AU2001293260A1 - Electrode for glow-discharge atmospheric plasma treatment - Google Patents

Electrode for glow-discharge atmospheric plasma treatment

Info

Publication number
AU2001293260A1
AU2001293260A1 AU2001293260A AU9326001A AU2001293260A1 AU 2001293260 A1 AU2001293260 A1 AU 2001293260A1 AU 2001293260 A AU2001293260 A AU 2001293260A AU 9326001 A AU9326001 A AU 9326001A AU 2001293260 A1 AU2001293260 A1 AU 2001293260A1
Authority
AU
Australia
Prior art keywords
glow
electrode
plasma treatment
atmospheric plasma
discharge atmospheric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001293260A
Other languages
English (en)
Inventor
Wolfgang Decker
Michael G. Mikhael
Shahid A Pirzada
Angelo Yializis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sigma Technologies International Inc
Original Assignee
Sigma Technologies International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sigma Technologies International Inc filed Critical Sigma Technologies International Inc
Publication of AU2001293260A1 publication Critical patent/AU2001293260A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2425—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being flush with the dielectric

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AU2001293260A 2000-09-12 2001-09-06 Electrode for glow-discharge atmospheric plasma treatment Abandoned AU2001293260A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09660003 2000-09-12
US09/660,003 US6441553B1 (en) 1999-02-01 2000-09-12 Electrode for glow-discharge atmospheric-pressure plasma treatment
PCT/US2001/042079 WO2002023960A1 (en) 2000-09-12 2001-09-06 Electrode for glow-discharge atmospheric plasma treatment

Publications (1)

Publication Number Publication Date
AU2001293260A1 true AU2001293260A1 (en) 2002-03-26

Family

ID=24647726

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001293260A Abandoned AU2001293260A1 (en) 2000-09-12 2001-09-06 Electrode for glow-discharge atmospheric plasma treatment

Country Status (5)

