AU2001293260A1 - Electrode for glow-discharge atmospheric plasma treatment - Google Patents

Electrode for glow-discharge atmospheric plasma treatment

Info

Publication number
AU2001293260A1
AU2001293260A1 AU2001293260A AU9326001A AU2001293260A1 AU 2001293260 A1 AU2001293260 A1 AU 2001293260A1 AU 2001293260 A AU2001293260 A AU 2001293260A AU 9326001 A AU9326001 A AU 9326001A AU 2001293260 A1 AU2001293260 A1 AU 2001293260A1
Authority
AU
Australia
Prior art keywords
glow
electrode
plasma treatment
atmospheric plasma
discharge atmospheric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001293260A
Inventor
Wolfgang Decker
Michael G. Mikhael
Shahid A Pirzada
Angelo Yializis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sigma Technologies International Inc
Original Assignee
Sigma Technologies International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sigma Technologies International Inc filed Critical Sigma Technologies International Inc
Publication of AU2001293260A1 publication Critical patent/AU2001293260A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2425—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being flush with the dielectric

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AU2001293260A 2000-09-12 2001-09-06 Electrode for glow-discharge atmospheric plasma treatment Abandoned AU2001293260A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/660,003 US6441553B1 (en) 1999-02-01 2000-09-12 Electrode for glow-discharge atmospheric-pressure plasma treatment
US09660003 2000-09-12
PCT/US2001/042079 WO2002023960A1 (en) 2000-09-12 2001-09-06 Electrode for glow-discharge atmospheric plasma treatment

Publications (1)

Publication Number Publication Date
AU2001293260A1 true AU2001293260A1 (en) 2002-03-26

Family

ID=24647726

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001293260A Abandoned AU2001293260A1 (en) 2000-09-12 2001-09-06 Electrode for glow-discharge atmospheric plasma treatment

Country Status (5)

