JP2004509432A - グロー放電プラズマ処理装置及びグロー放電プラズマ処理方法 - Google Patents

グロー放電プラズマ処理装置及びグロー放電プラズマ処理方法 Download PDF

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Publication number
JP2004509432A
JP2004509432A JP2002526807A JP2002526807A JP2004509432A JP 2004509432 A JP2004509432 A JP 2004509432A JP 2002526807 A JP2002526807 A JP 2002526807A JP 2002526807 A JP2002526807 A JP 2002526807A JP 2004509432 A JP2004509432 A JP 2004509432A
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Japan
Prior art keywords
glow discharge
discharge plasma
electrode
processing apparatus
plasma
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JP2002526807A
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English (en)
Japanese (ja)
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JP2004509432A5 (https=
Inventor
ヤリツィス，アンジェロ
デッカー，ウォルフガング
ミカエル，ミッシェル　Ｇ．
ピルザダ，シャヒド　Ａ．
Original Assignee
シグマ　テクノロジーズ　インターナショナル，インコーポレイティド
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Publication of JP2004509432A publication Critical patent/JP2004509432A/ja
Publication of JP2004509432A5 publication Critical patent/JP2004509432A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2425—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being flush with the dielectric
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2002526807A 2000-09-12 2001-09-06 グロー放電プラズマ処理装置及びグロー放電プラズマ処理方法 Pending JP2004509432A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/660,003 US6441553B1 (en) 1999-02-01 2000-09-12 Electrode for glow-discharge atmospheric-pressure plasma treatment
PCT/US2001/042079 WO2002023960A1 (en) 2000-09-12 2001-09-06 Electrode for glow-discharge atmospheric plasma treatment

Publications (2)

Publication Number Publication Date
JP2004509432A true JP2004509432A (ja) 2004-03-25
JP2004509432A5 JP2004509432A5 (https=) 2005-04-21

Family

ID=24647726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002526807A Pending JP2004509432A (ja) 2000-09-12 2001-09-06 グロー放電プラズマ処理装置及びグロー放電プラズマ処理方法

Country Status (5)

Country Link
US (1) US6441553B1 (https=)
EP (1) EP1323338A4 (https=)
JP (1) JP2004509432A (https=)
AU (1) AU2001293260A1 (https=)
WO (1) WO2002023960A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240381517A1 (en) * 2021-09-10 2024-11-14 Ushio Denki Kabushiki Kaisha Dielectric barrier discharge plasma generator