Country Link
US (1) US6441553B1 (https=)
EP (1) EP1323338A4 (https=)
JP (1) JP2004509432A (https=)
AU (1) AU2001293260A1 (https=)
WO (1) WO2002023960A1 (https=)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7067405B2 (en) * 1999-02-01 2006-06-27 Sigma Laboratories Of Arizona, Inc. Atmospheric glow discharge with concurrent coating deposition
US6774018B2 (en) * 1999-02-01 2004-08-10 Sigma Laboratories Of Arizona, Inc. Barrier coatings produced by atmospheric glow discharge
JP2001288572A (ja) * 2000-01-31 2001-10-19 Canon Inc 堆積膜形成装置および堆積膜形成方法
KR100421480B1 (ko) * 2001-06-01 2004-03-12 엘지.필립스 엘시디 주식회사 유기절연막의 표면처리 방법 및 그를 이용한박막트랜지스터 기판 제조방법
EP1441576B1 (en) * 2001-10-22 2011-12-21 Shibaura Mechatronics Corporation Method for detecting an arc in a glow discharg apparatus and high-frequency arc discharge suppressor
US7887889B2 (en) * 2001-12-14 2011-02-15 3M Innovative Properties Company Plasma fluorination treatment of porous materials
DE10211976A1 (de) * 2002-03-19 2003-10-02 Bosch Gmbh Robert Verfahren und Vorrichtung zumindest zur Sterilisation von Behältnissen und/oder deren Verschließelementen
WO2003093526A2 (de) * 2002-04-29 2003-11-13 Fachhochschule Hildesheim/Holzmin Den/Göttingen Verfahren und vorrichtung zur behandlung der äusseren oberfläche eines metalldrahts, insbesondere als beschichtungsvorbehandlung .
US7288204B2 (en) 2002-07-19 2007-10-30 Fuji Photo Film B.V. Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
US6909237B1 (en) * 2002-07-25 2005-06-21 The Regents Of The University Of California Production of stable, non-thermal atmospheric pressure rf capacitive plasmas using gases other than helium or neon
WO2004021748A1 (ja) * 2002-08-30 2004-03-11 Sekisui Chemical Co., Ltd. プラズマ処理装置
EP1403902A1 (en) * 2002-09-30 2004-03-31 Fuji Photo Film B.V. Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)
JP4233348B2 (ja) * 2003-02-24 2009-03-04 シャープ株式会社 プラズマプロセス装置
US20040258547A1 (en) * 2003-04-02 2004-12-23 Kurt Burger Pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material, and a device and method for coating an object of elastomeric material
WO2004090931A2 (en) * 2003-04-10 2004-10-21 Bae Systems Plc Method and apparatus for treating a surface using a plasma discharge
KR101002335B1 (ko) 2003-10-08 2010-12-17 엘지디스플레이 주식회사 상압 플라즈마 처리 장치
JP2007512436A (ja) * 2003-11-20 2007-05-17 アピト コープ．エス．アー． プラズマ薄膜堆積方法
US20060054279A1 (en) * 2004-09-10 2006-03-16 Yunsang Kim Apparatus for the optimization of atmospheric plasma in a processing system
DE102004043967B4 (de) * 2004-09-11 2010-01-07 Roth & Rau Ag Anordnung und Verfahren zur Plasmabehandlung eines Substrates
US7855513B2 (en) * 2004-09-28 2010-12-21 Old Dominion University Research Foundation Device and method for gas treatment using pulsed corona discharges
DE102004049783B4 (de) * 2004-10-12 2009-03-19 Je Plasmaconsult Gmbh Vorrichtung zur Bearbeitung von Gütern unter Zuhilfenahme einer elektrischen Entladung
SK287455B6 (sk) 2006-06-08 2010-10-07 Fakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Ho Zariadenie a spôsob čistenia, leptania, aktivácie a následné úpravy povrchu skla, povrchu skla pokrytého kysličníkmi kovov a povrchu iných materiálov pokrytých SiO2
US20100009098A1 (en) * 2006-10-03 2010-01-14 Hua Bai Atmospheric pressure plasma electrode
WO2008042128A1 (en) * 2006-10-03 2008-04-10 Dow Global Technologies, Inc. Improved plasma electrode
SK51082006A3 (sk) * 2006-12-05 2008-07-07 Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov
EP1944406A1 (en) 2007-01-10 2008-07-16 Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO Method and apparatus for treating an elongated object with plasma
ITBO20070306A1 (it) 2007-04-26 2008-10-27 Tecnotessile Societa Naz Di Ricerca ... Elettrodo e relativo apparato per la generazione di plasma a pressione atmosferica.
CN101679655A (zh) * 2007-05-21 2010-03-24 陶氏环球技术公司 涂布物体
WO2008147184A2 (en) * 2007-05-25 2008-12-04 Fujifilm Manufacturing Europe B.V. Atmospheric pressure glow discharge plasma method and system using heated substrate
US20100255216A1 (en) * 2007-11-29 2010-10-07 Haley Jr Robert P Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
US20090142511A1 (en) * 2007-11-29 2009-06-04 Haley Jr Robert P Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
KR100974566B1 (ko) * 2008-08-08 2010-08-06 한국생산기술연구원 상압 플라즈마 장치
EP2180768A1 (en) * 2008-10-23 2010-04-28 TNO Nederlandse Organisatie voor Toegepast Wetenschappelijk Onderzoek Apparatus and method for treating an object
US9120073B2 (en) * 2009-06-05 2015-09-01 Eon Labs, Llc Distributed dielectric barrier discharge reactor
MX2012007950A (es) * 2010-01-06 2012-08-01 Dow Global Technologies Llc Dispositivos fotovoltaicos resistentes a la humedad con capa de proteccion elastomerica de polisiloxano.
DE102011000261A1 (de) * 2011-01-21 2012-07-26 Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen Dielektrische Koplanarentladungsquelle für eine Oberflächenbehandlung unter Atmosphärendruck
KR102124042B1 (ko) * 2013-02-18 2020-06-18 삼성디스플레이 주식회사 기상 증착 장치, 이를 이용한 증착 방법 및 유기 발광 표시 장치 제조 방법
MY183557A (en) * 2013-03-15 2021-02-26 Toray Industries Plasma cvd device and plasma cvd method
US9666415B2 (en) * 2015-02-11 2017-05-30 Ford Global Technologies, Llc Heated air plasma treatment
DE102015108884A1 (de) 2015-06-04 2016-12-08 Hochschule für Angewandte Wissenschaft und Kunst - Hildesheim/Holzminden/Göttingen Vorrichtung zur Plasmabehandlung von insbesondere bandförmigen Objekten
US10882021B2 (en) 2015-10-01 2021-01-05 Ion Inject Technology Llc Plasma reactor for liquid and gas and method of use
EP4226999A3 (en) 2015-10-01 2023-09-06 Milton Roy, LLC Plasma reactor for liquid and gas and related methods
US12296313B2 (en) 2015-10-01 2025-05-13 Milton Roy, Llc System and method for formulating medical treatment effluents
US11452982B2 (en) 2015-10-01 2022-09-27 Milton Roy, Llc Reactor for liquid and gas and method of use
US10187968B2 (en) 2015-10-08 2019-01-22 Ion Inject Technology Llc Quasi-resonant plasma voltage generator
US10046300B2 (en) 2015-12-09 2018-08-14 Ion Inject Technology Llc Membrane plasma reactor
CN109790313A (zh) 2016-09-30 2019-05-21 简·探针公司 经等离子体处理的表面上的组合物
US11239057B2 (en) * 2017-07-28 2022-02-01 Sumitomo Electric Industries, Ltd. Showerhead and method for manufacturing the same
JP2021132148A (ja) * 2020-02-20 2021-09-09 東京エレクトロン株式会社 ステージ、プラズマ処理装置及びプラズマ処理方法
EP4320654A4 (en) 2021-04-09 2025-06-11 Applied Materials, Inc. PRETREATMENT AND POSTTREATMENT OF ELECTRODE SURFACES
JP7589661B2 (ja) * 2021-09-10 2024-11-26 ウシオ電機株式会社 誘電体バリア放電式プラズマ発生装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4626876A (en) * 1984-01-25 1986-12-02 Ricoh Company, Ltd. Solid state corona discharger
US5414324A (en) 1993-05-28 1995-05-09 The University Of Tennessee Research Corporation One atmosphere, uniform glow discharge plasma
US5387842A (en) * 1993-05-28 1995-02-07 The University Of Tennessee Research Corp. Steady-state, glow discharge plasma
US5456972A (en) 1993-05-28 1995-10-10 The University Of Tennessee Research Corporation Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure
US5669583A (en) 1994-06-06 1997-09-23 University Of Tennessee Research Corporation Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof
US5403453A (en) 1993-05-28 1995-04-04 The University Of Tennessee Research Corporation Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure
US5558843A (en) 1994-09-01 1996-09-24 Eastman Kodak Company Near atmospheric pressure treatment of polymers using helium discharges
JPH08279495A (ja) * 1995-02-07 1996-10-22 Seiko Epson Corp プラズマ処理装置及びその方法
US5714308A (en) 1996-02-13 1998-02-03 Eastman Kodak Company Atmospheric pressure glow discharge treatment of polymeric supports to promote adhesion for photographic applications
CA2205817C (en) * 1996-05-24 2004-04-06 Sekisui Chemical Co., Ltd. Treatment method in glow-discharge plasma and apparatus thereof
US6110540A (en) * 1996-07-12 2000-08-29 The Boc Group, Inc. Plasma apparatus and method
US5789145A (en) 1996-07-23 1998-08-04 Eastman Kodak Company Atmospheric pressure glow discharge treatment of base material for photographic applications
US6423924B1 (en) * 1998-03-10 2002-07-23 Tepla Ag Method for treating the surface of a material or an object and implementing device
DE69929271T2 (de) * 1998-10-26 2006-09-21 Matsushita Electric Works, Ltd., Kadoma Apparat und Verfahren zur Plasmabehandlung
US6118218A (en) * 1999-02-01 2000-09-12 Sigma Technologies International, Inc. Steady-state glow-discharge plasma at atmospheric pressure

Also Published As

Publication number Publication date
US6441553B1 (en) 2002-08-27
JP2004509432A (ja) 2004-03-25
EP1323338A1 (en) 2003-07-02
EP1323338A4 (en) 2008-08-20
WO2002023960A1 (en) 2002-03-21

Similar Documents

Publication Publication Date Title
AU2001293260A1 (en) Electrode for glow-discharge atmospheric plasma treatment
AU2976200A (en) Atmospheric steady-state glow-discharge plasma
AU2001271030A1 (en) Plasma processing apparatus
AU2002332421A1 (en) Plasma ashing process
AUPQ861500A0 (en) Plasma source for spectrometry
AU2002358315A1 (en) Plasma process apparatus
AU2001291945A1 (en) Plasma sterilisation system
AU4856299A (en) Electrode for plasma processes and method for manufacture and use thereof
AU2002366086A1 (en) Ionic plasma deposition apparatus
AU7570900A (en) Atmospheric-pressure plasma decontamination/sterilization chamber
AU2003203127A1 (en) Vacuum plasma generator
SG108942A1 (en) Vacuum arc vapor deposition apparatus
AU4630500A (en) Carbon plasma pulsed source
AU2003222492A1 (en) Plasma sterilizer apparatus
AU2001238188A1 (en) Multi-zone rf electrode for capacitive plasma sources
AU3926901A (en) High frequency plasma source
AU2001237845A1 (en) Plasma ion source and method
AU2001270163A1 (en) Vacuum plasma processor apparatus and method
AU2002223088A1 (en) Chemical plasma cathode
AU2002340316A1 (en) Plasma chemical vapor deposition methods and apparatus
AU2002220907A1 (en) Plasma reactor gas processing
AU2002228821A1 (en) Plasma treated porous film
AUPP979099A0 (en) Ioniser for effluent gas
AU2001273537A1 (en) Improved electrode for plasma processing system
AU5544200A (en) Plasma assisted gas processing