Country Link
US (1) US6441553B1 (en)
EP (1) EP1323338A4 (en)
JP (1) JP2004509432A (en)
AU (1) AU2001293260A1 (en)
WO (1) WO2002023960A1 (en)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6774018B2 (en) * 1999-02-01 2004-08-10 Sigma Laboratories Of Arizona, Inc. Barrier coatings produced by atmospheric glow discharge
US7067405B2 (en) * 1999-02-01 2006-06-27 Sigma Laboratories Of Arizona, Inc. Atmospheric glow discharge with concurrent coating deposition
JP2001288572A (en) * 2000-01-31 2001-10-19 Canon Inc Deposited film forming equipment and the method therefor
KR100421480B1 (en) * 2001-06-01 2004-03-12 엘지.필립스 엘시디 주식회사 Method for Processing Surface of Organic Isolation Film and Method of Fabricating Thin Film Transistor Substate using the same
EP2194566B1 (en) * 2001-10-22 2012-05-09 Shibaura Mechatronics Corporation Method for judging arc of glow discharger and high-frequency arc discharge suppressor
US7887889B2 (en) * 2001-12-14 2011-02-15 3M Innovative Properties Company Plasma fluorination treatment of porous materials
DE10211976A1 (en) * 2002-03-19 2003-10-02 Bosch Gmbh Robert Method and device at least for the sterilization of containers and / or their closing elements
DE50307658D1 (en) * 2002-04-29 2007-08-23 Fh Hildesheim Holzminden Goe METHOD AND DEVICE FOR TREATING THE OUTER SURFACE OF A METAL WIRE, ESPECIALLY AS A COATING TREATMENT
US7288204B2 (en) * 2002-07-19 2007-10-30 Fuji Photo Film B.V. Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
US6909237B1 (en) * 2002-07-25 2005-06-21 The Regents Of The University Of California Production of stable, non-thermal atmospheric pressure rf capacitive plasmas using gases other than helium or neon
WO2004021748A1 (en) * 2002-08-30 2004-03-11 Sekisui Chemical Co., Ltd. Plasma processing system
EP1403902A1 (en) * 2002-09-30 2004-03-31 Fuji Photo Film B.V. Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)
JP4233348B2 (en) * 2003-02-24 2009-03-04 シャープ株式会社 Plasma process equipment
US20040258547A1 (en) * 2003-04-02 2004-12-23 Kurt Burger Pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material, and a device and method for coating an object of elastomeric material
WO2004090931A2 (en) * 2003-04-10 2004-10-21 Bae Systems Plc Method and apparatus for treating a surface using a plasma discharge
KR101002335B1 (en) 2003-10-08 2010-12-17 엘지디스플레이 주식회사 System for Atmospheric Pressure Plasma
EP1689908B1 (en) * 2003-11-20 2012-09-05 Apit Corp. SA Plasma thin-film deposition apparatus
US20060054279A1 (en) * 2004-09-10 2006-03-16 Yunsang Kim Apparatus for the optimization of atmospheric plasma in a processing system
DE102004043967B4 (en) * 2004-09-11 2010-01-07 Roth & Rau Ag Arrangement and method for plasma treatment of a substrate
US7855513B2 (en) * 2004-09-28 2010-12-21 Old Dominion University Research Foundation Device and method for gas treatment using pulsed corona discharges
DE102004049783B4 (en) * 2004-10-12 2009-03-19 Je Plasmaconsult Gmbh Apparatus for processing goods with the aid of an electrical discharge
SK287455B6 (en) 2006-06-08 2010-10-07 Fakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Ho Device and method for cleaning, etching, activation and further treatment of glass surface coated with metal oxides and of other materials coated with SiO2
EP2074644A1 (en) * 2006-10-03 2009-07-01 Dow Global Technologies Inc. Improved plasma electrode
US20100009098A1 (en) * 2006-10-03 2010-01-14 Hua Bai Atmospheric pressure plasma electrode
SK51082006A3 (en) * 2006-12-05 2008-07-07 Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho Apparatus and treatment method of surface of metals and metalloids, oxides of metals and oxides of metalloids and nitrides of metalloids
EP1944406A1 (en) 2007-01-10 2008-07-16 Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO Method and apparatus for treating an elongated object with plasma
ITBO20070306A1 (en) 2007-04-26 2008-10-27 Tecnotessile Societa Naz Di Ricerca ... ELECTRODE AND ITS APPARATUS FOR THE GENERATION OF PLASMA AT ATMOSPHERIC PRESSURE.
CN101679655A (en) * 2007-05-21 2010-03-24 陶氏环球技术公司 Coated object
WO2008147184A2 (en) * 2007-05-25 2008-12-04 Fujifilm Manufacturing Europe B.V. Atmospheric pressure glow discharge plasma method and system using heated substrate
US20100255216A1 (en) * 2007-11-29 2010-10-07 Haley Jr Robert P Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
US20090142511A1 (en) * 2007-11-29 2009-06-04 Haley Jr Robert P Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
KR100974566B1 (en) * 2008-08-08 2010-08-06 한국생산기술연구원 Atmospheric Plasma Apparatus
EP2180768A1 (en) * 2008-10-23 2010-04-28 TNO Nederlandse Organisatie voor Toegepast Wetenschappelijk Onderzoek Apparatus and method for treating an object
US9120073B2 (en) * 2009-06-05 2015-09-01 Eon Labs, Llc Distributed dielectric barrier discharge reactor
US20110162705A1 (en) * 2010-01-06 2011-07-07 Popa Paul J Moisture resistant photovoltaic devices with elastomeric, polysiloxane protection layer
DE102011000261A1 (en) * 2011-01-21 2012-07-26 Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen Dielectric coplanar discharge source for surface treatment under atmospheric pressure
KR102124042B1 (en) * 2013-02-18 2020-06-18 삼성디스플레이 주식회사 Vapor deposition apparatus and method for manufacturing organic light emitting display apparatus
JP6123796B2 (en) * 2013-03-15 2017-05-10 東レ株式会社 Plasma CVD apparatus and plasma CVD method
US9666415B2 (en) * 2015-02-11 2017-05-30 Ford Global Technologies, Llc Heated air plasma treatment
DE102015108884A1 (en) 2015-06-04 2016-12-08 Hochschule für Angewandte Wissenschaft und Kunst - Hildesheim/Holzminden/Göttingen Apparatus for the plasma treatment of in particular band-shaped objects
US10882021B2 (en) 2015-10-01 2021-01-05 Ion Inject Technology Llc Plasma reactor for liquid and gas and method of use
US11452982B2 (en) 2015-10-01 2022-09-27 Milton Roy, Llc Reactor for liquid and gas and method of use
WO2017058764A1 (en) 2015-10-01 2017-04-06 Buchanan Walter Riley Plasma reactor for liquid and gas
US10187968B2 (en) 2015-10-08 2019-01-22 Ion Inject Technology Llc Quasi-resonant plasma voltage generator
US10046300B2 (en) 2015-12-09 2018-08-14 Ion Inject Technology Llc Membrane plasma reactor
CN109790313A (en) 2016-09-30 2019-05-21 简·探针公司 Composition on plasma-treated surface
JP7052796B2 (en) * 2017-07-28 2022-04-12 住友電気工業株式会社 Shower head and its manufacturing method
JP2021132148A (en) * 2020-02-20 2021-09-09 東京エレクトロン株式会社 Stage, plasma processing apparatus and plasma processing method

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4626876A (en) * 1984-01-25 1986-12-02 Ricoh Company, Ltd. Solid state corona discharger
US5403453A (en) 1993-05-28 1995-04-04 The University Of Tennessee Research Corporation Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure
US5387842A (en) * 1993-05-28 1995-02-07 The University Of Tennessee Research Corp. Steady-state, glow discharge plasma
US5456972A (en) 1993-05-28 1995-10-10 The University Of Tennessee Research Corporation Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure
US5414324A (en) 1993-05-28 1995-05-09 The University Of Tennessee Research Corporation One atmosphere, uniform glow discharge plasma
US5669583A (en) 1994-06-06 1997-09-23 University Of Tennessee Research Corporation Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof
US5558843A (en) 1994-09-01 1996-09-24 Eastman Kodak Company Near atmospheric pressure treatment of polymers using helium discharges
JPH08279495A (en) * 1995-02-07 1996-10-22 Seiko Epson Corp Method and system for plasma processing
US5714308A (en) 1996-02-13 1998-02-03 Eastman Kodak Company Atmospheric pressure glow discharge treatment of polymeric supports to promote adhesion for photographic applications
CA2205817C (en) * 1996-05-24 2004-04-06 Sekisui Chemical Co., Ltd. Treatment method in glow-discharge plasma and apparatus thereof
US6110540A (en) * 1996-07-12 2000-08-29 The Boc Group, Inc. Plasma apparatus and method
US5789145A (en) 1996-07-23 1998-08-04 Eastman Kodak Company Atmospheric pressure glow discharge treatment of base material for photographic applications
EP1072175A1 (en) * 1998-03-10 2001-01-31 IST Instant Surface Technology S.A. Method for treating the surface of a material or an object and implementing device
EP0997926B1 (en) * 1998-10-26 2006-01-04 Matsushita Electric Works, Ltd. Plasma treatment apparatus and method
US6118218A (en) * 1999-02-01 2000-09-12 Sigma Technologies International, Inc. Steady-state glow-discharge plasma at atmospheric pressure

Also Published As

Publication number Publication date
US6441553B1 (en) 2002-08-27
JP2004509432A (en) 2004-03-25
WO2002023960A1 (en) 2002-03-21
EP1323338A1 (en) 2003-07-02
EP1323338A4 (en) 2008-08-20

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