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7067405B2 (en) * 1999-02-01 2006-06-27 Sigma Laboratories Of Arizona, Inc. Atmospheric glow discharge with concurrent coating deposition
US6774018B2 (en) * 1999-02-01 2004-08-10 Sigma Laboratories Of Arizona, Inc. Barrier coatings produced by atmospheric glow discharge
JP2001288572A (ja) * 2000-01-31 2001-10-19 Canon Inc 堆積膜形成装置および堆積膜形成方法
KR100421480B1 (ko) * 2001-06-01 2004-03-12 엘지.필립스 엘시디 주식회사 유기절연막의 표면처리 방법 및 그를 이용한박막트랜지스터 기판 제조방법
EP1441576B1 (en) * 2001-10-22 2011-12-21 Shibaura Mechatronics Corporation Method for detecting an arc in a glow discharg apparatus and high-frequency arc discharge suppressor
US7887889B2 (en) * 2001-12-14 2011-02-15 3M Innovative Properties Company Plasma fluorination treatment of porous materials
DE10211976A1 (de) * 2002-03-19 2003-10-02 Bosch Gmbh Robert Verfahren und Vorrichtung zumindest zur Sterilisation von Behältnissen und/oder deren Verschließelementen
WO2003093526A2 (de) * 2002-04-29 2003-11-13 Fachhochschule Hildesheim/Holzmin Den/Göttingen Verfahren und vorrichtung zur behandlung der äusseren oberfläche eines metalldrahts, insbesondere als beschichtungsvorbehandlung .
US7288204B2 (en) 2002-07-19 2007-10-30 Fuji Photo Film B.V. Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
US6909237B1 (en) * 2002-07-25 2005-06-21 The Regents Of The University Of California Production of stable, non-thermal atmospheric pressure rf capacitive plasmas using gases other than helium or neon
WO2004021748A1 (ja) * 2002-08-30 2004-03-11 Sekisui Chemical Co., Ltd. プラズマ処理装置
EP1403902A1 (en) * 2002-09-30 2004-03-31 Fuji Photo Film B.V. Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)
JP4233348B2 (ja) * 2003-02-24 2009-03-04 シャープ株式会社 プラズマプロセス装置
US20040258547A1 (en) * 2003-04-02 2004-12-23 Kurt Burger Pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material, and a device and method for coating an object of elastomeric material
WO2004090931A2 (en) * 2003-04-10 2004-10-21 Bae Systems Plc Method and apparatus for treating a surface using a plasma discharge
KR101002335B1 (ko) 2003-10-08 2010-12-17 엘지디스플레이 주식회사 상압 플라즈마 처리 장치
JP2007512436A (ja) * 2003-11-20 2007-05-17 アピト コープ．エス．アー． プラズマ薄膜堆積方法
US20060054279A1 (en) * 2004-09-10 2006-03-16 Yunsang Kim Apparatus for the optimization of atmospheric plasma in a processing system
DE102004043967B4 (de) * 2004-09-11 2010-01-07 Roth & Rau Ag Anordnung und Verfahren zur Plasmabehandlung eines Substrates
US7855513B2 (en) * 2004-09-28 2010-12-21 Old Dominion University Research Foundation Device and method for gas treatment using pulsed corona discharges
DE102004049783B4 (de) * 2004-10-12 2009-03-19 Je Plasmaconsult Gmbh Vorrichtung zur Bearbeitung von Gütern unter Zuhilfenahme einer elektrischen Entladung
SK287455B6 (sk) 2006-06-08 2010-10-07 Fakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Ho Zariadenie a spôsob čistenia, leptania, aktivácie a následné úpravy povrchu skla, povrchu skla pokrytého kysličníkmi kovov a povrchu iných materiálov pokrytých SiO2
US20100009098A1 (en) * 2006-10-03 2010-01-14 Hua Bai Atmospheric pressure plasma electrode
WO2008042128A1 (en) * 2006-10-03 2008-04-10 Dow Global Technologies, Inc. Improved plasma electrode
SK51082006A3 (sk) * 2006-12-05 2008-07-07 Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov
EP1944406A1 (en) 2007-01-10 2008-07-16 Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO Method and apparatus for treating an elongated object with plasma
ITBO20070306A1 (it) 2007-04-26 2008-10-27 Tecnotessile Societa Naz Di Ricerca ... Elettrodo e relativo apparato per la generazione di plasma a pressione atmosferica.
CN101679655A (zh) * 2007-05-21 2010-03-24 陶氏环球技术公司 涂布物体
WO2008147184A2 (en) * 2007-05-25 2008-12-04 Fujifilm Manufacturing Europe B.V. Atmospheric pressure glow discharge plasma method and system using heated substrate
US20100255216A1 (en) * 2007-11-29 2010-10-07 Haley Jr Robert P Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
US20090142511A1 (en) * 2007-11-29 2009-06-04 Haley Jr Robert P Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
KR100974566B1 (ko) * 2008-08-08 2010-08-06 한국생산기술연구원 상압 플라즈마 장치
EP2180768A1 (en) * 2008-10-23 2010-04-28 TNO Nederlandse Organisatie voor Toegepast Wetenschappelijk Onderzoek Apparatus and method for treating an object
US9120073B2 (en) * 2009-06-05 2015-09-01 Eon Labs, Llc Distributed dielectric barrier discharge reactor
MX2012007950A (es) * 2010-01-06 2012-08-01 Dow Global Technologies Llc Dispositivos fotovoltaicos resistentes a la humedad con capa de proteccion elastomerica de polisiloxano.
DE102011000261A1 (de) * 2011-01-21 2012-07-26 Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen Dielektrische Koplanarentladungsquelle für eine Oberflächenbehandlung unter Atmosphärendruck
KR102124042B1 (ko) * 2013-02-18 2020-06-18 삼성디스플레이 주식회사 기상 증착 장치, 이를 이용한 증착 방법 및 유기 발광 표시 장치 제조 방법
MY183557A (en) * 2013-03-15 2021-02-26 Toray Industries Plasma cvd device and plasma cvd method
US9666415B2 (en) * 2015-02-11 2017-05-30 Ford Global Technologies, Llc Heated air plasma treatment
DE102015108884A1 (de) 2015-06-04 2016-12-08 Hochschule für Angewandte Wissenschaft und Kunst - Hildesheim/Holzminden/Göttingen Vorrichtung zur Plasmabehandlung von insbesondere bandförmigen Objekten
US10882021B2 (en) 2015-10-01 2021-01-05 Ion Inject Technology Llc Plasma reactor for liquid and gas and method of use
EP4226999A3 (en) 2015-10-01 2023-09-06 Milton Roy, LLC Plasma reactor for liquid and gas and related methods
US12296313B2 (en) 2015-10-01 2025-05-13 Milton Roy, Llc System and method for formulating medical treatment effluents
US11452982B2 (en) 2015-10-01 2022-09-27 Milton Roy, Llc Reactor for liquid and gas and method of use
US10187968B2 (en) 2015-10-08 2019-01-22 Ion Inject Technology Llc Quasi-resonant plasma voltage generator
US10046300B2 (en) 2015-12-09 2018-08-14 Ion Inject Technology Llc Membrane plasma reactor
CN109790313A (zh) 2016-09-30 2019-05-21 简·探针公司 经等离子体处理的表面上的组合物
US11239057B2 (en) * 2017-07-28 2022-02-01 Sumitomo Electric Industries, Ltd. Showerhead and method for manufacturing the same
JP2021132148A (ja) * 2020-02-20 2021-09-09 東京エレクトロン株式会社 ステージ、プラズマ処理装置及びプラズマ処理方法
EP4320654A4 (en) 2021-04-09 2025-06-11 Applied Materials, Inc. PRETREATMENT AND POSTTREATMENT OF ELECTRODE SURFACES

