (en) Method for depositing conformal amorphous carbon film by plasma-enhanced chemical vapor deposition (pecvd)
EP0936284A3 (en) Method and apparatus for producing thin films
WO2004013376A3 (en) Titania coatings by plasma cvd at atmospheric pressure
WO2006078719A3 (en) Interface engineering to improve adhesion between low k stacks
US9229478B2 (en) Housing and electronic device using the same
TW200605196A (en) Improved deposition repeatability of PECVD films
WO2007124879A3 (de) Vorrichtung und verfahren zur homogenen pvd-beschichtung
WO2007027350A3 (en) Method of removing surface deposits and passivating interior surfaces of the interior of a chemical vapour deposition (cvd) chamber
WO2005021832A3 (en) Method and appartus for depositing materials with tunable properties
TW200633056A (en) Improved deposition rate plasma enhanced chemical vapor process
ATE374168T1 (de) Verfahren zur abscheidung von galliumoxidbeschichtungen auf flachglas
WO2006022905A3 (en) Discharge-enhanced atmospheric pressure chemical vapor deposition
EP1122336A3 (en) Apparatus and method for forming a deposited film by means of plasma CVD
JPH03183781A (ja) 薄膜被着方法及び装置
EP1990443A3 (en) Method and apparatus for DC plasma assisted chemical vapor deposition in the absence of a positive column, and diamond thin film fabricated thereby
TW200745370A (en) Method for depositing Ti film

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase