AU2001238188A1 - Multi-zone rf electrode for capacitive plasma sources - Google Patents

Multi-zone rf electrode for capacitive plasma sources

Info

Publication number
AU2001238188A1
AU2001238188A1 AU2001238188A AU3818801A AU2001238188A1 AU 2001238188 A1 AU2001238188 A1 AU 2001238188A1 AU 2001238188 A AU2001238188 A AU 2001238188A AU 3818801 A AU3818801 A AU 3818801A AU 2001238188 A1 AU2001238188 A1 AU 2001238188A1
Authority
AU
Australia
Prior art keywords
zone
electrode
plasma sources
capacitive plasma
capacitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001238188A
Inventor
Wayne L. Johnson
Maolin Long
Richard Parsons
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2001238188A1 publication Critical patent/AU2001238188A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
AU2001238188A 2000-02-25 2001-02-14 Multi-zone rf electrode for capacitive plasma sources Abandoned AU2001238188A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18506900P 2000-02-25 2000-02-25
US60185069 2000-02-25
PCT/US2001/004562 WO2001063642A1 (en) 2000-02-25 2001-02-14 Multi-zone rf electrode for capacitive plasma sources

Publications (1)

Publication Number Publication Date
AU2001238188A1 true AU2001238188A1 (en) 2001-09-03

Family

ID=22679442

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001238188A Abandoned AU2001238188A1 (en) 2000-02-25 2001-02-14 Multi-zone rf electrode for capacitive plasma sources

Country Status (3)

Country Link
JP (1) JP2003524895A (en)
AU (1) AU2001238188A1 (en)
WO (1) WO2001063642A1 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6642661B2 (en) 2001-08-28 2003-11-04 Tokyo Electron Limited Method to affect spatial distribution of harmonic generation in a capacitive discharge reactor
JP4847009B2 (en) * 2002-05-23 2011-12-28 ラム リサーチ コーポレーション Multi-component electrode for semiconductor processing plasma reactor and method of replacing part of multi-component electrode
CN101911840B (en) * 2007-12-25 2013-04-17 应用材料公司 Asymmetrical RF drive for electrode of plasma chamber
JP5133750B2 (en) * 2008-03-25 2013-01-30 東京エレクトロン株式会社 Plasma processing apparatus and feedback control method for plasma processing apparatus
JP2009231247A (en) * 2008-03-25 2009-10-08 Tokyo Electron Ltd Plasma treatment device, and supplying method of high frequency power
KR101534024B1 (en) * 2008-12-10 2015-07-08 주성엔지니어링(주) Appratus for treatmenting substrate
US20100139562A1 (en) 2008-12-10 2010-06-10 Jusung Engineering Co., Ltd. Substrate treatment apparatus
GB2466836A (en) 2009-01-12 2010-07-14 Phive Plasma Technologies Ltd Plasma source tile electrode
KR101104537B1 (en) * 2010-05-28 2012-01-11 한국과학기술원 Variable capacitor and method for driving the same
WO2011156534A2 (en) * 2010-06-08 2011-12-15 Applied Materials, Inc. Multiple frequency power for plasma chamber electrode
KR101839776B1 (en) * 2011-02-18 2018-03-20 삼성디스플레이 주식회사 Plazma treatment apparatus
CH706028A1 (en) * 2012-01-16 2013-07-31 Elmvoltaics Gmbh An electrode for a deposition unit by chemical vapor deposition in plasma.
US20140263182A1 (en) * 2013-03-15 2014-09-18 Tokyo Electron Limited Dc pulse etcher
KR101643674B1 (en) * 2014-12-05 2016-07-28 인베니아 주식회사 Antenna assembly for plasma processing apparatus and plasma processing apparatus comprising the same
KR101582212B1 (en) * 2015-01-12 2016-01-27 주성엔지니어링(주) Apparatus for treating substrate
KR101633721B1 (en) * 2015-11-27 2016-06-27 (주)이엠아이티 Radio Frequency Antenna having vertical multiple pole structure
KR102536206B1 (en) * 2017-04-14 2023-05-23 스미토모덴키고교가부시키가이샤 shower head

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07226395A (en) * 1994-02-15 1995-08-22 Matsushita Electric Ind Co Ltd Vacuum plasma treatment apparatus
DE4443608C1 (en) * 1994-12-07 1996-03-21 Siemens Ag Plasma reactor for integrated circuit fabrication
JP2758845B2 (en) * 1995-02-21 1998-05-28 九州日本電気株式会社 Plasma CVD equipment
JPH08236294A (en) * 1995-02-28 1996-09-13 Jeol Ltd High frequency plasma applied device
US6042686A (en) * 1995-06-30 2000-03-28 Lam Research Corporation Power segmented electrode

Also Published As

Publication number Publication date
WO2001063642A1 (en) 2001-08-30
JP2003524895A (en) 2003-08-19

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