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4626876A (en) * 1984-01-25 1986-12-02 Ricoh Company, Ltd. Solid state corona discharger
US5414324A (en) 1993-05-28 1995-05-09 The University Of Tennessee Research Corporation One atmosphere, uniform glow discharge plasma
US5387842A (en) * 1993-05-28 1995-02-07 The University Of Tennessee Research Corp. Steady-state, glow discharge plasma
US5456972A (en) 1993-05-28 1995-10-10 The University Of Tennessee Research Corporation Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure
US5669583A (en) 1994-06-06 1997-09-23 University Of Tennessee Research Corporation Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof
US5403453A (en) 1993-05-28 1995-04-04 The University Of Tennessee Research Corporation Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure
US5558843A (en) 1994-09-01 1996-09-24 Eastman Kodak Company Near atmospheric pressure treatment of polymers using helium discharges
JPH08279495A (ja) * 1995-02-07 1996-10-22 Seiko Epson Corp プラズマ処理装置及びその方法
US5714308A (en) 1996-02-13 1998-02-03 Eastman Kodak Company Atmospheric pressure glow discharge treatment of polymeric supports to promote adhesion for photographic applications
CA2205817C (en) * 1996-05-24 2004-04-06 Sekisui Chemical Co., Ltd. Treatment method in glow-discharge plasma and apparatus thereof
US6110540A (en) * 1996-07-12 2000-08-29 The Boc Group, Inc. Plasma apparatus and method
US5789145A (en) 1996-07-23 1998-08-04 Eastman Kodak Company Atmospheric pressure glow discharge treatment of base material for photographic applications
US6423924B1 (en) * 1998-03-10 2002-07-23 Tepla Ag Method for treating the surface of a material or an object and implementing device
DE69929271T2 (de) * 1998-10-26 2006-09-21 Matsushita Electric Works, Ltd., Kadoma Apparat und Verfahren zur Plasmabehandlung
US6118218A (en) * 1999-02-01 2000-09-12 Sigma Technologies International, Inc. Steady-state glow-discharge plasma at atmospheric pressure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240381517A1 (en) * 2021-09-10 2024-11-14 Ushio Denki Kabushiki Kaisha Dielectric barrier discharge plasma generator
US12432841B2 (en) * 2021-09-10 2025-09-30 Ushio Denki Kabushiki Kaisha Dielectric barrier discharge plasma generator

Also Published As

Publication number Publication date
US6441553B1 (en) 2002-08-27
EP1323338A1 (en) 2003-07-02
EP1323338A4 (en) 2008-08-20
AU2001293260A1 (en) 2002-03-26
WO2002023960A1 (en) 2002-03-21

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